Pellicle aging estimation and particle removal from pellicle via acoustic waves

US9933699B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9933699-B2
Application numberUS-201514658399-A
CountryUS
Kind codeB2
Filing dateMar 16, 2015
Priority dateMar 16, 2015
Publication dateApr 3, 2018
Grant dateApr 3, 2018

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A pellicle is disposed over a lithography mask. An acoustic wave generator is placed over the pellicle. The acoustic wave generator is configured to generate acoustic waves to cause the pellicle to vibrate at a target resonance frequency. A resonance detection tool is configured to detect an actual resonance frequency of the pellicle in response to the acoustic waves. One or more electronic processors are configured to estimate an age condition of the pellicle as a function of a shift of the actual resonance frequency from the target resonance frequency.

First claim

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What is claimed is: 1. A system, comprising: a pellicle disposed over a lithography mask, the pellicle having a surface; an acoustic wave generator placed over the pellicle, wherein the acoustic wave generator is configured to generate acoustic waves to cause the pellicle to vibrate at a target resonance frequency; a resonance detection tool configured to: generate a signal that travels across a surface of the pellicle in a direction parallel to the surface of the pellicle; measure the signal after the signal travels across the surface of the pellicle in the direction parallel to the surface of the pellicle; and determine, based on the measured signal, an actual resonance frequency of the pellicle in response to the acoustic waves; and one or more electronic processors configured to estimate an age condition of the pellicle as a function of a shift of the actual resonance frequency from the target resonance frequency. 2. The system of claim 1 , wherein the acoustic wave generator includes a plurality of acoustic transducers. 3. The system of claim 1 , wherein the acoustic wave generator is configured to generate the acoustic waves to force the pellicle to vibrate at a predetermined mode of oscillation. 4. The system of claim 1 , wherein the signal travels an entire length of the surface of the pellicle, and wherein the resonance detection tool includes: a source located at a first location, the source being configured to generate the signal that travels across the surface of the pellicle; and a sensor located at a second location, the sensor being configured to receive the signal, wherein the entire length of the surface of the pellicle is located between the first location and the second location. 5. The system of claim 4 , wherein the source includes a laser, and wherein the sensor includes a photo receiver. 6. The system of claim 4 , wherein the source includes a light, and wherein the sensor includes a charge-coupled device (CCD). 7. The system of claim 1 , wherein the resonance detection tool includes a Laser Doppler Interferometer. 8. The system of claim 1 , wherein the acoustic waves are first acoustic waves, and wherein the acoustic wave generator is further configured to generate second acoustic waves for removing contaminant particles located on the pellicle. 9. A method, comprising: applying, via a generator located over a pellicle that is disposed over a lithography mask, acoustic waves toward the pellicle to cause the pellicle to vibrate at a target resonance frequency; generating, via a source located on a first side of the pellicle, a signal that travels in a direction parallel to a surface of the pellicle and across an entire length of the pellicle; measuring the generated signal, the measuring comprises receiving the signal via a sensor located on a second side of the pellicle opposite the first side; detecting, based on the measured signal, an actual resonance frequency of the pellicle in response to the acoustic waves; and estimating an age condition of the pellicle as a function of a shift of the actual resonance frequency from the target resonance frequency. 10. The method of claim 9 , wherein the applying comprises generating the acoustic waves via an array acoustic transducer. 11. The method of claim 9 , further comprising: determining, for each of a plurality of modes of oscillation, a resonance frequency shift between an aging pellicle and a new pellicle; and determining that a first mode of the plurality of modes of oscillation corresponds to a largest resonance frequency shift; wherein the applying comprises forcing the pellicle to vibrate at the first mode of oscillation. 12. The method of claim 9 , wherein the source includes a laser, and wherein the sensor includes a photo receiver. 13. The method of claim 9 , wherein the source includes a light, and wherein the sensor includes a charge-coupled device (CCD). 14. The method of claim 9 , wherein the detecting comprises detecting the actual resonance frequency via a Laser Doppler Interferometer. 15. The method of claim 9 , wherein the acoustic waves are first acoustic waves, and further comprising applying second acoustic waves toward the pellicle to remove contaminant particles located on the pellicle. 16. A system, comprising: a pellicle disposed over a lithography mask, the pellicle having a surface that spans in a first direction; an acoustic wave generator positioned over the pellicle, wherein the acoustic wave generator is configured to apply acoustic waves toward the surface of the pellicle to force the pellicle to vibrate at a target resonance frequency; a signal-transmitter disposed over a first end portion of the pellicle; a signal-receiver disposed over a second end portion of the pellicle opposite the first end portion; and one or more electronic processors; wherein: the signal-transmitter is configured to generate a signal that propagates in the first direction as a traveling wave from the first end portion toward the second end portion; the signal-receiver is configured to receive and measure the signal after the signal reaches the second end portion; and the one or more electronic processors are configured to: determine, based on the measured signal, an actual resonance frequency of the pellicle; and estimate an age condition of the pellicle by comparing the target resonance frequency and the actual resonance frequency. 17. The system of claim 16 , wherein the one or more electronic processors are configured to estimate the age condition of the pellicle by calculating a Young's modulus based on the measured signal and ascertaining whether a logarithmic value of the Young's modulus falls within any one of a plurality of different regions, wherein the different regions correspond to different age conditions of the pellicle. 18. The system of claim 16 , further comprising a frequency sweep generator coupled to the signal-transmitter, wherein the frequency sweep generator is configured to cause the pellicle to vibrate at a plurality of oscillation modes. 19. The system of claim 18 , wherein the plurality of oscillation modes are configured to remove contaminant particles located on the pellicle. 20. The system of claim 16 , wherein: the signal-transmitter includes an acoustic transducer; and the signal-receiver includes an acoustic-receiver.

Assignees

Inventors

Classifications

  • G03F1/84Primary

    Inspecting · CPC title

  • G03F1/62Primary

    Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof · CPC title

  • Microphones · CPC title

  • Loudspeakers · CPC title

  • Optical system protection, e.g. pellicles or removable covers for protection of mask · CPC title

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What does patent US9933699B2 cover?
A pellicle is disposed over a lithography mask. An acoustic wave generator is placed over the pellicle. The acoustic wave generator is configured to generate acoustic waves to cause the pellicle to vibrate at a target resonance frequency. A resonance detection tool is configured to detect an actual resonance frequency of the pellicle in response to the acoustic waves. One or more electronic pro…
Who is the assignee on this patent?
Taiwan Semiconductor Mfg Co Ltd
What technology area does this patent fall under?
Primary CPC classification G03F1/84. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 03 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).