Device and method for bonding of two substrates
US-11276589-B2 · Mar 15, 2022 · US
US11562912B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11562912-B2 |
| Application number | US-202217575101-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 13, 2022 |
| Priority date | Sep 29, 2016 |
| Publication date | Jan 24, 2023 |
| Grant date | Jan 24, 2023 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A device, a system and a method for bonding two substrates. A first substrate holder has a recess and an elevation.
Opening claim text (preview).
What is claimed is: 1. A device for bonding a first substrate surface of a first substrate to a second substrate surface of a second substrate, said device comprising: a first substrate holder for accommodating the first substrate, and a second substrate holder for accommodating the second substrate, wherein the first substrate holder has a first recess with a fixing device for fixing the first substrate in the first recess, a first elevation at least partly surrounding the first recess; and at least one hole communicating with the first recess for evacuating and/or flushing an interior space of the device before and/or during and/or after bonding of the first substrate and the second substrate, wherein the at least one hole is useable to build up an overpressure in the interior space, the overpressure generated by a gas and/or a gas mixture, which is directed via the at least one hole. 2. The device according to claim 1 , wherein the gas and/or the gas mixture is a gas and/or a gas mixture with a negative Joule-Thompson coefficient (JTC). 3. The device according to claim 2 , wherein the gas and/or the gas mixture with the negative JTC includes helium, hydrogen, or neon. 4. The device according to claim 1 , wherein the overpressure is a pressure that is greater than 1 bar. 5. The device according to claim 1 , wherein the at least one hole is for evacuating and/or flushing the first recess, wherein the at least one hole is arranged in a symmetrically distributed manner. 6. The device according to claim 1 , wherein the first elevation is formed annularly around the first recess. 7. The device according to claim 1 , wherein the first elevation has a first expansion surface for expansion of the first substrate surface. 8. The device according to claim 7 , wherein the first recess and/or the first elevation is/are adapted to the first substrate in such a manner that the first substrate surface with the first expansion surface forms a substantially continuous surface and/or merges into the first elevation. 9. The device according to claim 7 , wherein the first recess and/or the first elevation is adaptable manually and/or semi-automatically and/or automatically such that the first substrate surface forms a substantially continuous surface with the first expansion surface and/or merges into the first elevation. 10. The device according to claim 7 , wherein a vertical distance between the first substrate surface and the first expansion surface is adjustable. 11. The device according to claim 1 , wherein the first substrate holder has an outer component and an inner component movable in the outer component, wherein the outer and/or the inner component is translationally and/or rotatably movable, and the outer and inner components are fixable to one another. 12. The device according to claim 11 , wherein the at least one hole is arranged in a symmetrically distributed manner in the inner component. 13. The device according to claim 1 , wherein the second substrate holder has a second recess with a fixing device for fixing the second substrate in the second recess, and a second elevation at least partly surrounding the second recess. 14. The device according to claim 13 , wherein the second elevation has a second expansion surface for expansion of the second substrate surface. 15. The device according to claim 14 , wherein a vertical distance between the second substrate surface and the second expansion surface is adjustable. 16. The device according to claim 1 , wherein the first elevation has an inwardly and/or outwardly curved expansion surface. 17. The device according to claim 1 , wherein the first elevation has an inwardly and/or outwardly bevelled extension surface at an angle (a). 18. The method for bonding a first substrate surface of a first substrate to a second substrate surface of a second substrate by means of a device according to claim 1 , wherein a gas arranged between the first and second substrate surfaces during the bonding process is displaced from a centre to an edge of the first and second substrates, wherein an interior space of the device is evacuated and/or flushed through the at least one hole before and/or during and/or after the bonding of the first substrate and the second substrate; and wherein an overpressure is built up in the interior space by directing a gas and/or a gas mixture from the at least one hole.
using bonding · CPC title
characterised by edge profile or support profile · CPC title
by direct semiconductor to semiconductor bonding · CPC title
Apparatus for mechanical treatment or grinding or cutting · CPC title
Electricity · mapped topic
Related publications grouped by family.
Answers are generated from the same data shown on this page.