Device and method for bonding of two substrates

US11562912B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11562912-B2
Application numberUS-202217575101-A
CountryUS
Kind codeB2
Filing dateJan 13, 2022
Priority dateSep 29, 2016
Publication dateJan 24, 2023
Grant dateJan 24, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A device, a system and a method for bonding two substrates. A first substrate holder has a recess and an elevation.

First claim

Opening claim text (preview).

What is claimed is: 1. A device for bonding a first substrate surface of a first substrate to a second substrate surface of a second substrate, said device comprising: a first substrate holder for accommodating the first substrate, and a second substrate holder for accommodating the second substrate, wherein the first substrate holder has a first recess with a fixing device for fixing the first substrate in the first recess, a first elevation at least partly surrounding the first recess; and at least one hole communicating with the first recess for evacuating and/or flushing an interior space of the device before and/or during and/or after bonding of the first substrate and the second substrate, wherein the at least one hole is useable to build up an overpressure in the interior space, the overpressure generated by a gas and/or a gas mixture, which is directed via the at least one hole. 2. The device according to claim 1 , wherein the gas and/or the gas mixture is a gas and/or a gas mixture with a negative Joule-Thompson coefficient (JTC). 3. The device according to claim 2 , wherein the gas and/or the gas mixture with the negative JTC includes helium, hydrogen, or neon. 4. The device according to claim 1 , wherein the overpressure is a pressure that is greater than 1 bar. 5. The device according to claim 1 , wherein the at least one hole is for evacuating and/or flushing the first recess, wherein the at least one hole is arranged in a symmetrically distributed manner. 6. The device according to claim 1 , wherein the first elevation is formed annularly around the first recess. 7. The device according to claim 1 , wherein the first elevation has a first expansion surface for expansion of the first substrate surface. 8. The device according to claim 7 , wherein the first recess and/or the first elevation is/are adapted to the first substrate in such a manner that the first substrate surface with the first expansion surface forms a substantially continuous surface and/or merges into the first elevation. 9. The device according to claim 7 , wherein the first recess and/or the first elevation is adaptable manually and/or semi-automatically and/or automatically such that the first substrate surface forms a substantially continuous surface with the first expansion surface and/or merges into the first elevation. 10. The device according to claim 7 , wherein a vertical distance between the first substrate surface and the first expansion surface is adjustable. 11. The device according to claim 1 , wherein the first substrate holder has an outer component and an inner component movable in the outer component, wherein the outer and/or the inner component is translationally and/or rotatably movable, and the outer and inner components are fixable to one another. 12. The device according to claim 11 , wherein the at least one hole is arranged in a symmetrically distributed manner in the inner component. 13. The device according to claim 1 , wherein the second substrate holder has a second recess with a fixing device for fixing the second substrate in the second recess, and a second elevation at least partly surrounding the second recess. 14. The device according to claim 13 , wherein the second elevation has a second expansion surface for expansion of the second substrate surface. 15. The device according to claim 14 , wherein a vertical distance between the second substrate surface and the second expansion surface is adjustable. 16. The device according to claim 1 , wherein the first elevation has an inwardly and/or outwardly curved expansion surface. 17. The device according to claim 1 , wherein the first elevation has an inwardly and/or outwardly bevelled extension surface at an angle (a). 18. The method for bonding a first substrate surface of a first substrate to a second substrate surface of a second substrate by means of a device according to claim 1 , wherein a gas arranged between the first and second substrate surfaces during the bonding process is displaced from a centre to an edge of the first and second substrates, wherein an interior space of the device is evacuated and/or flushed through the at least one hole before and/or during and/or after the bonding of the first substrate and the second substrate; and wherein an overpressure is built up in the interior space by directing a gas and/or a gas mixture from the at least one hole.

Assignees

Inventors

Classifications

  • using bonding · CPC title

  • characterised by edge profile or support profile · CPC title

  • by direct semiconductor to semiconductor bonding · CPC title

  • Apparatus for mechanical treatment or grinding or cutting · CPC title

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US11562912B2 cover?
A device, a system and a method for bonding two substrates. A first substrate holder has a recess and an elevation.
Who is the assignee on this patent?
Ev Group E Thallner Gmbh
What technology area does this patent fall under?
Primary CPC classification H10P72/0428. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 24 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).