Multi-beam particle microscope and method for operating same
US-9536702-B2 · Jan 3, 2017 · US
US12057290B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12057290-B2 |
| Application number | US-202217572767-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 11, 2022 |
| Priority date | Jul 31, 2019 |
| Publication date | Aug 6, 2024 |
| Grant date | Aug 6, 2024 |
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A method includes operating a multiple particle beam system at different working points. The numerical aperture can be set for each of the working points in such a way that the resolution of the multiple particle beam system is optimal. In the process, the beam pitch between adjacent individual particle beams on the sample to be scanned is kept constant as a boundary condition. There are no mechanical reconfigurations of the system whatsoever for the purposes of varying the numerical aperture.
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What is claimed is: 1. A method of operating a multiple particle beam system, the particle-optical system comprising a plurality of particle-optical components, the plurality of particle-optical components comprising a multi-beam generator to generate a multiplicity of charged individual particle beams from one particle beam so that particle-optical components are substantially passed through by the individual particle beam or by the multiplicity of individual particle beams, effects of the particle-optical components on the individual particle beam or on the multiplicity of individual particle beams being adjustable, the method comprising: setting the effects of the particle-optical components at a first working point of the system so that a first plane with particles of the individual particle beams is imaged in particle-optical fashion into a second plane, wherein: when applying the settings for the first working point, the particle-optical imaging is characterizable via a multiplicity of n mutually independently adjustable particle-optical parameters p (p 11 . . . pn 1 ); p 11 represents the beam pitch between adjacent individual particle beams in the first plane; p 21 represents the beam pitch between adjacent individual particle beams in the second plane; p 31 represents the numerical aperture of the multi-beam particle optical unit in relation to the second plane; the values of p 11 and p 31 are altered when applying the settings at the first working point; and the values of the remaining parameters p are kept substantially constant when applying the settings at the first working point so that p 21 is kept substantially constant. 2. The method of claim 1 , wherein the number of mutually independently adjustable parameters p which are kept constant is at least one less than the number of all effects Wij of the particle-optical components available in the system. 3. The method of claim 1 , wherein at least one of the following holds: a variation of the pitch between the individual particle beams in the first plane is substantially set by setting an effect on the multi-beam generator; and the focus in the second plane is substantially set by setting an effect at a different particle-optical component to the multi-beam generator. 4. The method of claim 1 , comprising optimizing the numerical aperture in the second plane. 5. The method of claim 1 , wherein the numerical aperture in the second plane is variable by at least 10%. 6. The method of claim 1 , comprising optimizing the resolution of the particle-optical imaging. 7. The method of claim 1 , comprising iteratively setting the effects at the first working point. 8. The method of claim 1 , wherein setting the effects comprises setting a voltage and/or a current. 9. The method of claim 1 , wherein at least one of the following holds during the method: no mechanically adjustable parameter k is altered on the particle-optical system; neither a diameter of holes in a multi-aperture plate of the multi-beam generator nor the pitches thereof in relation to one another are altered; the multi-beam generator or one of its components is not structurally modified, not replaced in full or in part and not displaced in terms of its position; and the position of the second plane and of the object remains unaltered. 10. The method of claim 1 , wherein the first working point is defined by at least one parameter selected from the group consisting of a current intensity of the individual particle beams, a landing energy, a position of the object, and a diameter of the individual beam source. 11. The method of claim 1 , wherein the parameters p describe at least one member selected from the group consisting of the beam pitch of the individual particle beams in the first plane, the beam pitch of the individual particle beams in the second plane, a position of the second plane, telecentricity of the individual particle beams, a rotation of the individual particle beams. 12. The method of claim 1 , wherein the first plane is an intermediate image plane, and/or the second plane is an object plane. 13. The method of claim 1 , wherein the multi-beam generator comprises a multi-lens array, and/or the image in the first plane is a real intermediate image. 14. The method of claim 1 , wherein the multi-beam generator comprises a multi-deflector array, and/or the image in the first plane is a virtual intermediate image. 15. The of claim 1 , further comprising: defining a second working point of the system; and setting the effects of the particle-optical components at the second working point of the system so that the first plane with particles of the individual particle beams is imaged in particle-optical fashion into the second plane, wherein: when applying the settings for the second working point, the particle-optical imaging is once again characterizable by the n particle-optical parameters p (p 12 . . . pn 2 ); p 12 represents the beam pitch between adjacent individual particle beams in the first plane; p 22 represents the beam pitch between adjacent individual particle beams in the second plane; p 32 represents the numerical aperture of the multi-beam particle optical unit in relation to the second plane; when applying the settings at the second working point, p 12 ≠p 11 , p 32 ≠p 31 , p 22 =p 21 , and the values of the remaining parameters p are kept substantially constant in comparison with their values at the first working point of the system. 16. The method of claim 1 , further comprising iteratively setting the effects at the second working point. 17. The method of claim 1 , further comprising repeating some or all of the method. 18. The method of claim 1 , wherein the ascertained effects for one or more working points are stored in a lookup table. 19. One or more machine-readable hardware storage devices comprising instructions that are executable by one or more processing devices to perform operations comprising the method of claim 1 . 20. A system comprising: one or more processing devices; and one or more machine-readable hardware storage devices comprising instructions that are executable by the one or more processing devices to perform operations comprising the method of claim 1 . 21. A method for operating a multiple particle beam system comprising a plurality of particle-optical components, the plurality of particle-optical components comprising a multi-beam generator to generate a multiplicity of charged individual particle beams from one particle beam so that particle-optical components are substantially passed through by the individual particle beam or by the multiplicity of individual particle beams, effects of the particle-optical components on the individual particle beam or on the multiplicity of individual particle beams being adjustable, the method comprising: setting the effects of the particle-optical components at a first working point of the system so that a first plane with particles of the individual particle beams is imaged in particle-optical fashion into a second plane, wherein, when applying the settings for the first working point, the beam pitch between adjacent individual particle beams in the first plane is altered, the numerical aperture of the multi-beam particle optical unit in relation to the second plane is altered, and the beam pitch between adjacent individual particle beams in the second plane is kept substantially constant. 22. A method for operating a multi
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