Electroplating system and method of using electroplating system for controlling concentration of organic additives in electroplating solution

Patent metadata

Field	Value
Publication number	US-2018016699-A1
Application number	US-201715708281-A
Country	US
Kind code	A1
Filing date	Sep 19, 2017
Priority date	Oct 24, 2014
Publication date	Jan 18, 2018
Grant date	—

Abstract

Electroplating techniques including an electroplating system and a method for using the electroplating system are provided. The electroplating system has: an electroplating apparatus for electroplating a workpiece, the electroplating apparatus has an electroplating tank configured to contain a solution including target organics; a first reservoir configured to receive the solution including the target organics from the electroplating tank, and to hold the solution including the target organics; a foaming mechanism configured to, in the first reservoir, separate the target organics from the solution through foaming action such that the solution with a reduced concentration of the target organics is separated from a foam including the separated target organics; and a diverting mechanism configured to selectively feed the solution with the reduced concentration of the target organics to one of the first reservoir and the electroplating tank of the electroplating apparatus.

First claim

What is claimed is:

1 . An electroplating method comprising:
controlling a first reservoir to receive a solution including target organics from an electroplating tank of an electroplating apparatus for electroplating a workpiece, and to hold the solution including the target organics; controlling a foaming mechanism to, in the first reservoir, separate the target organics from the solution through foaming action such that the solution with a reduced concentration of the target organics is separated from a foam including the separated target organics; and controlling a diverting mechanism to selectively feed the solution with the reduced concentration of the target organics to one of the first reservoir and the electroplating tank of the electroplating apparatus.

2 . The electroplating method according to claim 1 , further comprising controlling a foam removal mechanism to remove the foam formed by the foaming mechanism from the first reservoir.

3 . The electroplating method according to claim 2 , wherein the foam removal mechanism comprises a paddle wheel configured to remove the foam formed by the foaming mechanism from the first reservoir; the method further comprising controlling the paddle wheel to remove the foam formed by the foaming mechanism from the first reservoir.

4 . The electroplating method according to claim 1 ,
wherein a second reservoir is configured to receive the solution with the reduced concentration of the target organics that is separated from the foam including the separated target organics, and wherein the step of controlling the diverting mechanism comprises controlling the diverting mechanism to selectively feed the solution with the reduced concentration of the target organics from the second reservoir to one of the first reservoir and the electroplating tank of the electroplating apparatus.

5 . The electroplating method according to claim 4 ,
wherein the first reservoir forms a weir, and the first reservoir and the second reservoir are arranged such that the solution with the reduced concentration of the target organics flows over the weir and collects in the second reservoir.

6 . The electroplating method according to claim 5 , further comprising collecting the foam including the separated target organics with a mesh and passing the solution with the reduced concentration of the target organics to the second reservoir.

7 . The electroplating method according to claim 1 , wherein the step of controlling the foaming mechanism comprises controlling the foaming mechanism to disperse air or a specific gas in the solution including the target organics to foam the solution such that a quantity of the target organics is collected in the foam.

8 . The electroplating method according to claim 7 , wherein controlling the foaming mechanism comprises controlling a sparger to disperse the air or the specific gas in the solution including the target organics to foam the solution such that the quantity of the target organics is collected in the foam.

9 . The electroplating method according to claim 1 , further comprising controlling the diverting mechanism to selectively feed the solution with the reduced concentration of the target organics to one of the first reservoir and the electroplating tank of the electroplating apparatus.

10 . The electroplating method according to claim 9 , wherein controlling the diverting mechanism to selectively feed the solution with the reduced concentration of the target organics to one of the first reservoir and the electroplating tank of the electroplating apparatus comprises controlling a diverter valve of the diverting mechanism.

11 . The electroplating method according to claim 9 , wherein the step of controlling the diverting mechanism comprises:
determining whether the concentration of the target organics in the solution is at or below a predetermined concentration; and controlling the diverting mechanism to divert the solution with the reduced concentration of the target organics to the electroplating tank after determining that the concentration of the target organics in the solution is at or below the predetermined concentration.

12 . The electroplating method according to claim 1 , wherein the electroplating tank is arranged relative to the first reservoir such that a portion of the solution overflowing from the electroplating tank cascades into the reservoir.

Assignees

• Globalfoundries Inc

Inventors

• Arvin Charles L
• Biggs Glen N
• Palmatier Phillip W
• Sorbello Joseph C
• Tong Tracy A
• Torres Freddie

Classifications

• C25D21/14

  Controlled addition of electrolyte components · CPC title

• C25D21/18 Primary

  of electrolytes (C25D21/22 takes precedence) · CPC title