Multi-beam particle beam system and method for operating same

Patent metadata

Field	Value
Publication number	US-12255040-B2
Application number	US-202117215995-A
Country	US
Kind code	B2
Filing date	Mar 29, 2021
Priority date	Oct 1, 2018
Publication date	Mar 18, 2025
Grant date	Mar 18, 2025

Abstract

A method of operating a multi-beam particle beam system includes: generating a multiplicity of particle beams such that they each pass through multipole elements that are either intact or defective; focusing the particle beams in a predetermined plane; determining excitations for the deflection elements of the multipole elements; exciting the deflection elements of the multipole elements that are intact with the determined excitations; modifying the determined excitations for the deflection elements of the multipole elements that are defective; and exciting the deflection elements of the defective multipole elements with the modified excitations. Modifying the determined excitations includes adding corrective excitations to the determined excitations. The corrective excitations are the same for all deflection elements of the defective multipole element.

First claim

What is claimed is:

1. A method, comprising:
generating a plurality of particle beams such that each particle beam passes through a multipole element, wherein each multipole element comprises a plurality of deflection elements arranged in a circumferential direction around a center of the multipole element, and each multipole element is either intact or defective;
focusing the particle beams in a predetermined plane;
determining excitations for the deflection elements of the multipole elements to influence the particle beams passing through the multipole elements, wherein the excitations for the deflection elements of each multipole element are determined such that focusing of each particle beam in the predetermined plane satisfies a predetermined criterion;
exciting the deflection elements of the multipole elements that are intact with the determined excitations;
modifying the determined excitations for the deflection elements of at least one multipole element of the multipole elements that are defective; and
exciting the deflection elements of the defective multipole element with the modified excitations,
wherein modifying the determined excitations comprises adding corrective excitations to the determined excitations, and the corrective excitations are the same for all deflection elements of the defective multipole element.

2. The method of claim 1 , wherein:
the defective multipole element comprises a defective deflection element, the excitation of which is not settable and is a specified excitation prescribed by the defect; and
modifying the determined excitations comprises determining the corrective excitations such that the excitation for the defective deflection element is equal to the specified excitation.

3. The method of claim 1 , wherein:
the deflection elements comprise electrodes;
determining the excitations comprises determining voltages; and
exciting the electrodes comprises applying the voltages to the electrodes.

4. The method of claim 1 , further comprising checking the multipole elements, and determining the intact multipole elements and the defective multipole elements based on the check.

5. The method of claim 1 , further comprising evaluating a provided data set, and determining the intact multipole elements and the defective multipole elements on the basis of the evaluation of the provided data set.

6. The method of claim 1 , further comprising determining variables representing a desired influencing of the particle beam passing through the multipole element for each of the multipole elements.

7. The method of claim 6 , wherein determining the excitations for the deflection elements of the multipole element is performed such that, when the deflection elements of the multipole element are excited with the determined excitations, the desired influencing of the particle beam passing through the multipole element is achieved.

8. The method of claim 6 , wherein the variables comprise an astigmatism of the particle beam that is to be compensated.

9. A multi-beam particle beam system, comprising:
a plurality of multi-aperture plates arranged one behind the other along a beam path, each multi-aperture plate comprising a multiplicity of openings;
a controllable deflection element for a first subset of the openings in each of the plurality of multi-aperture plates; and
a multi-beam particle source configured to generate a multiplicity of particle beams so that each particle beam successively passes through the plurality of multi-aperture plates through their openings,
wherein the first subsets of the openings in the plurality of multi-aperture plates are configured so that, during use of the multi-beam particle beam system, each particle beam passes through exactly one opening in the plurality of multi-aperture plates at which the at least one controllable deflection element is provided.

10. The multi-beam particle beam system of claim 9 , further comprising a controller configured to excite the at least one controllable deflection element with settable excitations.

11. The multi-beam particle beam system of claim 9 , further comprising a deflection element in a second subset of the openings in at least one multi-aperture plate of the plurality of multi-aperture plates, wherein excitation of the deflection element is specified and not settable.

12. The multi-beam particle beam system of claim 9 , wherein the controllable deflection element comprises an electrode connected in an electrically conductive manner to a voltage supply system.

13. The multi-beam particle beam system of claim 9 , comprising:
a multi-aperture plate that has a multiplicity of openings;
a plurality of controllable deflection elements configured so that a controllable deflection element is at each openings in the multi-aperture plate; and
a voltage supply system configured to supply settable excitations to the deflection elements via supply lines,
wherein:
a plurality of the openings in the multi-aperture plate are assignable to a plurality of groups of openings;
each opening contained in one of the groups of openings is not contained in any other of the groups of openings; and
for each openings of any given group of openings, the opening has at least one deflection element connected to a given supply line such that a plurality of deflection elements are jointly connected to the given supply line.

14. The multi-beam particle beam system of claim 13 , wherein, for each opening of any given group of the plurality of groups, its nearest neighbors belong to the given group of openings.

15. A multi-beam particle beam system, comprising:
a multi-aperture plate that has a multiplicity of openings;
a plurality of controllable deflection elements configured so that a controllable deflection element is at each openings in the multi-aperture plate; and
a voltage supply system configured to supply settable excitations to the deflection elements via supply lines,
wherein:
a plurality of the openings in the multi-aperture plate are assignable to a plurality of groups of openings;
each opening contained in one of the groups of openings is not contained in any other of the groups of openings; and
for each openings of any given group of openings, the opening has at least one deflection element connected to a given supply line such that a plurality of deflection elements are jointly connected to the given supply line.

16. The multi-beam particle beam system of claim 15 , wherein, for each opening of any given group of the plurality of groups, its nearest neighbors belong to the given group of openings.

17. The multi-beam particle beam system of claim 15 , wherein, for each opening, the opening has an identical multiplicity of deflection elements distributed in a circumferential direction around the opening.

18. The multi-beam particle beam system of claim 17 , wherein each opening has eight deflection elements.

19. The multi-beam particle beam system of claim 15 , wherein, over all groups, an arithmetic mean of a number of openings that belong to the same group of openings is from two to three.

20. The multi-beam particle beam system of claim 15 , further comprising:
a multi-beam particle source configured to generate a multiplicity of particle beams so that each particle beam passes through an opening in the multi-aperture plate;
a particle source configured to generate particles that partly pass through the openings in the multi-aperture plate; and
a plurality of lenses in the beam path downstream of the

Assignees

• Carl Zeiss Multisem Gmbh

Inventors

• Zeidler Dirk
• Riedesel Christof
• Thoma Arne
• Metalidis Georgo
• Jacobi Joerg
• Schubert Stefan
• Lenke Ralf
• Bihr Ulrich
• Sarov Yanko
• Kurij Georg

Classifications

• H01J2237/24564

  Measurements of electric or magnetic variables, e.g. voltage, current, frequency · CPC title

• H01J2237/1532

  Astigmatism · CPC title

• H01J2237/0453

  multiple apertures · CPC title

• H01J37/28 Primary

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J37/153

  Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators · CPC title