Rubber membrane having first and second hardness for use in a polishing head
US-2025312885-A1 · Oct 9, 2025 · US
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Nabeya Osamu patents
Nabeya Osamu is listed as an inventor on 105 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Nabeya Osamu |
| Total patents | 105 |
| First publication | Feb 19, 2015 |
| Latest publication | Oct 9, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Break-in processing apparatus and break-in processing method
US-2025289088-A1 · Sep 18, 2025 · US
Information processing system, information processing method, program, and substrate processing apparatus
US-12381089-B2 · Aug 5, 2025 · US
Rubber membrane having first and second hardness for use in a polishing head
US-12358096-B2 · Jul 15, 2025 · US
Break-in processing apparatus and break-in processing method
US-12337438-B2 · Jun 24, 2025 · US
Method for releasing substrate, method for polishing substrate, substrate polishing apparatus, substrate processing apparatus, control apparatus, control method, and control program
US-2025196288-A1 · Jun 19, 2025 · US
Substrate holding apparatus, substrate suction determination method, substrate polishing apparatus, substrate polishing method, method of removing liquid from upper surface of wafer to be polished, elastic film for pressing wafer against polishing pad, substrate release method, and constant amount gas supply apparatus
US-2025140594-A1 · May 1, 2025 · US
Substrate holding apparatus, substrate suction determination method, substrate polishing apparatus, substrate polishing method, method of removing liquid from upper surface of wafer to be polished, elastic film for pressing wafer against polishing pad, substrate release method, and constant amount gas supply apparatus
US-12230529-B2 · Feb 18, 2025 · US
Film-thickness measuring method, method of detecting notch portion, and polishing apparatus
US-12183642-B2 · Dec 31, 2024 · US
Polishing apparatus and polishing method
US-2024391054-A1 · Nov 28, 2024 · US
Recent patents
Latest publications not already listed above.
Polishing apparatus
US-12128523-B2 · Oct 29, 2024 · US
Polishing method and polishing apparatus
US-2024351161-A1 · Oct 24, 2024 · US
Elastic membrane, substrate holding device, and polishing apparatus
US-12068189-B2 · Aug 20, 2024 · US
Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane
US-11958163-B2 · Apr 16, 2024 · US
Elastic membrane
US-D1021832-S · Apr 9, 2024 · US
Polishing head system and polishing method
US-2024066658-A1 · Feb 29, 2024 · US
Polishing method and polishing apparatus
US-2024025007-A1 · Jan 25, 2024 · US
Polishing head and polishing apparatus
US-11752590-B2 · Sep 12, 2023 · US
Polishing apparatus and method of controlling inclination of stationary ring
US-11745306-B2 · Sep 5, 2023 · US
Polishing apparatus and polishing method
US-11731235-B2 · Aug 22, 2023 · US
Method of raising polishing head after polishing of workpiece, polishing apparatus for workpiece, and computer-readable storage medium storing program
US-2023191553-A1 · Jun 22, 2023 · US
Elastic membrane
US-D989012-S · Jun 13, 2023 · US
Method of detecting abnormality of a roller which transmits a local load to a retainer ring, and polishing apparatus
US-11654524-B2 · May 23, 2023 · US
Elastic membrane for semiconductor wafer polishing apparatus
US-D981969-S · Mar 28, 2023 · US
Retaining ring for substrate
US-D981459-S · Mar 21, 2023 · US
Elastic membrane and method of manufacturing elastic membrane
US-2023065029-A1 · Mar 2, 2023 · US
Break-in processing apparatus and break-in processing method
US-2023026543-A1 · Jan 26, 2023 · US
Film-thickness measuring method, method of detecting notch portion, and polishing apparatus
US-2022344221-A1 · Oct 27, 2022 · US
Substrate holding device, substrate polishing apparatus, and method of manufacturing the substrate holding device
US-11478895-B2 · Oct 25, 2022 · US
Substrate adsorption method, substrate holding apparatus, substrate polishing apparatus, elastic film, substrate adsorption determination method for substrate holding apparatus, and pressure control method for substrate holding apparatus
US-11472000-B2 · Oct 18, 2022 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Ebara Corp | 105 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P52/00 | 60 |
| B24B37/32 | 55 |
| B24B37/30 | 51 |
| B24B37/005 | 35 |
| B24B37/34 | 30 |