Variable mode plasma chamber utilizing tunable plasma potential
US-12562342-B2 · Feb 24, 2026 · US
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Ma Shawming patents
Ma Shawming is listed as an inventor on 68 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Ma Shawming |
| Total patents | 68 |
| First publication | Jul 20, 2017 |
| Latest publication | Feb 24, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Enhanced ignition in inductively coupled plasmas for workpiece processing
US-12347677-B2 · Jul 1, 2025 · US
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid Thermal Activation Process
US-2025062133-A1 · Feb 20, 2025 · US
Atomic layer etch process using plasma in conjunction with a rapid thermal activation process
US-12159789-B2 · Dec 3, 2024 · US
Arc lamp with forming gas for thermal processing systems
US-12119216-B2 · Oct 15, 2024 · US
Variable Mode Plasma Chamber Utilizing Tunable Plasma Potential
US-2024297019-A1 · Sep 5, 2024 · US
Variable mode plasma chamber utilizing tunable plasma potential
US-12002652-B2 · Jun 4, 2024 · US
Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Processing
US-2024071754-A1 · Feb 29, 2024 · US
Enhanced ignition in inductively coupled plasmas for workpiece processing
US-11848204-B2 · Dec 19, 2023 · US
Arc Lamp With Forming Gas For Thermal Processing Systems
US-2023352294-A1 · Nov 2, 2023 · US
Recent patents
Latest publications not already listed above.
Methods for the treatment of workpieces
US-11791181-B2 · Oct 17, 2023 · US
Method for processing a workpiece using a multi-cycle thermal treatment process
US-11764072-B2 · Sep 19, 2023 · US
Arc lamp with forming gas for thermal processing systems
US-11721539-B2 · Aug 8, 2023 · US
Focus ring adjustment assembly of a system for processing workpieces under vacuum
US-11508560-B2 · Nov 22, 2022 · US
Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Processing
US-2022310359-A1 · Sep 29, 2022 · US
Processing of Semiconductors Using Vaporized Solvents
US-2022223405-A1 · Jul 14, 2022 · US
Plasma processing apparatus having a focus ring adjustment assembly
US-11348767-B2 · May 31, 2022 · US
Enhanced ignition in inductively coupled plasmas for workpiece processing
US-11348784-B2 · May 31, 2022 · US
Arc Lamp With Forming Gas For Thermal Processing Systems
US-2022165561-A1 · May 26, 2022 · US
Processing of semiconductors using vaporized solvents
US-11289323-B2 · Mar 29, 2022 · US
Variable mode plasma chamber utilizing tunable plasma potential
US-2022084792-A1 · Mar 17, 2022 · US
Carbon containing hardmask removal process using sulfur containing process gas
US-11264249-B2 · Mar 1, 2022 · US
Plasma Strip Tool with Multiple Gas Injection
US-2021398775-A1 · Dec 23, 2021 · US
Plasma strip tool with uniformity control
US-11201036-B2 · Dec 14, 2021 · US
Variable mode plasma chamber utilizing tunable plasma potential
US-11189464-B2 · Nov 30, 2021 · US
Methods And Apparatus For Pulsed Inductively Coupled Plasma For Surface Treatment Processing
US-2021343506-A1 · Nov 4, 2021 · US
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid Thermal Activation Process
US-2021343541-A1 · Nov 4, 2021 · US
Air Leak Detection In Plasma Processing Apparatus With Separation Grid
US-2021307151-A1 · Sep 30, 2021 · US
Plasma Processing Apparatus and Methods
US-2021257196-A1 · Aug 19, 2021 · US
Atomic layer etch process using plasma in conjunction with a rapid thermal activation process
US-11062912-B2 · Jul 13, 2021 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Mattson Tech Inc | 68 |
| Beijing E Town Semiconductor Tech Co Ltd | 51 |
| Beijing E Town Semiconductor Co Ltd | 1 |
| Beijing E-Town Semiconductor Technology Co Ltd | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H01J37/321 | 28 |
| H01J37/32449 | 25 |
| H01J37/32357 | 24 |
| H01J37/32715 | 23 |
| H01J37/32422 | 23 |