Light irradiation type heat treatment apparatus and method for manufacturing heat treatment apparatus
US-10475674-B2 · Nov 12, 2019 · US
Heat treatment apparatus of light irradiation type
US2018261479A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2018261479-A1 |
| Application number | US-201815907262-A |
| Country | US |
| Kind code | A1 |
| Filing date | Feb 27, 2018 |
| Priority date | Mar 8, 2017 |
| Publication date | Sep 13, 2018 |
| Grant date | — |
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- Title
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Abstract
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A continuous lighting lamp irradiates a semiconductor wafer held by a quartz susceptor with light from below to perform preliminary heating, and then irradiation of a flash of light is performed by a flash lamp from above. A light absorption ring is provided so as to be close to a peripheral portion of the semiconductor wafer held by the susceptor. The light absorption ring absorbs infrared light and transmits visible light through itself. During preliminary heating, the light absorption ring absorbs light emitted from the continuous lighting lamp to be increased in temperature so that heat radiated from the peripheral portion of the wafer is compensated to cause in-plane temperature distribution of the semiconductor wafer to be uniform. Meanwhile, the flash of light is transmitted through the light absorption ring, so that the light absorption ring is prevented from being damaged by the irradiation of the flash of light.
First claim
Opening claim text (preview).
What is claimed is: 1 . A heat treatment apparatus that irradiates a substrate with a flash of light to heat the substrate, the heat treatment apparatus comprising: a chamber that accommodates a substrate; a quartz susceptor that holds said substrate in said chamber; a continuous lighting lamp that is provided under said chamber to irradiate a lower surface of said substrate held by said quartz susceptor with light; a flash lamp that is provided over said chamber to irradiate an upper surface of said substrate held by said quartz susceptor with a flash of light; and an infrared-light absorption component that is provided so as to be close to a peripheral portion of said substrate held by said quartz susceptor to absorb infrared light and transmit visible light through itself. 2 . A heat treatment apparatus that irradiates a substrate with a flash of light to heat the substrate, the heat treatment apparatus comprising: a chamber that accommodates a substrate; a quartz susceptor that holds said substrate in said chamber; a continuous lighting lamp that is provided under said chamber to irradiate a lower surface of said substrate held by said quartz susceptor with light; a flash lamp that is provided over said chamber to irradiate an upper surface of said substrate held by said quartz susceptor with a flash of light; and an infrared-light absorption component that is provided so as to be close to a peripheral portion of said substrate held by said quartz susceptor, and has an infrared light transmittance of 20% or less, and a visible light transmittance of 60% or more. 3 . The heat treatment apparatus according to claim 1 , further comprising: a drive assembly that moves up and down said infrared-light absorption component in said chamber. 4 . The heat treatment apparatus according to claim 1 , wherein said infrared-light absorption component is covered with a quartz covering member. 5 . The heat treatment apparatus according to claim 1 , wherein said quartz susceptor has a plane size smaller than a plane size of said substrate. 6 . The heat treatment apparatus according to claim 2 , further comprising: a drive assembly that moves up and down said infrared-light absorption component in said chamber. 7 . The heat treatment apparatus according to claim 2 , wherein said infrared-light absorption component is covered with a quartz covering member. 8 . The heat treatment apparatus according to claim 2 , wherein said quartz susceptor has a plane size smaller than a plane size of said substrate.
Assignees
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Classifications
characterised by a coating, a hardness or a material · CPC title
characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title
characterised by lifting arrangements, e.g. lift pins · CPC title
characterised by edge profile or support profile · CPC title
the wafers being placed on a robot blade or gripped by a gripper for conveyance · CPC title
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- What does patent US2018261479A1 cover?
- A continuous lighting lamp irradiates a semiconductor wafer held by a quartz susceptor with light from below to perform preliminary heating, and then irradiation of a flash of light is performed by a flash lamp from above. A light absorption ring is provided so as to be close to a peripheral portion of the semiconductor wafer held by the susceptor. The light absorption ring absorbs infrared lig…
- Who is the assignee on this patent?
- Screen Holdings Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification H10P72/0436. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Thu Sep 13 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).