Substrate Processing Method, Apparatus, and System
US-2024363405-A1 · Oct 31, 2024 · US
by cleaning or etching
by cleaning or etching · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/0227 |
| Official title | {by cleaning or etching} |
| Display label | by cleaning or etching |
| Total patents | 660 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 28 |
| 2016 | 30 |
| 2017 | 47 |
| 2018 | 41 |
| 2019 | 51 |
| 2020 | 57 |
| 2021 | 61 |
| 2022 | 87 |
| 2023 | 77 |
| 2024 | 102 |
| 2025 | 61 |
| 2026 | 18 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Plasma-enhanced chemical vapor deposition methods for graphene deposition
US-2017253962-A1 · Sep 7, 2017 · US
Method and system for three-dimensional (3D) structure fill
US-9530674-B2 · Dec 27, 2016 · US
Metal-free CVD coating of graphene on glass and other dielectric substrates
US-9505624-B2 · Nov 29, 2016 · US
Sulfur-containing thin films
US-9478419-B2 · Oct 25, 2016 · US
Carbon-coating-film cleaning method and device
US-2016281217-A1 · Sep 29, 2016 · US
Preliminary treatment method for workpiece
US-2016281237-A1 · Sep 29, 2016 · US
Selective formation of metallic films on metallic surfaces
US-2016276208-A1 · Sep 22, 2016 · US
Pre-clean chamber and process with substrate tray for changing substrate temperature
US-2016265112-A1 · Sep 15, 2016 · US
Devices including metal-silicon contacts using indium arsenide films and apparatus and methods
US-9441298-B2 · Sep 13, 2016 · US
Ceramic matrix composite articles and methods for forming same
US-2016251270-A1 · Sep 1, 2016 · US
Ceramic matrix composite articles and methods for forming same
US-2016251269-A1 · Sep 1, 2016 · US
Selective deposition
US-2016222504-A1 · Aug 4, 2016 · US
Method and apparatus for selective deposition
US-9385219-B2 · Jul 5, 2016 · US
Diamond coated tool
US-2016175941-A1 · Jun 23, 2016 · US
Hydroxyl group termination for nucleation of a dielectric metallic oxide
US-9373501-B2 · Jun 21, 2016 · US
Wire grid polarizer and method of fabricating the same
US-2016161653-A1 · Jun 9, 2016 · US
Nitride semiconductor light emitting element and method for manufacturing the same
US-2016163928-A1 · Jun 9, 2016 · US
Vacuum pre-wetting apparatus and methods
US-2016102397-A1 · Apr 14, 2016 · US
Diamond coated tool
US-9302327-B2 · Apr 5, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/0227?
- CPC C23C16/0227 is the Cooperative Patent Classification code for “by cleaning or etching.”
- How many patents are filed under CPC C23C16/0227 (by cleaning or etching)?
- Our database includes 660 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/0227 growing?
- Publication counts under this code: 102 in 2024 vs 61 in 2025 (latest complete years).