Lipseals and contact elements for semiconductor electroplating apparatuses

US9228270B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9228270-B2
Application numberUS-201213584343-A
CountryUS
Kind codeB2
Filing dateAug 13, 2012
Priority dateAug 15, 2011
Publication dateJan 5, 2016
Grant dateJan 5, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed herein are lipseal assemblies for use in electroplating clamshells which may include an elastomeric lipseal for excluding plating solution from a peripheral region of a semiconductor substrate and one or more electrical contact elements. The contact elements may be structurally integrated with the elastomeric lipseal. The lipseal assemblies may include one or more flexible contact elements at least a portion of which may be conformally positioned on an upper surface of the elastomeric lipseal, and may be configured to flex and form a conformal contact surface that interfaces with the substrate. Some elastomeric lipseals disclosed herein may support, align, and seal a substrate in a clamshell, and may include a flexible elastomeric upper portion located above a flexible elastomeric support edge, the upper portion having a top surface and an inner side surface, the later configured to move inward and align the substrate upon compression of the top surface.

First claim

Opening claim text (preview).

We claim: 1. A lipseal assembly for use in an electroplating clamshell for engaging and supplying electrical current to a semiconductor substrate during electroplating, the lipseal assembly comprising: an elastomeric lipseal for engaging the semiconductor substrate during electroplating, wherein upon engagement the elastomeric lipseal substantially excludes plating solution from a peripheral region of the semiconductor substrate; and one or more flexible contact elements for supplying electrical current to the semiconductor substrate during electroplating, at least a portion of the one or more flexible contact elements positioned on an upper surface of the elastomeric lipseal and configured to flex upon engagement with the semiconductor substrate so as to form a conformal non-planar electrical contact interface with a non-planar surface of the semiconductor substrate. 2. The lipseal assembly of claim 1 , wherein the one or more flexible contact elements are configured so as to form a conformal non-planar electrical contact interface with a bevel edge of a substantially 300 mm diameter semiconductor substrate. 3. The lipseal assembly of claim 1 , wherein the one or more flexible contact elements have a portion which is not configured to contact the substrate when the substrate is engaged by the lipseal assembly, and wherein the non-contacting portion comprises a non-conformable material. 4. The lipseal assembly of claim 1 , wherein the conformal non-planar electrical contact interface formed between the one or more flexible contact elements and the semiconductor substrate is continuous. 5. The lipseal assembly of claim 1 , wherein the conformal non-planar electrical contact interface formed between the one or more flexible contact elements and the semiconductor substrate is non-continuous having gaps. 6. The lipseal assembly of claim 5 , wherein the one or more flexible contact elements comprise multiple wire tips or a wire mesh disposed on the surface of the elastomeric lipseal. 7. The lipseal assembly of claim 1 , wherein the one or more flexible contact elements positioned on the upper surface of the elastomeric lipseal comprise conductive deposits deposited directly on the lipseal using one or more techniques selected from the group consisting of: chemical vapor deposition, physical vapor deposition, and electroplating. 8. The lipseal assembly of claim 1 , wherein the one or more flexible contact elements positioned on the upper surface of the elastomeric lipseal comprise an electrically conductive elastomeric material. 9. The lipseal assembly of claim 1 , wherein the one or more flexible contact elements are configured so as to form a conformal non-planar electrical contact interface with a bevel edge of a substantially 450 mm diameter semiconductor substrate. 10. The lipseal assembly of claim 1 , wherein the one or more flexible contact elements are configured to form a conformal non-planar electrical contact interface with a non-planar surface of the semiconductor substrate by following the shape of said upper surface of the elastomeric lipseal while it is deformed by the pressing of the semiconductor substrate.

Assignees

Inventors

Classifications

  • C25D7/123Primary

    Semiconductors first coated with a seed layer or a conductive layer · CPC title

  • C25D17/004Primary

    Sealing devices · CPC title

  • Current directing devices · CPC title

  • Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells · CPC title

  • C25D17/005Primary

    Contacting devices · CPC title

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Frequently asked questions

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What does patent US9228270B2 cover?
Disclosed herein are lipseal assemblies for use in electroplating clamshells which may include an elastomeric lipseal for excluding plating solution from a peripheral region of a semiconductor substrate and one or more electrical contact elements. The contact elements may be structurally integrated with the elastomeric lipseal. The lipseal assemblies may include one or more flexible contact ele…
Who is the assignee on this patent?
Feng Jingbin, Stowell Marshall, Wilmot Frederick D, and 1 more
What technology area does this patent fall under?
Primary CPC classification C25D7/123. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 05 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).