Continuous photolithographic fabrication process for producing seamless microstructures used in electro-optic displays and light modulating films
US-2025147374-A1 · May 8, 2025 · US
simultaneous coating and exposure; using a belt mask, e.g. endless
simultaneous coating and exposure; using a belt mask, e.g. endless · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/2035 |
| Official title | {simultaneous coating and exposure; using a belt mask, e.g. endless} |
| Display label | simultaneous coating and exposure; using a belt mask, e.g. endless |
| Total patents | 42 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2015 | 5 |
| 2016 | 6 |
| 2017 | 6 |
| 2018 | 7 |
| 2019 | 4 |
| 2020 | 3 |
| 2021 | 4 |
| 2022 | 1 |
| 2023 | 1 |
| 2024 | 4 |
| 2025 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Etching and thinning for the fabrication of lithographically patterned diamond nanostructures
US-12184259-B2 · Dec 31, 2024 · US
Substrate treatment apparatus
US-2024272562-A1 · Aug 15, 2024 · US
Exposure apparatus
US-2024264541-A1 · Aug 8, 2024 · US
Method and apparatus for post exposure processing of photoresist wafers
US-11899366-B2 · Feb 13, 2024 · US
Methods and apparatus for creating a large area imprint without a seam
US-11774851-B2 · Oct 3, 2023 · US
Method and apparatus for post exposure processing of photoresist wafers
US-2022004104-A1 · Jan 6, 2022 · US
Etching and thinning for the fabrication of lithographically patterned diamond nanostructures
US-2021399708-A1 · Dec 23, 2021 · US
Method and apparatus for post exposure processing of photoresist wafers
US-11112697-B2 · Sep 7, 2021 · US
Methods and apparatus for creating a large area imprint without a seam
US-2021181625-A1 · Jun 17, 2021 · US
Methods and apparatus for creating a large area imprint without a seam
US-10948818-B2 · Mar 16, 2021 · US
Photolithography method and system based on high step slope
US-10816903-B2 · Oct 27, 2020 · US
Photomask, laminate comprising photomask, photomask preparation method, pattern forming apparatus using photomask and pattern forming method using photomask
US-10732500-B2 · Aug 4, 2020 · US
Chemically amplified negative resist composition and resist pattern forming process
US-10725377-B2 · Jul 28, 2020 · US
Method and apparatus for post exposure processing of photoresist wafers
US-10474033-B2 · Nov 12, 2019 · US
Methods and apparatus for creating a large area imprint without a seam
US-2019285981-A1 · Sep 19, 2019 · US
Method and apparatus for post exposure processing of photoresist wafers
US-2019187563-A1 · Jun 20, 2019 · US
Method and apparatus for post exposure processing of photoresist wafers
US-10203604-B2 · Feb 12, 2019 · US
Photomask, laminate comprising photomask, photomask preparation method, pattern forming apparatus using photomask and pattern forming method using photomask
US-2018188645-A1 · Jul 5, 2018 · US
Photolithography method and system based on high step slope
US-2018188652-A1 · Jul 5, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/2035?
- CPC G03F7/2035 is the Cooperative Patent Classification code for “simultaneous coating and exposure; using a belt mask, e.g. endless.”
- How many patents are filed under CPC G03F7/2035 (simultaneous coating and exposure; using a belt mask, e.g. endless)?
- Our database includes 42 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/2035 growing?
- Publication counts under this code: 4 in 2024 vs 1 in 2025 (latest complete years).