Pellicle for advanced lithography

Patent metadata

Field	Value
Publication number	US-10126644-B2
Application number	US-201615019478-A
Country	US
Kind code	B2
Filing date	Feb 9, 2016
Priority date	Feb 9, 2016
Publication date	Nov 13, 2018
Grant date	Nov 13, 2018

Abstract

The present disclosure provides an apparatus for a semiconductor lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane, a pellicle frame attached to the pellicle membrane. The pellicle frame has a surface that defines at least one groove. The apparatus further includes a substrate that is in contact with the surface of the pellicle frame such that the grove is positioned between the pellicle frame and the substrate.

First claim

What is claimed is:

1. An apparatus for a semiconductor lithography process, comprising:
a pellicle membrane;
a pellicle frame attached to the pellicle membrane, wherein the pellicle frame has a surface that defines a groove; and
a substrate having a patterned layer, the substrate attached to the pellicle frame such that the groove is positioned between the pellicle frame and the substrate, wherein the pellicle membrane, the pellicle frame and the substrate define an enclosed space surrounding the patterned layer, wherein the groove is not in communication with the enclosed space and the groove is not in communication with an exterior space of the pellicle frame.

2. The apparatus of claim 1 , further comprising an adhesive layer disposed between the surface and the substrate such that the adhesive layer secures the substrate to the pellicle frame.

3. The apparatus of claim 1 , wherein the pellicle frame includes a material selected from the group consisting of metal, alloy and ceramic material.

4. The apparatus of claim 1 , wherein a cross-sectional shape of the groove is selected from the group consisting of a symmetrically polygonal shape, a symmetrically curvilinear shape, and an asymmetrically curvilinear shape.

5. The apparatus of claim 4 , wherein the asymmetrically curvilinear shape includes a portion of an elliptical shape.

6. The apparatus of claim 5 , wherein the portion of the elliptical shape includes a semi-major axis that is tilted to a top surface of the substrate that is less than about 90 degrees.

7. The apparatus of claim 4 , wherein the symmetrically polygonal shape includes a triangular shape.

8. The apparatus of claim 1 , wherein the apparatus is used in an extreme ultraviolet (EUV) lithography system.

9. The apparatus of claim 1 , wherein the substrate is a mask.

10. The apparatus of claim 1 , further comprising an adhesive material disposed within the groove.

11. The apparatus of claim 1 , wherein the surface defines another groove, the another groove positioned between the pellicle frame and the substrate such, wherein the another groove is not in communication with the groove.

12. The apparatus of claim 11 , wherein the another groove is not in communication with the enclosed space.

13. A method for fabricating a pellicle assembly for a lithography process, comprising:
providing a pellicle frame that includes a groove on a first surface of the pellicle frame, the pellicle frame attached to a pellicle membrane; and
attaching a mask having a pattern to the pellicle frame such that the groove faces the mask, wherein the pattern is enclosed in a space defined by the pellicle membrane, the pellicle frame and the mask after attaching the mask to the pellicle frame, and wherein the groove is not in communication with the enclosed space after attaching the mask to the pellicle frame and the groove is not in communication with an exterior space of the pellicle frame.

14. The method of claim 13 , wherein attaching the mask to the pellicle frame includes using an adhesive material layer.

15. The method of claim 13 , wherein the mask is an extreme ultraviolet (EUV) mask.

16. The method of claim 13 , wherein the pellicle membrane is a transparent material layer.

17. The method of claim 13 , wherein the pellicle membrane includes a low-transmittance material layer selected from the group consisting of pSi, a-Si, SiCN, and SiP Graphene.

18. A method comprising:
providing a pellicle apparatus, wherein the pellicle apparatus includes a membrane and a pellicle frame, and wherein the pellicle frame includes a first surface that is attached to the membrane and second surface opposite the first surface that includes a groove;
mounting the pellicle apparatus onto a mask by coupling the second surface of the pellicle frame to the mask such that the groove faces the mask, wherein the mask includes a patterned surface, wherein after mounting the pellicle apparatus onto the mask the patterned surface is enclosed in a space surrounded the pellicle apparatus and the mask, and further wherein the groove is not in communication with the space and the groove is not in communication with an exterior space of the pellicle frame;
loading the mask having the pellicle apparatus mounted thereupon into a lithography system and loading a semiconductor wafer onto a substrate stage of the lithography system; and
performing a lithography exposure process to transfer a pattern of the patterned surface from the mask to the semiconductor wafer.

19. The method of claim 18 , wherein the first surface includes another groove, the another groove not in communication with the first groove after the mounting of the pellicle apparatus onto the mask.

20. The method of claim 18 , wherein the first surface includes a material selected from the group consisting of metal, alloy and ceramic material.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Lee Yu-Ching
• Yu Ching-Fang
• Lin Chun-Hung
• Hsu Ting-Hao
• Chang Ching-Hsiang
• Chin Sheng-Chi

Classifications

• G03F1/64 Primary

  characterised by the frames, e.g. structure or material, including bonding means therefor · CPC title

• G03F7/2004

  characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light · CPC title

• G03F7/70983 Primary

  Optical system protection, e.g. pellicles or removable covers for protection of mask · CPC title