Gas delivery and distribution for uniform process in linear-type large-area plasma reactor

Patent metadata

Field	Value
Publication number	US-2016208380-A1
Application number	US-201614988582-A
Country	US
Kind code	A1
Filing date	Jan 5, 2016
Priority date	Sep 15, 2011
Publication date	Jul 21, 2016
Grant date	—

Abstract

An apparatus for introducing gas into a processing chamber comprising one or more gas distribution tubes having gas-injection holes which may be larger in size, greater in number, and/or spaced closer together at sections of the gas introduction tubes where greater gas conductance through the gas-injection holes is desired. An outside tube having larger gas-injection holes may surround each gas distribution tube. The gas distribution tubes may be fluidically connected to a vacuum foreline to facilitate removal of gas from the gas distribution tube at the end of a process cycle.

First claim

1 . A processing apparatus, comprising:
a gas source; a plasma source; a vacuum pump; a substrate support; and at least one gas distribution tube fluidly coupled to the gas source, selected from the group consisting of:
a gas distribution tube configured between the plasma source and the substrate carrier, the gas distribution tube having one or more source gas introduction ports, wherein the gas distribution tube has gas injection holes which are reduced in size when closer to the plasma source; and
a gas distribution tube configured between the plasma source and the substrate carrier, the gas distribution tube having one or more source gas introduction ports, wherein the gas distribution tube has apertures which are spaced farther apart from one when closer to the plasma source.

2 . The processing apparatus of claim 1 , wherein each gas distribution tube further comprises an outer tube surrounding the gas distribution tube, wherein each outer tube has apertures larger than the apertures of the gas distribution tube.

3 . The processing apparatus of claim 1 , wherein each gas distribution tube is fluidically connected to a vacuum line coupled to the vacuum pump.

4 . The processing apparatus of claim 1 , wherein each gas distribution tube has a conical shape, wherein the size of the conical shape is graded from smaller to larger as measured from the inside of the gas introduction tube to the outside of the gas introduction tube.

5 . The processing apparatus of claim 4 , wherein each gas distribution tube has a cylindrical shape connected with the smaller end of the conical shape.

6 . The processing apparatus of claim 1 , wherein the wall of each gas distribution tube is thicker at portions of the tube that are closer to the plasma source.

7 . The processing apparatus of claim 1 , wherein each gas distribution tube has more than one aperture at each aperture position in the gas distribution tube.

8 . A processing apparatus, comprising:
a gas source; a plasma source; a vacuum pump; a substrate support; and a gas distribution tube fluidically coupled to the gas source, the gas distribution tube configured between the plasma source and the substrate support, the gas distribution tube having one or more source gas introduction ports and a plurality of gas injection holes, wherein the gas distribution tube has substantially equal source gas flow from each gas injection hole along the gas distribution tube.

9 . The processing apparatus of claim 8 , wherein each gas injection hole is smaller in size the closer the gas injection hole is to the one or more source gas introduction ports.

10 . The processing apparatus of claim 8 , wherein the diameter of each gas injection hole is graded from smaller to larger as measured from the inside of each gas introduction tube to the outside of each gas introduction tube.

11 . The processing apparatus of claim 8 , wherein the wall of each gas distribution tube is thicker at portions of the gas distribution tube that are closer to the one or more source gas introduction ports.

12 . The processing apparatus of claim 8 , wherein each gas distribution tube has more than one gas injection hole at each gas injection hole position in the gas distribution tube.

13 . The processing apparatus of claim 12 , wherein each gas distribution tube has two gas injection holes at each gas injection hole position in the gas distribution tube, wherein the gas injection holes at each gas injection hole position are separated from 30 degrees to 60 degrees from one another.

14 . The processing apparatus of claim 8 , further comprising:
an outer tube surrounding each gas distribution tube, wherein the outer tube has gas injection holes therethrough that are larger than the gas injection holes of the gas distribution tube.

15 . A processing apparatus, comprising:
a gas source; a plasma source; a vacuum pump; a substrate support; a gas distribution tube fluidically coupled to the gas source, the gas distribution tube configured between the plasma source and the substrate support, wherein a source gas is fed into at least one portion of the gas distribution tube, and wherein the gas distribution tube has gas injection holes which are spaced farther apart from one another the closer the gas injection hole is to the at least one portion of the gas distribution tube where the gas is fed; and an outer tube surrounding the gas distribution tube, wherein the outer tube has gas injection holes larger than the gas injection holes of the gas distribution tube.

16 . The processing apparatus of claim 15 , wherein the size of the gas injection holes is graded from smaller to larger as measured from the inside of the gas introduction tube to the outside of the gas introduction tube.

17 . The processing apparatus of claim 15 , wherein the wall of the gas distribution tube is thicker at portions of the tube that are closer to the one or more source gas introduction ports.

18 . The processing apparatus of claim 15 , wherein the gas distribution tube has more than one gas injection hole at each gas injection hole position in the gas distribution tube.

19 . The processing apparatus of claim 18 , wherein the gas distribution tube has two gas injection holes at gas injection holes position in the gas distribution tube and the gas injection holes at each gas injection hole position are separated from 30 degrees to 60 degrees from one another.

Assignees

• Applied Materials Inc

Inventors

• White John M
• Anwar Suhail
• Kudela Jozef
• Sorensen Carl A
• Won Tae Kyung
• Cho Seon-Mee
• Choi Soo Young
• Park Beom Soo
• Johnston Benjamin M

Classifications

• C23C16/45578 Primary

  Elongated nozzles, tubes with holes · CPC title

• C23C16/513

  using plasma jets · CPC title

• C23C16/455 Primary

  characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber · CPC title

• C23C16/511

  using microwave discharges · CPC title

• C23C16/4587

  the substrate being supported substantially vertically · CPC title