Holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber, apparatus for depositing a layer on a substrate, and method for aligning a substrate carrier supporting a substrate and a mask carrier

US10837111B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10837111-B2
Application numberUS-201515542891-A
CountryUS
Kind codeB2
Filing dateJan 12, 2015
Priority dateJan 12, 2015
Publication dateNov 17, 2020
Grant dateNov 17, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber is provided. The holding arrangement includes two or more alignment actuators connectable to at least one of the substrate carrier and the mask carrier, wherein the holding arrangement is configured to support the substrate carrier in, or parallel to, a first plane, wherein a first alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in a first direction, wherein a second alignment actuator of the two or more alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other at least in the first direction and a second direction different from the first direction, and wherein the first direction and the second direction are in the first plane.

First claim

Opening claim text (preview).

The invention claimed is: 1. A holding arrangement for supporting a substrate carrier and a mask carrier in, or parallel to, a first plane, comprising: two alignment actuators, each alignment actuator comprising a first fixing device configured to hold the substrate carrier and a second fixing device to hold the mask carrier, the two alignment actuators comprising: a first alignment actuator configured to be connected to the substrate carrier and the mask carrier and to move the substrate carrier and the mask carrier relative to each other at least in a first direction; and a second alignment actuator configured to be connected to the substrate carrier and the mask carrier and to move the substrate carrier and the mask carrier relative to each other at least in the first direction and a second direction different from the first direction, and wherein the first direction and the second direction are in a first plane. 2. The holding arrangement of claim 1 , wherein the two alignment actuators are configured to move the substrate carrier relative to the mask carrier or to move the mask carrier relative to the substrate carrier. 3. The holding arrangement of claim 1 , wherein the first direction and the second direction are perpendicular to each other. 4. The holding arrangement of claim 1 , wherein the holding arrangement is configured for supporting at least one of the substrate carrier and the mask carrier in a vertical orientation. 5. The holding arrangement of claim 1 , wherein the first plane is parallel to a plane of a substrate surface configured for layer deposition thereon. 6. The holding arrangement of claim 1 , further comprising a third alignment actuator and a fourth alignment actuator. 7. The holding arrangement of claim 1 , wherein at least one alignment actuator of the two alignment actuators is configured to move the substrate carrier and the mask carrier relative to each other in a third direction. 8. The holding arrangement of claim 1 , wherein each of the first fixing devices are configured for fixing the substrate carrier to the holding arrangement. 9. The holding arrangement of claim 1 , wherein each of the second fixing devices are configured for fixing the mask carrier to the holding arrangement. 10. The holding arrangement of claim 8 , wherein each of the first fixing devices are first magnetic fixing devices. 11. The holding arrangement of claim 9 , wherein each of the second fixing devices are second magnetic fixing devices. 12. The holding arrangement of claim 1 , wherein the holding arrangement is mountable or connectable to a chamber wall of a processing chamber. 13. The holding arrangement of claim 1 , wherein the two alignment actuators are connectable to corner regions of at least one of the substrate carrier and the mask carrier.

Assignees

Inventors

Classifications

  • Mask-wafer alignment · CPC title

  • using masks · CPC title

  • the substrate being supported substantially vertically · CPC title

  • Substrate holders · CPC title

  • H10K71/191Primary

    characterised by provisions for the orientation or alignment of the layer to be deposited · CPC title

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Frequently asked questions

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What does patent US10837111B2 cover?
A holding arrangement for supporting a substrate carrier and a mask carrier during layer deposition in a processing chamber is provided. The holding arrangement includes two or more alignment actuators connectable to at least one of the substrate carrier and the mask carrier, wherein the holding arrangement is configured to support the substrate carrier in, or parallel to, a first plane, wherei…
Who is the assignee on this patent?
Applied Materials Inc, Vercesi Tommaso, Haas Dieter, and 3 more
What technology area does this patent fall under?
Primary CPC classification C23C16/4587. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 17 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).