Method of HIPIMS sputtering and HIPIMS sputter system

Patent metadata

Field	Value
Publication number	US-9624572-B2
Application number	US-201414765975-A
Country	US
Kind code	B2
Filing date	Feb 7, 2014
Priority date	Feb 8, 2013
Publication date	Apr 18, 2017
Grant date	Apr 18, 2017

Abstract

So as to control the operation of a sputter target ( 9 ) during lifetime of the target and under HIPIMS operation part (I) of a magnet arrangement associated to the target ( 9 ) is retracted from the target ( 9 ) whereas a second part II of the magnet arrangement is, if at all, retracted less from the addressed backside ( 7 ) during lifetime of the target ( 9 ). Thereby, part I is closer to the periphery of target ( 9 ) than part II, as both are eccentrically rotated about a rotational axis (A).

First claim

What is claimed is:

1. A method of High-Power Impulse Magnetron Sputtering (“HIPIMS”) for coating substrates comprising
providing a target with a sputtering surface and with a back surface
providing along said back surface a magnet arrangement
pivoting or rotating said magnet arrangement about a rotational axis which is perpendicular to said back surface
wherein said magnet arrangement comprises magnet poles arranged along a pair of closed loops, an outer of said closed loops of said pair completely surrounding an inner of said closed loops of said pair and being distant from said inner of said closed loops,
the magnet poles facing said back surface and arranged along one of said closed loops of said pair having opposite magnet polarity with respect to the magnet poles facing said back surface and arranged along the other of said closed loops of said pair,
wherein said pair of closed loops is subdivided in a first part and in a second part, said outer closed loop of said pair thereby being subdivided in a first outer section in said first part and in a second outer section in said second part and said inner closed loop of said pair being thereby subdivided in a first inner section in said first part and in a second inner section in said second part,
said first outer section being more distant from said rotational axis than said second outer section, both considered in radial direction with respect to said rotational axis,
said method comprising controllably increasing distances of at least a predominant number of magnet poles along at least one of said outer and of said inner first sections to said back surface more than increasing distances to said back surface of at least a predominant number of magnet poles of said outer and of said inner second sections, as HIPIMS operation time of said target increases,
controlling current pulse peak values supplied by the HIPIMS operation of the target, and
performing said controllably increasing said distances of said at least predominant number of magnet poles along at least one of said outer and of said inner first sections so as to maintain substantially constant peak current pulse values of said HIPIMS operation over a lifetime of said target.

2. The method of claim 1 , wherein said magnet arrangement comprises a single pair of said closed loops.

3. The method of claim 1 , wherein said distances to said back surface of said at least predominant number of magnet poles of said outer and of said inner second sections are increased by an equal movement considered in direction from said back surface and parallel to said rotational axis.

4. The method of claim 1 , wherein said distances to the back surface of said at least predominant number of magnet poles of said outer and of said inner second sections are kept constant during HIPIMS operation time of said target.

5. The method of claim 1 , wherein the distances of said at least predominant number of magnet poles of said outer and of said inner second sections are equal during said HIPIMS operation time of said target.

6. The method of claim 1 , wherein controllably increasing said distances of said at least predominant number of magnet poles along at least one of said outer and of said inner first sections to the back surface is performed upon magnet poles along said outer and along said inner first sections.

7. The method of claim 1 , wherein the distances of said at least predominant number of magnet poles along at least one of said outer and of said inner first sections are equally increased.

8. The method of claim 1 , wherein said distances to said back surface of said at least predominant number of magnet poles of said at least one of said outer and of said inner first sections are increased by an equal movement considered in direction from said back surface and parallel to said rotational axis.

9. The method of claim 1 , wherein said distances to said back surface of said at least predominant number of magnet poles of said at least one of said outer and of said inner first sections are equal during HIPIMS operation time of said target.

10. The method of claim 1 , wherein said distances of magnet poles along said outer and inner first sections are equal during HIPIMS operation time and wherein distances from magnet poles along said outer and said inner second sections are equal as well during HIPIMS operation time of said target.

11. The method of claim 1 , wherein an average distance from said rotational axis of magnet poles along said first outer section is larger than an average distance from said rotational axis of magnet poles along said second outer section.

12. The method of claim 1 , comprising controllably increasing distances of all magnet poles along at least one of said outer and of said inner first sections to said back surface.

13. The method of claim 12 , comprising controllably increasing said distances of said magnet poles along said outer as well as along said inner first sections to the back surface.

14. The method of claim 1 , wherein a first locus along said outer first section defines for a maximum distance R max from said rotational axis and wherein a second locus along the outer second section defines for a minimum distance R min from said rotational axis and wherein said first part is limited on one side of said first locus by a first limit locus which has a distance R e1 from said rotation axis which is not less than
R e1 =( R max +R min )/2
and wherein said first part is limited on the other side of said first locus by a second limit locus with a distance R e2 from said rotation axis which is not less than
R e2 =( R max +R min )/2.

15. The method of claim 1 , wherein controllably increasing said distances of said at least predominant number of magnet poles along said at least one of said outer and of said inner first sections to the back surface is performed at least one of stepwise and of steadily during said HIPIMS operation time of said target.

16. The method of claim 1 , wherein controllably increasing said distances of said at least predominant number of magnet poles along at least one of said outer and of said inner first sections is performed in dependency of erosion depth of said sputtering surface adjacent to the periphery of said target and is preferably selected approximately equal to the erosion depth of said sputtering surface adjacent said periphery of said target.

17. The method of claim 1 , wherein controllably increasing said distances of said at least predominant number of magnet poles along at least one of said outer and of said inner first sections is controlled by a predetermined distance vs. time characteristic.

18. The method of claim 1 , wherein said magnet poles are magnet poles of magnets arranged with their dipole directions at least substantially parallel to said rotational axis.

19. A High-Power Impulse Magnetron Sputtering (“HIPIMS”) system comprising
a target arrangement with a sputtering surface and a back surface
a magnet arrangement along said back surface
a pivoting or rotating drive operationally connected to said magnet arrangement to pivot or rotate said magnet arrangement about a rotational axis perpendicular to said back surface
said magnet arrangement comprising magnet poles arranged along a pair of closed loops, an outer of said closed loops of said pair completely surrounding an inner of said closed loops of said pair and being distant from said inner of said closed loops
the magnet poles facing said back surface and arranged along one

Assignees

• Evatec Ag

Inventors

• Rieschl Sven Uwe
• Weichart Juergen

Classifications

• H01J37/3455

  Movable magnets · CPC title

• H01J37/3467

  Pulsed operation, e.g. HIPIMS · CPC title

• C23C14/3485

  using pulsed power to the target · CPC title

• C23C14/351 Primary

  using a magnetic field in close vicinity to the substrate · CPC title

• C23C14/3492 Primary

  Variation of parameters during sputtering · CPC title