Apparatus for transportation of a substrate, apparatus for vacuum processing of a substrate, and method for maintenance of a magnetic levitation system
US-2018374732-A1 · Dec 27, 2018 · US
using a magnetic field in close vicinity to the substrate
using a magnetic field in close vicinity to the substrate · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C14/351 |
| Official title | {using a magnetic field in close vicinity to the substrate} |
| Display label | using a magnetic field in close vicinity to the substrate |
| Total patents | 200 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 17 |
| 2016 | 18 |
| 2017 | 16 |
| 2018 | 11 |
| 2019 | 14 |
| 2020 | 10 |
| 2021 | 18 |
| 2022 | 32 |
| 2023 | 27 |
| 2024 | 19 |
| 2025 | 15 |
| 2026 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Film-forming apparatus and film-forming method
US-2018355474-A1 · Dec 13, 2018 · US
Laterally adjustable return path magnet assembly and methods
US-10151023-B2 · Dec 11, 2018 · US
Processing apparatus and collimator
US-2018233336-A1 · Aug 16, 2018 · US
Semiconductor device, method for manufacturing the same, and apparatus for manufacturing semiconductor device
US-10032872-B2 · Jul 24, 2018 · US
Magnetic field generator, magnetron cathode and spattering apparatus
US-10000844-B2 · Jun 19, 2018 · US
Biased cover ring for a substrate processing system
US-2018151325-A1 · May 31, 2018 · US
Semiconductor device and manufacturing method of the same
US-2018102420-A1 · Apr 12, 2018 · US
Method for continuously forming noble metal film and method for continuously manufacturing electronic component
US-9885107-B2 · Feb 6, 2018 · US
Laterally adjustable return path magnet assembly and methods
US-2017369985-A1 · Dec 28, 2017 · US
Method of manufacturing a magnetic film having high coercivity for use as a hot seed in a magnetic write head
US-9805743-B2 · Oct 31, 2017 · US
Method and Device for Particle Measurement
US-2017309459-A1 · Oct 26, 2017 · US
Semiconductor device and manufacturing method of the same
US-9780201-B2 · Oct 3, 2017 · US
Methods and apparatus for controlling ion fraction in physical vapor deposition processes
US-2017253959-A1 · Sep 7, 2017 · US
Surface treatment method with superior mass-productivity and low friction characteristics
US-2017211178-A9 · Jul 27, 2017 · US
Method of sputtering and sputter system
US-2017204511-A1 · Jul 20, 2017 · US
Ultra-thin doped noble metal films for optoelectronics and photonics applications
US-2017200526-A1 · Jul 13, 2017 · US
Surface treatment method with superior mass-productivity and low friction characteristics
US-2017107607-A1 · Apr 20, 2017 · US
Method of HIPIMS sputtering and HIPIMS sputter system
US-9624572-B2 · Apr 18, 2017 · US
Crystalline orientation and overhang control in collision based RF plasmas
US-9611539-B2 · Apr 4, 2017 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C14/351?
- CPC C23C14/351 is the Cooperative Patent Classification code for “using a magnetic field in close vicinity to the substrate.”
- How many patents are filed under CPC C23C14/351 (using a magnetic field in close vicinity to the substrate)?
- Our database includes 200 publications tagged with this CPC code.
- Is patent activity under CPC C23C14/351 growing?
- Publication counts under this code: 19 in 2024 vs 15 in 2025 (latest complete years).