Integrated elastomeric lipseal and cup bottom for reducing wafer sticking

US10982346B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10982346-B2
Application numberUS-201816053546-A
CountryUS
Kind codeB2
Filing dateAug 2, 2018
Priority dateJul 9, 2015
Publication dateApr 20, 2021
Grant dateApr 20, 2021

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed are electroplating cups for holding, sealing, and providing electrical power to wafers during electroplating, where the electroplating cup can include a cup bottom, an elastomeric lipseal, and an electrical contact element. The cup bottom can include a radially inwardly protruding surface with a plurality of through-holes. The elastomeric lipseal can directly adhere to the radially inwardly protruding surface of the cup bottom, fill the plurality of through-holes, and encircle an inner edge of the cup bottom. In some implementations, this can mitigate the effects of wafer sticking. In some implementations, the cup bottom may be treated to promote adhesion between the elastomeric lipseal and the radially inwardly protruding surface of the cup bottom.

First claim

Opening claim text (preview).

What is claimed is: 1. A lipseal comprising: a plurality of pillars of elastomeric material passing through a plurality of through-holes of a radially inwardly protruding moment arm of a cup bottom; and an interlocking portion of the elastomeric material surrounding an inner edge of the radially inwardly protruding moment arm, wherein the interlocking portion connects with the plurality of pillars of the elastomeric material to encircle the inner edge of the radially inwardly protruding moment arm. 2. The lipseal of claim 1 , wherein the elastomeric material is disposed along a surface of the radially inwardly protruding moment arm of the cup bottom. 3. The lipseal of claim 1 , wherein the interlocking portion and the plurality of pillars are connected to encircle the inner edge of the radially inwardly protruding moment arm to provide mechanical interlocking of the elastomeric material with the cup bottom. 4. The lipseal of claim 1 , wherein each of the plurality of pillars has a diameter between about 0.01 inches and about 0.05 inches. 5. The lipseal of claim 1 , further comprising: a protruding portion of the elastomeric material that protrudes vertically from the inner edge of the radially inwardly protruding moment arm. 6. The lipseal of claim 1 , wherein a distance between an inner edge of the radially inwardly protruding moment arm and a center of the through-hole is between about 0.05 inches and 0.5 inches. 7. A ring-shaped cup bottom of an electroplating cup assembly, the ring-shaped cup bottom comprising: a main body portion; and a radially inwardly protruding moment arm connected to the main body portion, wherein the radially inwardly protruding moment arm comprises a plurality of through-holes. 8. The ring-shaped cup bottom of claim 7 , wherein the plurality of through-holes are configured to receive portions of an elastomeric lipseal passing therethrough. 9. The ring-shaped cup bottom of claim 8 , wherein the radially inwardly protruding moment arm comprises an inner edge, wherein the inner edge is configured to receive the portions of the elastomeric lipseal passing through the plurality of through-holes so that the portions of the elastomeric lipseal surround the inner edge. 10. The ring-shaped cup bottom of claim 9 , wherein the elastomeric lipseal is mechanically interlocked with the inner edge of the radially inwardly protruding moment arm. 11. The ring-shaped cup bottom of claim 9 , wherein a distance between the inner edge and a center of the through-holes is between about 0.05 inches and about 0.5 inches. 12. The ring-shaped cup bottom of claim 7 , wherein the cup bottom comprises a polymeric material. 13. The ring-shaped cup bottom of claim 12 , wherein the polymeric material is PPS. 14. The ring-shaped cup bottom of claim 7 , wherein each of the through-holes has a diameter between about 0.01 inches and about 0.05 inches. 15. The ring-shaped cup bottom of claim 7 , wherein the radially inwardly protruding moment arm of the cup bottom comprises between about 100 through-holes and about 500 through-holes. 16. The ring-shaped cup bottom of claim 7 , wherein the radially inwardly protruding moment arm is configured to support an elastomeric lipseal.

Assignees

Inventors

Classifications

  • characterised by edge profile or support profile · CPC title

  • Apparatus for sealing, encapsulating, glassing, decapsulating or the like · CPC title

  • C25D17/001Primary

    Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells · CPC title

  • Semiconductors first coated with a seed layer or a conductive layer · CPC title

  • C25D17/06Primary

    Suspending or supporting devices for articles to be coated · CPC title

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Frequently asked questions

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What does patent US10982346B2 cover?
Disclosed are electroplating cups for holding, sealing, and providing electrical power to wafers during electroplating, where the electroplating cup can include a cup bottom, an elastomeric lipseal, and an electrical contact element. The cup bottom can include a radially inwardly protruding surface with a plurality of through-holes. The elastomeric lipseal can directly adhere to the radially in…
Who is the assignee on this patent?
Lam Res Corp
What technology area does this patent fall under?
Primary CPC classification C25D17/001. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 20 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).