Elastic membrane and method of manufacturing elastic membrane

US2023065029A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2023065029-A1
Application numberUS-202217895925-A
CountryUS
Kind codeA1
Filing dateAug 25, 2022
Priority dateSep 1, 2021
Publication dateMar 2, 2023
Grant date

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  1. Title

    What the patent document calls the invention.

  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An elastic membrane having a physical property required for each portion of the elastic membrane and capable of uniformly polishing a workpiece is disclosed. The elastic membrane includes: a contact portion having a workpiece pressing surface for pressing a workpiece against a polishing surface; and a partition wall extending upward from the contact portion and forming a pressure chamber. The contact portion and at least a part of the partition wall are composed of a first rubber structure and a second rubber structure which are integrally formed, the first rubber structure has a first hardness, and the second rubber structure has a second hardness lower than the first hardness, the first rubber structure includes the workpiece pressing surface, and the second rubber structure includes the at least a part of the partition wall.

First claim

Opening claim text (preview).

What is claimed is: 1 . An elastic membrane for use in a polishing head for polishing a workpiece and for pressing the workpiece against a polishing surface, comprising: a contact portion having a workpiece pressing surface for pressing the workpiece against the polishing surface; and a partition wall extending upward from the contact portion and forming a pressure chamber, wherein the contact portion and at least a part of the partition wall are composed of a first rubber structure and a second rubber structure which are integrally formed, the first rubber structure has a first hardness, and the second rubber structure has a second hardness lower than the first hardness, the first rubber structure includes the workpiece pressing surface, and the second rubber structure includes the at least a part of the partition wall. 2 . The elastic membrane according to claim 1 , wherein the partition wall is connected to an outer edge of the contact portion, the first rubber structure includes at least a part of a lower portion of the partition wall, and the second rubber structure includes an upper portion of the partition wall. 3 . The elastic membrane according to claim 2 , wherein the upper portion of the partition wall has a bent portion configured to be expandable and contractible. 4 . The elastic membrane according to claim 1 , wherein the partition wall has a first partition wall and a second partition wall forming a plurality of pressure chambers, the first partition wall is connected to an outer edge of the contact portion, the second partition wall is located inwardly of the first partition wall, and the second rubber structure includes the second partition wall. 5 . The elastic membrane according to claim 4 , wherein the first rubber structure includes at least a part of a lower portion of the first partition wall, and the second rubber structure includes an upper portion of the first partition wall. 6 . The elastic membrane according to claim 5 , wherein the upper portion of the first partition wall has a bent portion configured to be expandable and contractible. 7 . The elastic membrane according to claim 1 , wherein the first rubber structure and the second rubber structure have irregularities on surfaces that constitute an interface between the first rubber structure and the second rubber structure. 8 . A method of manufacturing an elastic membrane for use in a polishing head for polishing a workpiece and for pressing the workpiece against a polishing surface, said method comprising: molding one of a first rubber structure having a first hardness and a second rubber structure having a second hardness lower than the first hardness; and integrally forming the first rubber structure and the second rubber structure by molding other of the first rubber structure and the second rubber structure and bonding the first rubber structure and the second rubber structure to each other, the elastic membrane including: a contact portion having a workpiece pressing surface for pressing the workpiece against the polishing surface; and a partition wall extending upward from the contact portion and forming a pressure chamber, wherein the first rubber structure includes the workpiece pressing surface, and the second rubber structure includes at least a part of the partition wall. 9 . The method of manufacturing the elastic membrane according to claim 8 , further comprising: secondary vulcanization process of heating the first rubber structure and the second rubber structure which are integrally molded. 10 . The method of manufacturing the elastic membrane according to claim 8 , further comprising: in molding of the first rubber structure or in molding of the second rubber structure, forming irregularities on surfaces that constitute an interface between the first rubber structure and the second rubber structure.

Assignees

Inventors

Classifications

  • characterised by the shape of the surface · CPC title

  • designed for working plane surfaces · CPC title

  • Accessories · CPC title

  • B24B37/30Primary

    for single side lapping of plane surfaces · CPC title

  • Heating or curing, e.g. crosslinking or vulcanizing {during moulding, e.g. in a mould}(cold vulcanisation B29C35/18 {; vulcanising tyres, presses therefor B29D30/0601}) · CPC title

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What does patent US2023065029A1 cover?
An elastic membrane having a physical property required for each portion of the elastic membrane and capable of uniformly polishing a workpiece is disclosed. The elastic membrane includes: a contact portion having a workpiece pressing surface for pressing a workpiece against a polishing surface; and a partition wall extending upward from the contact portion and forming a pressure chamber. The c…
Who is the assignee on this patent?
Ebara Corp
What technology area does this patent fall under?
Primary CPC classification B24B37/30. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Thu Mar 02 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).