Byproduct removal from electroplating solutions

Patent metadata

Field	Value
Publication number	US-12392047-B2
Application number	US-202017596929-A
Country	US
Kind code	B2
Filing date	Jun 23, 2020
Priority date	Jun 28, 2019
Publication date	Aug 19, 2025
Grant date	Aug 19, 2025

Abstract

Systems and methods for electroplating are provided. An electroplating system may include an electroplating cell configured to contain an anode and an electroplating solution, a wafer holder configured to support a wafer within the electroplating cell, a reservoir configured to contain at least a portion of the electroplating solution, a recirculation flowpath that fluidically connects the reservoir and the electroplating cell, in which the recirculation flowpath includes a pump and is configured to circulate the electroplating solution between the reservoir and the electroplating cell, and a frother fluidically connected to one or more of the electroplating cell, the reservoir, and the recirculation flowpath. The frother may be configured to generate bubbles in the electroplating solution when the electroplating solution is present in the electroplating system, interfaced with the frother, and the frother is activated.

First claim

What is claimed is:

1. An electroplating system comprising:
an electroplating cell configured to contain an anode and an electroplating solution;
a wafer holder configured to support a wafer within the electroplating cell;
a reservoir configured to contain at least a portion of the electroplating solution;
a recirculation flowpath that fluidically connects the reservoir and the electroplating cell, wherein the recirculation flowpath includes a pump and is configured to circulate the electroplating solution between the reservoir and the electroplating cell;
a frother fluidically connected to one or more of: the electroplating cell, the reservoir, and the recirculation flowpath; and
a container fluidically connected to one or more of: the electroplating cell, the reservoir, or the recirculation flowpath, and configured to receive and hold a first volume of the electroplating solution, wherein:
the frother is configured to:
generate bubbles in the electroplating solution in the container when the electroplating solution is present in the container, interfaced with the frother, and the frother is activated, and
generate a foam in the container which traps a byproduct of electroplating, the container has:
a foam exit port configured to allow the foam in the container to exit the container through the foam exit port, and
a fluid outlet lower in elevation than the foam exit port, and

the electroplating system is configured to remove the foam with the byproduct trapped therein from the electroplating system through the foam exit port in an unaided manner, and
the foam is configured to flow out of the container with the assistance of gravity and/or a pressure of the foam in the container.

2. The electroplating system of claim 1 , wherein the frother comprises at least one of: an aeration stone, one or more jets, one or more nozzles, a propeller, and an impeller.

3. The electroplating system of claim 2 , wherein:
the frother comprises the aeration stone, and
the aeration stone is comprised of a material compatible with the electroplating solution.

4. The electroplating system of claim 3 , wherein the material includes one or more of: a high-density polyethylene (HDPE), a polypropylene (PP), and polytetrafluoroethylene (PTFE).

5. The electroplating system of claim 4 , wherein a porosity of the material is between about 1 millimeter and about 1 micron.

6. The electroplating system of claim 3 , further comprising a gas source fluidically connected to the frother and configured to flow a gas to the aeration stone.

7. The electroplating system of claim 1 , further comprising a foam generating unit that includes the container and the frother, wherein the foam generating unit is fluidically connected to one or more of: the electroplating cell, the reservoir, or the recirculation flowpath.

8. The electroplating system of claim 1 , wherein the container is physically separate from, but fluidically connected to, one or more of: the electroplating cell, the reservoir, or the recirculation flowpath.

9. The electroplating system of claim 1 , wherein the container is at least partially positioned in one of: the electroplating cell, the reservoir, or the recirculation flowpath.

10. The electroplating system of claim 1 , wherein the container is fluidically interposed between the electroplating cell and the reservoir.

11. The electroplating system of claim 1 , wherein the frother comprises a propeller or an impeller.

12. The electroplating system of claim 1 , wherein:
the container includes a fluid inlet, and
the foam exit port is higher in elevation than the fluid inlet.

13. The electroplating system of claim 1 , further comprising a controller configured to control the frother, wherein the controller comprises control logic for:
causing the electroplating solution to flow into the container and be held by the container, and
causing the frother to generate bubbles in the electroplating solution held in the container.

14. The electroplating system of claim 13 , further comprising one or more inlet valves configured to control flow of the electroplating solution into the container, wherein:
the controller is further configured to control the one or more inlet valves, and
the controller further comprises control logic for causing the one or more inlet valves to open to allow the electroplating solution to flow into the container.

15. The electroplating system of claim 14 , wherein:
the system is further configured such that the electroplating solution flows into and out of the container through a common flowpath,
the one or more inlet valves are configured to control flow of the electroplating solution into the container through the common flowpath,
the one or more inlet valves are further configured to also control flow of the electroplating solution out of the container through the common flowpath, and
the controller further comprises control logic for causing the one or more inlet valves to close to allow the container to hold the electroplating solution in the container.

16. The electroplating system of claim 14 , further comprising one or more outlet valves configured to control flow of the electroplating solution out of the container, wherein:
the controller is further configured to control the one or more outlet valves, and
the controller further comprises control logic for:
causing the one or more outlet valves to close to allow the container to hold the electroplating solution in the container, and
causing the one or more outlet valves to open to allow the electroplating solution to flow out the container.

17. The electroplating system of claim 1 , wherein:
the electroplating system is configured to hold a total working volume of electroplating solution, and
the container is configured to hold up to 5% of the total working volume of electroplating solution.

18. The electroplating system of claim 1 , further comprising a controller configured to control the frother, wherein the controller comprises control logic for causing the frother to generate bubbles in the electroplating solution during one or more time periods when the electroplating solution is present in the electroplating system and interfaced with the frother.

19. The electroplating system of claim 18 , wherein the controller further comprises control logic for:
causing the frother to generate bubbles in the electroplating solution when the electroplating solution is present in the electroplating system and interfaced with the frother for a first time period, and
causing the frother to repeat the generation of bubbles at a first time interval.

20. The electroplating system of claim 18 , further comprising a power supply electrically connected to the wafer holder and the electroplating cell, wherein:
the power supply is configured to apply a voltage to a wafer held by the wafer holder,
the controller further comprises control logic for:
causing the power supply to apply a voltage to a wafer held by the wafer holder and the electroplating cell, and
measuring a voltage potential between the wafer and the electroplating cell, and

the causing the frother to generate bubbles in the electroplating solution is further based, at least in part, on the measured voltage.

21. The electroplating system of claim 20 , wherein:
the controller further comprises control logic for determining a change in the voltage potential between the wafer and the electroplating cell, and
the causing the frother to generat

Assignees

• Lam Res Corp

Inventors

• Richardson Joseph
• Shin Jae
• Velmurugan Jeyavel
• Calora Elizabeth
• Ponnuswamy Thomas Anand
• Mayer Steven T

Classifications

• C25D5/56

  of plastics · CPC title

• C25D3/38

  of copper · CPC title

• C25D17/001 Primary

  Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells · CPC title

• C25D17/00

  Constructional parts, or assemblies thereof, of cells for electrolytic coating · CPC title

• C25D21/12

  Process control or regulation (controlling or regulating in general G05) · CPC title