Optical apparatus and manufacturing method using the same

Patent metadata

Field	Value
Publication number	US-9690200-B2
Application number	US-201514867292-A
Country	US
Kind code	B2
Filing date	Sep 28, 2015
Priority date	Oct 7, 2014
Publication date	Jun 27, 2017
Grant date	Jun 27, 2017

Abstract

An optical apparatus and a manufacturing method using the optical apparatus are disclosed. The optical apparatus includes a stage supporting a substrate, first optical systems providing a first light onto the substrate, a gantry supporting the first optical systems to transfer them on the stage, and second optical systems disposed between the gantry and the stage and detecting displacement of the first optical systems. Each of the second optical systems includes a beam source generating a second light different with the first light, and sensor arrays for sensing the second light provided to the first optical systems to detect displacement of the first optical systems.

First claim

What is claimed is:

1. An optical apparatus, comprising:
a stage configured to support a substrate;
a first optical system configured to provide a first light onto the substrate;
a gantry configured to support the first optical system to transfer the first optical system above the stage; and
a second optical system disposed between the gantry and the stage to detect displacement of the first optical system,
wherein the second optical system comprises:
a beam source configured to generate a second light that is different from the first light;
a sensor array configured to receive the second light provided to the first optical system to detect the displacement of the first optical system;
a beam splitter connected to the gantry, disposed adjacent to the first optical system, and configured to split the second light into an aiming beam and a transmission beam; and
a beam reflector disposed at an end portion of the first optical system to provide a reflected beam induced from the aiming beam to the sensor array,
wherein the aiming beam is parallel to the first optical system and the transmission beam is parallel to the gantry.

2. The optical apparatus of claim 1 , wherein the first optical system comprises:
a light source configured to provide the first light;
a chirping reflector configured to control the first light provided from the light source;
an objective lens configured to focus the first light onto the substrate; and
an optical cylinder disposed between the objective lens and the chirping reflector,
wherein the beam reflector is disposed on an end portion of the optical cylinder adjacent to the objective lens.

3. The optical apparatus of claim 1 , wherein the first optical system comprises:
an objective lens configured to magnify a surface of the substrate;
an ocular lens disposed above the objective lens;
an optical tube configured to connect the ocular lens to the objective lens; and
an image sensor disposed above the ocular lens and configured to acquire a surface image of the substrate,
wherein the beam reflector is disposed at an end portion of the optical tube adjacent to the objective lens.

4. The optical apparatus of claim 1 , wherein the beam reflector comprises a retro reflector configured to provide the reflected beam that is parallel to the aiming beam, and
the sensor array detects the displacement of the first optical system by a distance between the aiming beam and the reflected beam.

5. The optical apparatus of claim 1 , wherein the gantry comprises a hole through which the first optical system passes, and
a spring damper configured to connect the first optical system in the hole of the gantry.

6. The optical apparatus of claim 1 , wherein the second optical system further comprises a beam bender disposed between the beam source and the beam splitter to change a path of the second light,
wherein the beam splitter is one of a plurality of beam splitters aligned in a line with respect to the beam bender.

7. The optical apparatus of claim 1 , wherein the sensor array is disposed on a bottom surface of the gantry.

8. The optical apparatus of claim 1 , wherein the sensor array comprises a photo diode.

9. The optical apparatus of claim 1 , further comprising a plate disposed between the beam source and the gantry.

10. A manufacturing method, comprising:
coating a photosensitive layer on a substrate;
providing the substrate on a stage of an optical apparatus;
exposing the photosensitive layer to a light pattern by the optical apparatus; and
developing the photosensitive layer to form a photosensitive pattern,
wherein the optical apparatus comprises,
a stage configured to support the substrate,
a first optical system configured to provide a first light onto the substrate,
a gantry configured to support the first optical system to transfer the first optical system above the stage, and
a second optical system disposed between the gantry and the stage to detect displacement of the first optical system,
wherein the second optical system comprises:
a beam source configured to generate a second light that is different from the first light;
a sensor array configured to receive the second light provided to the first optical system to detect the displacement of the first optical system;
a beam splitter connected to the gantry, disposed adjacent to the first optical system, and configured to split the second light into an aiming beam and a transmission beam; and
a beam reflector disposed at an end portion of the first optical system to provide a reflected beam induced from the aiming beam to the sensor array,
wherein the aiming beam is parallel to the first optical system and the transmission beam is parallel to the gantry,
wherein the second optical system is a displacement detection unit.

11. The method of claim 10 , wherein the first optical system comprises:
a light source configured to provide the first light;
a chirping reflector configured to control the first light provided from the light source;
an objective lens configured to focus the first light onto the substrate; and
an optical cylinder disposed between the objective lens and the chirping reflector,
wherein the beam reflector is disposed on an end portion of the optical cylinder adjacent to the objective lens.

12. The method of claim 10 , wherein the beam reflector comprises a retro reflector configured to provide the reflected beam that is parallel to the aiming beam, and
the sensor array detects the displacement of the first optical system by a distance between the aiming beam and the reflected beam.

13. A manufacturing method, comprising:
forming a pattern on a substrate;
providing the substrate on a stage of an optical apparatus; and
inspecting the pattern by the optical apparatus,
wherein the optical apparatus comprises,
a stage configured to support the substrate,
a first optical system configured to provide a first light onto the substrate,
a gantry configured to support the first optical system to transfer the first optical system above the stage, and
a second optical system disposed between the gantry and the stage to detect displacement of the first optical system,
wherein the second optical system comprises:
a beam source configured to generate a second light that is different from the first light;
a sensor array configured to receive the second light provided to the first optical system to detect the displacement of the first optical system;
a beam splitter connected to the gantry, disposed adjacent to the first optical system, and configured to split the second light into an aiming beam and a transmission beam; and
a beam reflector disposed at an end portion of the first optical system to provide a reflected beam induced from the aiming beam to the sensor array,
wherein the aiming beam is parallel to the first optical system and the transmission beam is parallel to the gantry,
wherein the second optical system includes a plurality of displacement detection units.

14. The method of claim 13 , wherein the first optical system comprises:
an objective lens configured to magnify a surface of the substrate;
an ocular lens disposed above the objective lens;
an optical tube configured to connect the ocular lens to the objective lens; and
an image sensor disposed above the ocular lens and configured to acquire a surface image of the substrate,
wherein the beam reflector is disposed at an end portion of the optical tube adjacent to the objective lens.

15. The method of claim 14 , wherein the beam reflector comprises a retro reflector config

Assignees

• Samsung Electronics Co Ltd
• Samsung Display Co Ltd

Inventors

• Hong Sangjoon
• Lee Jongjin
• Lee Hikuk
• Jang Sangdon
• Chang Inbae

Classifications

• G03F7/16 Primary

  Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74) · CPC title

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G03F7/70383 Primary

  Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams (maskless lithography using a programmable mask G03F7/70291) · CPC title

• G03F7/70791

  Large workpieces, e.g. glass substrates for flat panel displays or solar panels · CPC title

• G03F7/704 Primary

  Scanned exposure beam, e.g. raster-, rotary- and vector scanning (mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358) · CPC title