Silicon wafer polishing composition
US-2017253767-A1 · Sep 7, 2017 · US
Lapping machines or devices; Accessories (B24B3/00 takes precedence)
Lapping machines or devices; Accessories (B24B3/00 takes precedence) · Cooperative Patent Classification (CPC)
Separating, mixing, shaping, printing, and transporting materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | B24B37/00 |
| Official title | Lapping machines or devices; Accessories (B24B3/00 takes precedence) |
| Display label | Lapping machines or devices; Accessories (B24B3/00 takes precedence) |
| Total patents | 634 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 32 |
| 2016 | 22 |
| 2017 | 47 |
| 2018 | 61 |
| 2019 | 66 |
| 2020 | 82 |
| 2021 | 57 |
| 2022 | 75 |
| 2023 | 70 |
| 2024 | 65 |
| 2025 | 49 |
| 2026 | 8 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Composition for polishing titanium alloy material
US-2017216993-A1 · Aug 3, 2017 · US
Techniques for combining cmp process tracking data with 3d printed cmp consumables
US-2017133252-A1 · May 11, 2017 · US
Method to selectively polish silicon carbide films
US-9548211-B2 · Jan 17, 2017 · US
Ceramic composite for light conversion and method for manufacture thereof
US-9543480-B2 · Jan 10, 2017 · US
Slurry for chemical mechanical polishing and polishing method for substrate using same
US-9536752-B2 · Jan 3, 2017 · US
Polishing composition
US-2016288289-A1 · Oct 6, 2016 · US
Slurry, polishing solution set, polishing solution, substrate polishing method, and substrate
US-2016280961-A1 · Sep 29, 2016 · US
Polishing composition and polishing processing method using same
US-2016257854-A1 · Sep 8, 2016 · US
Slurry for chemical mechanical polishing and chemical mechanical polishing method
US-9437446-B2 · Sep 6, 2016 · US
Method for manufacturing a rotor
US-2016228962-A1 · Aug 11, 2016 · US
Abrasive material, method for producing same, and abrasive slurry containing same
US-2016222265-A1 · Aug 4, 2016 · US
Polishing composition and method for producing same
US-2016215188-A1 · Jul 28, 2016 · US
Polishing composition and method for producing same
US-2016215189-A1 · Jul 28, 2016 · US
Alignment device for fiber ferrule, fiber alignment machine and fiber alignment method
US-2016209600-A1 · Jul 21, 2016 · US
Polishing head with alignment gear
US-9393668-B2 · Jul 19, 2016 · US
Polishing composition
US-2016186029-A1 · Jun 30, 2016 · US
Silica for cmp, aqueous dispersion, and process for producing silica for cmp
US-2016177155-A1 · Jun 23, 2016 · US
Grinding machine and grinding method
US-2016144475-A1 · May 26, 2016 · US
Polishing Composition and Polishing Method
US-2016136784-A1 · May 19, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC B24B37/00?
- CPC B24B37/00 is the Cooperative Patent Classification code for “Lapping machines or devices; Accessories (B24B3/00 takes precedence).”
- How many patents are filed under CPC B24B37/00 (Lapping machines or devices; Accessories (B24B3/00 takes precedence))?
- Our database includes 634 publications tagged with this CPC code.
- Is patent activity under CPC B24B37/00 growing?
- Publication counts under this code: 65 in 2024 vs 49 in 2025 (latest complete years).