Sputtering Target Material
US-2018245211-A1 · Aug 30, 2018 · US
US2017169946A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2017169946-A1 |
| Application number | US-201615378998-A |
| Country | US |
| Kind code | A1 |
| Filing date | Dec 14, 2016 |
| Priority date | Dec 14, 2015 |
| Publication date | Jun 15, 2017 |
| Grant date | — |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A method of making a ferrite thin film is provided in which a portion of the iron ions in the ferrite are substituted by ions of at least one other metal. The substituting ions occupy both tetrahedral and octahedral sites in the unit cell of the ferrite crystal. The method includes placing each of a plurality of targets, one at a time, in close proximity to a substrate in a defined sequence; ablating the target thus placed using laser pulses, thereby causing ions from the target to deposit on the substrate; repeating these steps, thereby generating a film; and annealing the film in the presence of oxygen. The plurality of targets, the sequence of their ablation, and the number of laser pulses that each target is subjected to, are selected so as to allow the substituting ions to occupy both tetrahedral and octahedral sites in the unit cell.
Opening claim text (preview).
1 . A method of making a ferrite thin film in which a portion of the iron ions in the ferrite are substituted by ions of at least one other metal, the substituting ions occupying both tetrahedral and octahedral sites in the unit cell of the ferrite crystal, the method comprising the steps of: (a) providing a substrate and a plurality of targets; (b) placing each target, one at a time, in close proximity to the substrate in a defined sequence; (c) ablating the target thus situated using laser pulses, thereby causing ions from the target to deposit on the substrate; (d) repeating steps (b) and (c), thereby generating a film; and (e) annealing the film in the presence of oxygen; wherein the plurality of targets, the sequence of their ablation, and the number of laser pulses that each target is subjected to, are selected so as to allow the substituting ions to occupy both tetrahedral and octahedral sites in the unit cell, whereby the ferrite thin film is produced. 2 . The method of claim 1 , wherein the ferrite is a cubic ferrite. 3 . The method of claim 1 , wherein the ferrite is a hexaferrite of the M-, U-, W-, X-, Y-, or Z-type. 4 . The method of claim 3 , wherein the ferrite is an M-type hexaferrite. 5 . The method of claim 4 , wherein the M-type hexaferrite has the composition Sr 2+ Co x 2+ Ti 3−0.5x 4+ Fe 8 3+ O 19 2− , wherein x is from 1.2 to 3.5. 6 . The method of claim 5 , wherein x is 2.0. 7 . The method of claim 6 , wherein a first target and a second target are provided, the first target being SrFe (4−δ) Ti 0.5δ Co 0.5δ Co 0.5δ O 7 , which is used to form an R block in the unit cell, wherein δ is 0 or 0.2. 8 . The method of claim 7 , wherein the second target is Fe (1+0.25δ) Ti 0.5(1−0.25δ) Co 0.5(1−0.25δ) O 3 , which is used to form an S block in the unit cell, wherein δ is 0or 0.2. 9 . The method of claim 8 , wherein the laser pulses used for ablation of the first and the second targets are unequal in number. 10 . The method of claim 9 , wherein the substrate is heated to 600° C. 11 . The method of claim 10 , wherein step (e) is carried out at 1050° C. for 40 minutes. 12 . A ferrite thin film made according to the method of claim 1 . 13 . (canceled) 14 . The ferrite of claim 12 , wherein the ferrite is a hexaferrite of the M-, U-, W-, X-, Y-, or Z-type. 15 . The hexaferrite of claim 14 , wherein the hexaferrite is an M-type hexaferrite. 16 . The M-type hexaferrite of claim 15 having the composition Sr 2+ Co x 2+ Ti 3−0.5x 4+ Fe 8 3+ O 19 2− , wherein x is 1.2 to 3.5. 17 . The M-type hexaferrite of claim 15 having the composition Sr 2+ Co x 2+ Ti 3−0.5x 4+ Fe 8 3+ O 19 2− , wherein x is 2.0. 18 . The M-type hexaferrite of claim 17 having the composition Sr 2+ Co x 2+ Ti 3−0.5x 4+ Fe 8 3+ O 19 2− , wherein, two targets, a first target and a second target are provided for its preparation, the first target being SrFe (4−δ) Ti 0.5δ Co 0.5δ O 7 , which is used to form an R block in the unit cell, δ being 0 or 0.2. 19 . The M-type hexaferrite of claim 18 having the composition Sr 2+ Co x 2+ Ti 3−0.5x 4+ Fe 8 3+ O 19 2− , wherein the second target is Fe (1+0.25δ) Ti 0.5(1−0.25δ) Co 0.5(1−0.25δ) O 3 , which is used to form an S block in the unit cell, δ being 0 or 0.2. 20 . The M-type hexaferrite of claim 19 having the composition Sr 2+ Co x 2+ Ti 3−0.5x 4+ Fe 8 3+ O 19 2− , wherein the laser pulses used for ablation of the first and the second targets are unequal in number. 21 .- 33 . (canceled) 34 . An electromagnetic device comprising the ferrite thin film according to claim 12 . 35 . (canceled)
characterised by magnetic layers ({H01F10/32 takes precedence } ; applying thin magnetic films to substrates H01F41/14) · CPC title
Sputtering targets therefor · CPC title
by wave energy or particle radiation (C23C14/32 - C23C14/48 take precedence) · CPC title
Heat treatment; Thermal decomposition; Chemical vapour deposition · CPC title
Ferrites · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.