Euv photomasks and manufacturing method thereof
US-2026093171-A1 · Apr 2, 2026 · US
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Yu Ching-Fang patents
Yu Ching-Fang is listed as an inventor on 33 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Yu Ching-Fang |
| Total patents | 33 |
| First publication | Mar 17, 2015 |
| Latest publication | Apr 2, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Euv photomasks and manufacturing method thereof
US-2025383595-A1 · Dec 18, 2025 · US
Lithography mask having high extinction coefficient absorber and related systems and methods
US-2025362584-A1 · Nov 27, 2025 · US
Euv lithography mask blanks, euv masks and methods
US-2025362581-A1 · Nov 27, 2025 · US
Extreme ultraviolet mask with capping layer
US-2025362580-A1 · Nov 27, 2025 · US
Lithography mask having overlay mark and related method
US-2025355344-A1 · Nov 20, 2025 · US
Lithography method with reduced impacts of mask defects
US-12429776-B2 · Sep 30, 2025 · US
Euv lithography mask blanks, euv masks and methods
US-2025216764-A1 · Jul 3, 2025 · US
Lithography mask having high extinction coefficient absorber and related systems and methods
US-2025123552-A1 · Apr 17, 2025 · US
EUV mask blank and method of making EUV mask blank
US-12265322-B2 · Apr 1, 2025 · US
Recent patents
Latest publications not already listed above.
Lithography mask having overlay mark and related method
US-2025060660-A1 · Feb 20, 2025 · US
Euv mask blank and method of making euv mask blank
US-2023375911-A1 · Nov 23, 2023 · US
EUV mask blank and method of making EUV mask blank
US-11815804-B2 · Nov 14, 2023 · US
Extreme ultraviolet mask with capping layer
US-2023161241-A1 · May 25, 2023 · US
Euv mask blank and method of making euv mask blank
US-2022342292-A1 · Oct 27, 2022 · US
Probe head for high frequency signal test and medium or low frequency signal test at the same time
US-11150269-B2 · Oct 19, 2021 · US
Lithography Method With Reduced Impacts of Mask Defects
US-2021208505-A1 · Jul 8, 2021 · US
Lithography method with reduced impacts of mask defects
US-10955746-B2 · Mar 23, 2021 · US
Probe head for high frequency signal test and medium or low frequency signal test at the same time
US-2021048452-A1 · Feb 18, 2021 · US
Pellicle for advanced lithography
US-10691017-B2 · Jun 23, 2020 · US
Pellicle for Advanced Lithography
US-2019072849-A1 · Mar 7, 2019 · US
Lithography Method with Reduced Impacts of Mask Defects
US-2019033720-A1 · Jan 31, 2019 · US
Pellicle for advanced lithography
US-10126644-B2 · Nov 13, 2018 · US
Pellicle aging estimation and particle removal from pellicle via acoustic waves
US-9933699-B2 · Apr 3, 2018 · US
Pellicle for advanced lithography
US-2017227843-A1 · Aug 10, 2017 · US
Method for integrated circuit fabrication
US-9548209-B2 · Jan 17, 2017 · US
Pellicle aging estimation and particle removal from pellicle via acoustic waves
US-2016274471-A1 · Sep 22, 2016 · US
EUV mask and method for forming the same
US-9354510-B2 · May 31, 2016 · US
Method and apparatus for efficient defect inspection
US-9305346-B2 · Apr 5, 2016 · US
Lithographic photomask with inclined sides
US-9152035-B2 · Oct 6, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Taiwan Semiconductor Mfg Co Ltd | 25 |
| Taiwan Semiconductor Mfg | 6 |
| Mpi Corp | 2 |
| Yu Ching-Fang | 1 |
| Hsu Ting-Hao | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F1/24 | 17 |
| G03F7/2004 | 8 |
| G03F1/52 | 8 |
| G03F7/70466 | 7 |
| G03F7/203 | 7 |