Magnetic material sputtering target and method for producing same
US-2016237552-A1 · Aug 18, 2016 · US
Sputtering Target Material
US2018245211A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2018245211-A1 |
| Application number | US-201615760421-A |
| Country | US |
| Kind code | A1 |
| Filing date | Sep 16, 2016 |
| Priority date | Sep 18, 2015 |
| Publication date | Aug 30, 2018 |
| Grant date | — |
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Abstract
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An object of the present invention is to reduce particles generated in sputtering, and in order to achieve such an object, there is provided a sputtering target material including in at. %: 10 to 50% of B; and the balance of at least one of Co and Fe, and unavoidable impurities, in which the intensity ratio [I [(CoFe) 3 B]/I [(CoFe) 2 B]] of the X-ray diffraction intensity [I [(CoFe) 3 B]] of (CoFe) 3 B (121) to the X-ray diffraction intensity [I [(CoFe) 2 B]] of (CoFe) 2 B (200), the intensity ratio [I (Co 3 B)/I (Co 2 B)] of the X-ray diffraction intensity [I (Co 3 B)] of Co 3 B (121) to the X-ray diffraction intensity [I (Co 2 B)] of Co 2 B (200), or the intensity ratio [I (Fe 3 B)/I (Fe 2 B)] of the X-ray diffraction intensity [I (Fe 3 B)] of Fe 3 B (121) to the X-ray diffraction intensity [I (Fe 2 B)] of Fe 2 B (200) is 1.50 or less.
First claim
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1 . A sputtering target material comprising in at. %: 10 to 50% of B; and the balance of at least one of Co and Fe, and unavoidable impurities, wherein the intensity ratio [I [(CoFe) 3 B]/I [(CoFe) 2 B]] of the X-ray diffraction intensity [I [(CoFe) 3 B]] of (CoFe) 3 B (121) to the X-ray diffraction intensity [I [(CoFe) 2 B]] of (CoFe) 2 B (200), the intensity ratio [I (Co 3 B)/I (Co 2 B)] of the X-ray diffraction intensity [I (Co 3 B)] of Co 3 B (121) to the X-ray diffraction intensity [I (Co 2 B)] of Co 2 B (200), or the intensity ratio [I (Fe 3 B)/I (Fe 2 B)] of the X-ray diffraction intensity [I (Fe 3 B)] of Fe 3 B (121) to the X-ray diffraction intensity [I (Fe 2 B)] of Fe 2 B (200) is 1.50 or less. 2 . The sputtering target material according to claim 1 , wherein the sputtering target material comprises the balance of Co and Fe, and unavoidable impurities; and the intensity ratio [I [(CoFe) 3 B]/I [(CoFe) 2 B]] of the X-ray diffraction intensity [I [(CoFe) 3 B]] of (CoFe) 3 B (121) to the X-ray diffraction intensity [I [(CoFe) 2 B]] of (CoFe) 2 B (200) is 1.50 or less. 3 . The sputtering target material according to claim 1 , wherein the sputtering target material comprises the balance of Co and unavoidable impurities; and the intensity ratio [I (Co 3 B)/I (Co 2 B)] of the X-ray diffraction intensity [I (Co 3 B)] of Co 3 B (121) to the X-ray diffraction intensity [I (Co 2 B)] of Co 2 B (200) is 1.50 or less. 4 . The sputtering target material according to claim 1 , wherein the sputtering target material comprises the balance of Fe and unavoidable impurities; and the intensity ratio [I (Fe 3 B)/I (Fe 2 B)] of the X-ray diffraction intensity [I (Fe 3 B)] of Fe 3 B (121) to the X-ray diffraction intensity [I (Fe 2 B)] of Fe 2 B (200) is 1.50 or less.
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Classifications
containing cobalt · CPC title
containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60 · CPC title
Nickel or cobalt · CPC title
Plural materials · CPC title
Sputtering targets therefor · CPC title
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- What does patent US2018245211A1 cover?
- An object of the present invention is to reduce particles generated in sputtering, and in order to achieve such an object, there is provided a sputtering target material including in at. %: 10 to 50% of B; and the balance of at least one of Co and Fe, and unavoidable impurities, in which the intensity ratio [I [(CoFe) 3 B]/I [(CoFe) 2 B]] of the X-ray diffraction intensity [I [(CoFe) 3 B]] of (…
- Who is the assignee on this patent?
- Sanyo Special Steel Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification C23C14/3414. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Thu Aug 30 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).