Lithographic apparatus and method
US-10139735-B2 · Nov 27, 2018 · US
Scanned exposure beam, e.g. raster-, rotary- and vector scanning (mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358)
Scanned exposure beam, e.g. raster-, rotary- and vector scanning (mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358) · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/704 |
| Official title | {Scanned exposure beam, e.g. raster-, rotary- and vector scanning (mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358)} |
| Display label | Scanned exposure beam, e.g. raster-, rotary- and vector scanning (mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358) |
| Total patents | 151 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 13 |
| 2016 | 22 |
| 2017 | 15 |
| 2018 | 18 |
| 2019 | 19 |
| 2020 | 13 |
| 2021 | 13 |
| 2022 | 9 |
| 2023 | 5 |
| 2024 | 13 |
| 2025 | 7 |
| 2026 | 4 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Exposure head, exposure apparatus and method of operating an exposure head
US-10114289-B2 · Oct 30, 2018 · US
Photonic activation of reactants for sub-micron feature formation using depleted beams
US-10061208-B2 · Aug 28, 2018 · US
Scanning Methods For Focus Control For Lithographic Processing Of Reconstituted Wafers
US-2018166348-A1 · Jun 14, 2018 · US
Photonic activation of reactants for sub-micron feature formation using depleted beams
US-2018143537-A1 · May 24, 2018 · US
Lithographic apparatus and device manufacturing method
US-9939740-B2 · Apr 10, 2018 · US
Methods of forming patterns using nanoimprint lithography
US-2018059537-A1 · Mar 1, 2018 · US
Focus centering method for digital lithography
US-2018024448-A1 · Jan 25, 2018 · US
Method for computer modeling and simulation of negative-tone-developable photoresists
US-2018017873-A1 · Jan 18, 2018 · US
Photonic activation of reactants for sub-micron feature formation using depleted beams
US-9869938-B2 · Jan 16, 2018 · US
Exposure device and exposure method
US-9851642-B2 · Dec 26, 2017 · US
Lithography apparatus, stage apparatus, and method of manufacturing articles
US-9823587-B2 · Nov 21, 2017 · US
Methods of rasterizing mask layout and methods of fabricating photomask using the same
US-2017277813-A1 · Sep 28, 2017 · US
Maskless lithographic apparatus measuring accumulated amount of light
US-2017261862-A1 · Sep 14, 2017 · US
Device, lithographic apparatus, method for guiding radiation and device manufacturing method
US-9715183-B2 · Jul 25, 2017 · US
Optical apparatus and manufacturing method using the same
US-9690200-B2 · Jun 27, 2017 · US
Lithographic Apparatus and Method
US-2017131642-A1 · May 11, 2017 · US
Lithographic apparatus, programmable patterning device and lithographic method
US-9645502-B2 · May 9, 2017 · US
Method of operating a microlithographic apparatus
US-9612540-B2 · Apr 4, 2017 · US
Adaptive pattern generation
US-9607367-B2 · Mar 28, 2017 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/704?
- CPC G03F7/704 is the Cooperative Patent Classification code for “Scanned exposure beam, e.g. raster-, rotary- and vector scanning (mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358).”
- How many patents are filed under CPC G03F7/704 (Scanned exposure beam, e.g. raster-, rotary- and vector scanning (mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358))?
- Our database includes 151 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/704 growing?
- Publication counts under this code: 13 in 2024 vs 7 in 2025 (latest complete years).