Multi-contact lipseals and associated electroplating methods

US2016201212A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016201212-A1
Application numberUS-201614990725-A
CountryUS
Kind codeA1
Filing dateJan 7, 2016
Priority dateAug 15, 2011
Publication dateJul 14, 2016
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Disclosed herein are lipseal assemblies for use in an electroplating clamshell for engaging and supplying electrical current to a semiconductor substrate during electroplating, which include an elastomeric lipseal for engaging the semiconductor substrate during electroplating, and wherein upon engagement the elastomeric lipseal forms multiple radially-separated sealing contact surfaces with the substrate which substantially exclude plating solution from a peripheral region of the substrate. Said lipseal assemblies may also include one or more electrical contact elements for supplying electrical current to the semiconductor substrate during electroplating.

First claim

Opening claim text (preview).

1 . A lipseal assembly for use in an electroplating clamshell for engaging and supplying electrical current to a semiconductor substrate during electroplating, the lipseal assembly comprising: an elastomeric lipseal for engaging the semiconductor substrate during electroplating, wherein upon engagement the elastomeric lipseal forms multiple radially-separated sealing contact surfaces with the substrate which substantially exclude plating solution from a peripheral region of the substrate; and one or more electrical contact elements for supplying electrical current to the semiconductor substrate during electroplating. 2 . The lipseal assembly of claim 1 , wherein upon engagement the multiple radially-separated sealing contact surfaces are separated from one another by at least about 0.005 in. 3 . The lipseal assembly of claim 2 , wherein upon engagement the multiple radially-separated sealing contact surfaces are separated from one another by at least about 0.01 in. 4 . The lipseal assembly of claim 1 , wherein the elastomeric lipseal comprises multiple ring-shaped protrusions which upon compression by the substrate form the multiple sealing contact surfaces. 5 . The lipseal assembly of claim 4 , wherein before compression caused by engagement with the substrate, the uppermost tips of at least two of the ring-shaped protrusions are radially separated from each other by at least about 0.005 in. 6 . The lipseal assembly of claim 5 , wherein before compression caused by engagement with the substrate, the uppermost tips of at least two of the ring-shaped protrusions are radially separated from each other by at least about 0.01 in. 7 . The lipseal assembly of claim 4 , wherein the uppermost tips of at least two of the ring-shaped protrusions are displaced vertically from each other. 8 . The lipseal assembly of claim 7 , wherein said two uppermost tips are displaced vertically from each other by between about 0.001 and 0.004 in. 9 . The lipseal assembly of claim 7 , wherein upon contact between the lipseal and the semiconductor substrate said two uppermost tips do not make simultaneous initial contact with the substrate. 10 . The lipseal assembly of claim 1 , wherein at least a portion of the one or more electrical contact elements are positioned on an upper surface of the elastomeric lipseal and are configured to flex upon engagement with the semiconductor substrate so as to form a conformal non-planar electrical contact interface with a non-planar surface of the semiconductor substrate. 11 . The lipseal assembly of claim 10 , wherein the one or more flexible contact elements are configured so as to form the conformal non-planar electrical contact interface with a bevel edge of the semiconductor substrate, the semiconductor substrate having a substantially 300 mm diameter. 12 . The lipseal assembly of claim 1 , wherein the one or more electrical contact elements are structurally integrated with the elastomeric lipseal and comprise a first exposed portion which contacts the peripheral region of the substrate upon engagement of the lipseal with the substrate. 13 . The lipseal assembly of claim 12 , wherein at least a portion of the elastomeric lipseal which engages the semiconductor substrate during electroplating is positioned relative to the first exposed portion of the electrical contact element such that during engagement said engaging portion of the lipseal compresses against the substrate prior to the first exposed portion of the electrical contact element making electrical contact with the substrate. 14 . A cup assembly for holding, sealing, and providing electrical power to a semiconductor substrate during electroplating, the cup assembly comprising: (a) a cup bottom element comprising a main body portion and a moment arm, wherein the main body portion does not substantially flex when the semiconductor substrate is pressed against the moment arm; (b) an elastomeric sealing element disposed on the moment arm, wherein the sealing element, when pressed against by the semiconductor substrate, forms multiple radially-separated sealing contact surfaces with the substrate so as to define a peripheral region of the substrate from which plating solution is substantially excluded during electroplating; and (c) an electrical contact element disposed on the elastomeric sealing element, wherein the electrical contact element contacts the substrate in said peripheral region when the sealing element seals against the substrate so that the contact element may provide electrical power to the substrate during electroplating. 15 . The cup assembly of claim 14 , wherein the main body portion of the cup bottom element is rigidly affixed to another feature of the cup structure, and wherein the ratio of the average vertical thickness of the main body portion to the average vertical thickness of the moment arm of the cup bottom element is greater than about 5. 16 . The cup assembly of claim 15 , wherein the moment arm of the cup bottom element has a radial width of at most about 0.5 inches. 17 . The cup assembly of claim 14 , wherein the electrical contact element comprises a substantially flat but flexible contact portion disposed upon a substantially horizontal portion of the elastomeric sealing element, and wherein the contact portion contacts the substrate in said peripheral region and deforms when pressed upon by the substrate when the sealing element seals against the substrate so that the contact element may provide electrical power to the substrate during electroplating. 18 . The cup assembly of claim 17 , wherein the substantially flat but flexible contact portion of the electrical contact element has a radial width of between about 0.01 and 0.5 inches. 19 . The cup assembly of claim 17 , wherein the electrical contact element comprises a sheet of non-hardened metal. 20 . The cup assembly of claim 19 , wherein the sheet of non-hardened metal is about 0.005 inches thick or less.

Assignees

Inventors

Classifications

  • Suspending or supporting devices for articles to be coated · CPC title

  • Semiconductors · CPC title

  • Contacting devices · CPC title

  • C25D17/004Primary

    Sealing devices · CPC title

  • Current directing devices · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2016201212A1 cover?
Disclosed herein are lipseal assemblies for use in an electroplating clamshell for engaging and supplying electrical current to a semiconductor substrate during electroplating, which include an elastomeric lipseal for engaging the semiconductor substrate during electroplating, and wherein upon engagement the elastomeric lipseal forms multiple radially-separated sealing contact surfaces with the…
Who is the assignee on this patent?
Lam Res Corp
What technology area does this patent fall under?
Primary CPC classification C25D17/004. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jul 14 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).