Exposure device and exposure method

US9851642B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9851642-B2
Application numberUS-201615091005-A
CountryUS
Kind codeB2
Filing dateApr 5, 2016
Priority dateOct 20, 2009
Publication dateDec 26, 2017
Grant dateDec 26, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An exposure device includes a rotation driving section that rotationally drives an exposure object; a light irradiation section that irradiates an exposure surface of the exposure object with laser light; a slide moving section secured to the rotation driving section or the light irradiation section, and moving the rotation driving section or the light irradiation section along the exposure surface in a direction crossing a direction of rotation of the rotation driving section; a signal generating section that transmits an analog modulating signal to the light irradiation section in accordance with a rotation synchronization signal from the rotation driving section, the analog modulating signal causing an intensity of the laser light to be changed; and a controlling section that controls movements of the rotation driving section, the slide moving section, and the light irradiation section.

First claim

Opening claim text (preview).

What is claimed is: 1. A film manufacturing method, comprising: forming a roll die used in roll imprint; and transferring a pattern on the roll die to a film substrate, wherein the forming the roll die comprises: rotating an exposure object and generating a rotational synchronization signal; causing a laser light to scan along an exposure surface of the rotating exposure object in a direction crossing a direction of rotation of the exposure object, the exposure surface is irradiated with the laser light; and modulating an intensity of the laser light in accordance with the rotational synchronization signal, wherein the intensity of the laser light is modulated in accordance with a rotation period of the exposure object, wherein the intensity of the laser light with which the exposure object is irradiated in a same rotation phase of the exposure object is changed with time, and wherein a minimum value of the intensity of the laser light is lower than a threshold value of an amount of the laser light received for causing a reaction that makes the exposure object soluble in a developer; and forming grooves separated from each other on the exposure object. 2. The film manufacturing method according to claim 1 , wherein the intensity of the laser light with which the exposure object is irradiated in the same rotation phase of the exposure object is continuously changed. 3. The film manufacturing method according to claim 1 , wherein a movement amount for the laser light to scan the exposure surface per rotation of the exposure object is less than a spot diameter of the laser light per rotation period of the exposure object. 4. The film manufacturing method according to claim 3 , wherein the movement amount for the laser light to scan the expose surface per rotation of the exposure object is greater than or equal to ½ of the spot diameter of the laser light per rotation period of the exposure object, and is less than the spot diameter. 5. The film manufacturing method according to claim 1 , wherein the exposure object is a positive resist. 6. The film manufacturing method according to claim 1 , wherein the exposure surface is a roll surface of a rotating roll, and wherein the laser light is configured to scan the roll surface along a direction of a rotational axis of the rotating roll.

Assignees

Inventors

Classifications

  • Arrangements for irradiation · CPC title

  • Rotary scanning · CPC title

  • G03F7/704Primary

    Scanned exposure beam, e.g. raster-, rotary- and vector scanning (mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358) · CPC title

  • B33Y30/00Primary

    Apparatus for additive manufacturing; Details thereof or accessories therefor · CPC title

  • Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like · CPC title

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What does patent US9851642B2 cover?
An exposure device includes a rotation driving section that rotationally drives an exposure object; a light irradiation section that irradiates an exposure surface of the exposure object with laser light; a slide moving section secured to the rotation driving section or the light irradiation section, and moving the rotation driving section or the light irradiation section along the exposure sur…
Who is the assignee on this patent?
Sony Corp
What technology area does this patent fall under?
Primary CPC classification G03F7/704. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Dec 26 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).