In situ protective coating of chamber components for semiconductor processing
US-12371781-B2 · Jul 29, 2025 · US
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Smith David Charles patents
Smith David Charles is listed as an inventor on 52 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Smith David Charles |
| Total patents | 52 |
| First publication | Mar 31, 2016 |
| Latest publication | Jul 29, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Tin oxide thin film spacers in semiconductor device manufacturing
US-12051589-B2 · Jul 30, 2024 · US
Tin oxide thin film spacers in semiconductor device manufacturing
US-2024030031-A1 · Jan 25, 2024 · US
Tin oxide thin film spacers in semiconductor device manufacturing
US-11784047-B2 · Oct 10, 2023 · US
Tin oxide thin film spacers in semiconductor device manufacturing
US-2022005694-A1 · Jan 6, 2022 · US
Tin oxide thin film spacers in semiconductor device manufacturing
US-11183383-B2 · Nov 23, 2021 · US
In situ protective coating of chamber components for semiconductor processing
US-2021340670-A1 · Nov 4, 2021 · US
Selective growth of metal-containing hardmask thin films
US-11107683-B2 · Aug 31, 2021 · US
Tin oxide thin film spacers in semiconductor device manufacturing
US-2021242019-A1 · Aug 5, 2021 · US
Tin oxide thin film spacers in semiconductor device manufacturing
US-11031245-B2 · Jun 8, 2021 · US
Recent patents
Latest publications not already listed above.
Selective deposition with atomic layer etch reset
US-10998187-B2 · May 4, 2021 · US
Selective deposition of silicon oxide
US-10903071-B2 · Jan 26, 2021 · US
Selective deposition of silicon nitride on silicon oxide using catalytic control
US-10777407-B2 · Sep 15, 2020 · US
Geometrically selective deposition of a dielectric film
US-10763108-B2 · Sep 1, 2020 · US
Selective growth of metal-containing hardmask thin films
US-2020227260-A1 · Jul 16, 2020 · US
Selective deposition of silicon oxide
US-2020219718-A1 · Jul 9, 2020 · US
Tin oxide thin film spacers in semiconductor device manufacturing
US-2020219725-A1 · Jul 9, 2020 · US
Method for selective deposition using a base-catalyzed inhibitor
US-10662526-B2 · May 26, 2020 · US
Selective growth of metal-containing hardmask thin films
US-10643846-B2 · May 5, 2020 · US
Pre-treatment method to improve selectivity in a selective deposition process
US-10643889-B2 · May 5, 2020 · US
Selective deposition of silicon oxide
US-10629429-B2 · Apr 21, 2020 · US
Selective deposition with atomic layer etch reset
US-2020118809-A1 · Apr 16, 2020 · US
Method for selective deposition using a base-catalyzed inhibitor
US-2020102650-A1 · Apr 2, 2020 · US
Selective deposition with atomic layer etch reset
US-10559461-B2 · Feb 11, 2020 · US
Pre-treatment method to improve selectivity in a selective deposition process
US-2020043776-A1 · Feb 6, 2020 · US
Hardware and process for film uniformity improvement
US-10526700-B2 · Jan 7, 2020 · US
Selective growth of metal-containing hardmask thin films
US-2020006073-A1 · Jan 2, 2020 · US
Selective growth of silicon nitride
US-10490413-B2 · Nov 26, 2019 · US
Selective deposition of silicon nitride on silicon oxide using catalytic control
US-2019148128-A1 · May 16, 2019 · US
Etching metal oxide substrates using ale and selective deposition
US-2019131130-A1 · May 2, 2019 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Lam Res Corp | 52 |
| Lan Res Corporation | 1 |
| Lam Rasearch Corp | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P14/6339 | 44 |
| H01L21/0228 | 37 |
| H10P14/6336 | 29 |
| H01L21/02274 | 24 |
| H10P14/6682 | 21 |