Parallel plate inline substrate processing tool
US-2017244006-A1 · Aug 24, 2017 · US
US10837111B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10837111-B2 |
| Application number | US-201515542891-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 12, 2015 |
| Priority date | Jan 12, 2015 |
| Publication date | Nov 17, 2020 |
| Grant date | Nov 17, 2020 |
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A holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber is provided. The holding arrangement includes two or more alignment actuators connectable to at least one of the substrate carrier and the mask carrier, wherein the holding arrangement is configured to support the substrate carrier in, or parallel to, a first plane, wherein a first alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in a first direction, wherein a second alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in the first direction and a second direction different from the first direction, and wherein the first direction and the second direction are in the first plane.
Opening claim text (preview).
The invention claimed is: 1. A holding arrangement for supporting a substrate carrier and a mask carrier in, or parallel to, a first plane, comprising: two alignment actuators, each alignment actuator comprising a first fixing device configured to hold the substrate carrier and a second fixing device to hold the mask carrier, the two alignment actuators comprising: a first alignment actuator configured to be connected to the substrate carrier and the mask carrier and to move the substrate carrier and the mask carrier relative to each other at least in a first direction; and a second alignment actuator configured to be connected to the substrate carrier and the mask carrier and to move the substrate carrier and the mask carrier relative to each other at least in the first direction and a second direction different from the first direction, and wherein the first direction and the second direction are in a first plane. 2. The holding arrangement of claim 1 , wherein the two alignment actuators are configured to move the substrate carrier relative to the mask carrier or to move the mask carrier relative to the substrate carrier. 3. The holding arrangement of claim 1 , wherein the first direction and the second direction are perpendicular to each other. 4. The holding arrangement of claim 1 , wherein the holding arrangement is configured for supporting at least one of the substrate carrier and the mask carrier in a vertical orientation. 5. The holding arrangement of claim 1 , wherein the first plane is parallel to a plane of a substrate surface configured for layer deposition thereon. 6. The holding arrangement of claim 1 , further comprising a third alignment actuator and a fourth alignment actuator. 7. The holding arrangement of claim 1 , wherein at least one alignment actuator of the two alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other in a third direction. 8. The holding arrangement of claim 1 , wherein each of the first fixing devices are configured for fixing the substrate carrier to the holding arrangement. 9. The holding arrangement of claim 1 , wherein each of the second fixing devices are configured for fixing the mask carrier to the holding arrangement. 10. The holding arrangement of claim 8 , wherein each of the first fixing devices are first magnetic fixing devices. 11. The holding arrangement of claim 9 , wherein each of the second fixing devices are second magnetic fixing devices. 12. The holding arrangement of claim 1 , wherein the holding arrangement is mountable or connectable to a chamber wall of a processing chamber. 13. The holding arrangement of claim 1 , wherein the two alignment actuators are connectable to corner regions of at least one of the substrate carrier and the mask carrier.
Mask-wafer alignment · CPC title
using masks · CPC title
the substrate being supported substantially vertically · CPC title
Substrate holders · CPC title
characterised by provisions for the orientation or alignment of the layer to be deposited · CPC title
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