Magnetic field generator, magnetron cathode and spattering apparatus

Patent metadata

Field	Value
Publication number	US-10000844-B2
Application number	US-201113698884-A
Country	US
Kind code	B2
Filing date	Aug 30, 2011
Priority date	Sep 13, 2010
Publication date	Jun 19, 2018
Grant date	Jun 19, 2018

Abstract

A magnetic field generator arranged behind a target and for generating a magnetic field on a front surface of the target based on magnetic force lines can include a ring-shaped outer magnetic body having a pole axis in a parallel direction (X-direction) with respect to the target surface, a center magnetic body arranged on an inner side of the outer magnetic body and having a pole axis in a parallel direction (X-direction) with the direction of the pole axis of the outer magnetic body, a yoke plate for supporting the outer magnetic body and the center magnetic body from behind, and a magnetic permeable plate for changing a magnetic field distribution of the front surface of the target. The magnetic permeable plate is arranged so as to be supported by the yoke plate from behind.

First claim

The invention claimed is:

1. A magnetic field generator arranged behind a target and for generating a magnetic field on a front surface of the target based on magnetic force lines, comprising:
a ring-shaped first magnetic body having a pole axis in a parallel direction with respect to a surface of the target,
a ring-shaped second magnetic body arranged on an inner side of the first magnetic body and having a pole axis in a parallel direction with the pole axis direction of the first magnetic body,
a magnetic permeable base supporting the first magnetic body and the second magnetic body from behind, and
a magnetic field distribution change member for changing a magnetic field distribution on a front surface of the target;
wherein the magnetic field distribution change member has (i) a width corresponding to a distance between the first magnetic body and the second magnetic body and (ii) a height perpendicular to the width and being uniform along the entire distance between the first magnetic body and the second magnetic body, and is arranged to be supported directly by the base from behind the first magnetic body and the second magnetic body,
wherein the first magnetic body, the second magnetic body and the magnetic field distribution change member are supported at different levels on the base while an upper surface of the magnetic field distribution change member is disposed at a level different from both upper surfaces of the first and second magnetic bodies.

2. The magnetic field generator according to claim 1 , wherein both of the first magnetic body and the second magnetic body are configured by a magnet component formed by arranging a plurality of small magnets in an array so that one magnetic pole directs an outer side and the other magnetic pole directs an inner side.

3. The magnetic field generator according to claim 2 , wherein each of the plurality of small magnets has a pillar shape having a bottom shape of square, triangle or sector.

4. The magnetic field generator according to claim 1 , wherein the magnetic field distribution change member has a height of 40 to 60% of a height of the first magnetic body.

5. The magnetic field generator according to claim 1 , wherein the magnetic field distribution change member is composed of a material having a magnetic permeability of 50 or more.

6. The magnetic field generator according to claim 2 , wherein the magnetic field distribution change member has a height of 40 to 60% of a height of the first magnetic body.

7. The magnetic field generator according to claim 3 , wherein the magnetic field distribution change member has a height of 40 to 60% of a height of the first magnetic body.

8. The magnetic field generator according to claim 2 , wherein the magnetic field distribution change member is composed of a material having a magnetic permeability of 50 or more.

9. The magnetic field generator according to claim 3 , wherein the magnetic field distribution change member is composed of a material having a magnetic permeability of 50 or more.

10. The magnetic field generator according to claim 4 , wherein the magnetic field distribution change member is composed of a material having a magnetic permeability of 50 or more.

11. The magnetic field generator according to claim 1 , wherein the level difference between the base end portions of the first and second magnetic bodies is 10 to 30% of the height of the first magnetic body.

12. The magnetic field generator according to claim 1 , wherein the base and magnetic field distribution change member are each made from a different material.

13. The magnetic field generator according to claim 1 , wherein the base and magnetic field distribution change member are each made from a material selected from the group of (i) stainless steel, (ii) nickel, (iii) an alloy of nickel and rhenium, (iv) MnZnFeO and (v) an alloy of iron and silicon.

14. The magnetic field generator according to claim 1 , wherein a height of the first magnetic body is greater than a height of the second magnetic body.

15. A magnetron cathode having a magnetic field generator arranged behind a target for generating a magnetic field on a front surface of the target based on magnetic force lines, wherein
the magnetic field generator comprises
a ring-shaped first magnetic body having a pole axis in a parallel direction with respect to a surface of the target,
a ring-shaped second magnetic body arranged on an inner side of the first magnetic body and having a pole axis in a parallel direction with the pole axis direction of the first magnetic body,
a magnetic permeable base supporting the first magnetic body and the second magnetic body from behind, and
a magnetic field distribution change member for changing a magnetic field distribution on a front surface of the target;
wherein the magnetic field distribution change member has (i) a width corresponding to a distance between the first magnetic body and the second magnetic body and (ii) a height perpendicular to the width and being uniform along the entire distance between the first magnetic body and the second magnetic body, and is arranged to be supported directly by the base from behind the first magnetic body and the second magnetic body,
wherein the first magnetic body, the second magnetic body and the magnetic field distribution change member are supported at different levels on the base while an upper surface of the magnetic field distribution change member is disposed at a level different from both upper surfaces of the first and second magnetic bodies.

16. The magnetron cathode according to claim 15 , wherein the level difference between the base end portions of the first and second magnetic bodies is 10 to 30% of the height of the first magnetic body.

17. A sputtering apparatus provided with a magnetron cathode, wherein
the magnetron cathode has a magnetic field generator arranged behind a target for generating a magnetic field on a front surface of the target based on magnetic force lines, and
the magnetic field generator comprises
a ring-shaped first magnetic body having a pole axis in a parallel direction with respect to a surface of the target,
a ring-shaped second magnetic body arranged on an inner side of the first magnetic body and having a pole axis in a parallel direction with the pole axis direction of the first magnetic body,
a magnetic permeable base supporting the first magnetic body and the second magnetic body from behind, and
a magnetic field distribution change member for changing a magnetic field distribution on a front surface of the target;

wherein the magnetic field distribution change member has (i) a width corresponding to a distance between the first magnetic body and the second magnetic body and (ii) a height perpendicular to the width and being uniform along the entire distance between the first magnetic body and the second magnetic body, and is arranged to be supported directly by the base from behind the first magnetic body and the second magnetic body,
wherein the first magnetic body, the second magnetic body and the magnetic field distribution change member are supported at different levels on the base while an upper surface of the magnetic field distribution change member is disposed at a level different from both upper surfaces of the first and second magnetic bodies.

18. The sputtering apparatus according to claim 17 , wherein the level difference between the base end portions of the first and second magnetic bodies is 10 to 30% of the height of the first magnetic body.

Assignees

• Kong Wei
• Lin Zijing
• Li Ming
• Xie Bin
• Wang Haiqian
• Jiang Yousong
• Nagae Ekishu
• Shincron Co Ltd
• Univ Science & Technology China

Inventors

• Kong Wei
• Lin Zijing
• Li Ming
• Xie Bin
• Wang Haiqian
• Jiang Yousong
• Nagae Ekishu

Classifications

• C23C14/351 Primary

  using a magnetic field in close vicinity to the substrate · CPC title

• H01J37/3405

  Magnetron sputtering · CPC title

• C23C14/35 Primary

  by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)} · CPC title

• H01F7/081

  Magnetic constructions · CPC title

• H01J25/50

  Magnetrons, i.e. tubes with a magnet system producing an H-field crossing the E-field (with travelling wave not moving completely around the electron space H01J25/42; functioning with plural reflection or with reversed cyclotron action H01J25/62, H01J25/64) · CPC title