Etchant composition
US-12590249-B2 · Mar 31, 2026 · US
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Lim Jung-Hun patents
Lim Jung-Hun is listed as an inventor on 23 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Lim Jung-Hun |
| Total patents | 23 |
| First publication | Jul 16, 2015 |
| Latest publication | Mar 31, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Composition for etching and manufacturing method of semiconductor device using the same
US-2025026962-A1 · Jan 23, 2025 · US
Semiconductor element
US-12163058-B2 · Dec 10, 2024 · US
Semiconductor element
US-12146076-B2 · Nov 19, 2024 · US
Composition for etching and manufacturing method of semiconductor device using the same
US-12012525-B2 · Jun 18, 2024 · US
Composition for etching and manufacturing method of semiconductor device using the same
US-11912902-B2 · Feb 27, 2024 · US
Composition for etching and manufacturing method of semiconductor device using the same
US-11512226-B2 · Nov 29, 2022 · US
Composition for etching and manufacturing method of semiconductor device using the same
US-11499073-B2 · Nov 15, 2022 · US
Composition for etching and manufacturing method of semiconductor device using the same
US-11414569-B2 · Aug 16, 2022 · US
Etchant composition
US-2022025261-A1 · Jan 27, 2022 · US
Recent patents
Latest publications not already listed above.
Etchant composition and method of fabricating semiconductor device
US-11142694-B2 · Oct 12, 2021 · US
Etchant composition and method of fabricating integrated circuit device using the same
US-10995269-B2 · May 4, 2021 · US
Composition for etching and manufacturing method of semiconductor device using the same
US-2021079266-A1 · Mar 18, 2021 · US
Composition for etching and method for manufacturing semiconductor device using the same
US-2021054234-A1 · Feb 25, 2021 · US
Composition for etching and manufacturing method of semiconductor device using the same
US-2021054238-A1 · Feb 25, 2021 · US
Composition for etching and manufacturing method of semiconductor device using the same
US-2021054236-A1 · Feb 25, 2021 · US
Composition for etching and manufacturing method of semiconductor device using the same
US-2021054237-A1 · Feb 25, 2021 · US
Composition for etching and manufacturing method of semiconductor device using the same
US-2021054235-A1 · Feb 25, 2021 · US
Etchant composition and method of fabricating semiconductor device
US-2020216758-A1 · Jul 9, 2020 · US
Composition for etching and manufacturing method of semiconductor device using the same
US-2019136090-A1 · May 9, 2019 · US
Etchant composition and method of fabricating integrated circuit device using the same
US-2018142151-A1 · May 24, 2018 · US
Methods of forming conductive patterns and methods of manufacturing semiconductor devices using the same using an etchant composition that includes phosphoric acid, nitric acid, and an assistant oxidant
US-9530670-B2 · Dec 27, 2016 · US
Methods of forming conductive patterns and methods of manufacturing semiconductor devices using the same
US-2015200112-A1 · Jul 16, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Soulbrain Co Ltd | 22 |
| Samsung Electronics Co Ltd | 8 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10B43/27 | 23 |
| C09K13/04 | 23 |
| H10P50/283 | 21 |
| C09K13/06 | 21 |
| H01L21/31111 | 19 |