Apparatus for edge control during plasma processing
US-2026074152-A1 · Mar 12, 2026 · US
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Lane Barton patents
Lane Barton is listed as an inventor on 64 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Lane Barton |
| Total patents | 64 |
| First publication | Jan 29, 2015 |
| Latest publication | Mar 12, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Hybrid plasma source
US-2026066224-A1 · Mar 5, 2026 · US
Apparatus for plasma processing
US-2026045449-A1 · Feb 12, 2026 · US
Equipment and method for improved edge uniformity of plasma processing of wafers
US-12531205-B2 · Jan 20, 2026 · US
Plasma processing with magnetic ring x point
US-2025391665-A1 · Dec 25, 2025 · US
Apparatus for edge control during plasma processing
US-12500067-B2 · Dec 16, 2025 · US
Apparatus for plasma processing
US-12451327-B2 · Oct 21, 2025 · US
System and method of pulse scoring
US-2025293095-A1 · Sep 18, 2025 · US
Plasma processing with magnetic ring X point
US-12412748-B2 · Sep 9, 2025 · US
Radio frequency sensor calibration by virtual metrology
US-2025271830-A1 · Aug 28, 2025 · US
Recent patents
Latest publications not already listed above.
Plasma adjustment using source-less resonant structure
US-2025273428-A1 · Aug 28, 2025 · US
Resonant phase-controlled oscillator
US-2025273430-A1 · Aug 28, 2025 · US
Method and system for plasma process
US-2025166972-A1 · May 22, 2025 · US
Method and System for Plasma Process
US-2025132128-A1 · Apr 24, 2025 · US
Process control enabled VDC sensor for plasma process
US-12272520-B2 · Apr 8, 2025 · US
Method for plasma processing
US-2025069852-A1 · Feb 27, 2025 · US
Radio frequency (RF) system with embedded RF signal pickups
US-12224164-B2 · Feb 11, 2025 · US
Apparatus and method for plasma processing
US-2025037977-A1 · Jan 30, 2025 · US
Plasma processing method and apparatus
US-2025022688-A1 · Jan 16, 2025 · US
Apparatus for plasma processing
US-2025014865-A1 · Jan 9, 2025 · US
RF voltage and current (V-I) sensors and measurement methods
US-12176183-B2 · Dec 24, 2024 · US
Parallel Resonance Antenna for Radial Plasma Control
US-2024380114-A1 · Nov 14, 2024 · US
Apparatus for plasma processing
US-12119207-B2 · Oct 15, 2024 · US
Parallel resonance antenna for radial plasma control
US-12074390-B2 · Aug 27, 2024 · US
Antenna Plane Magnets for Improved Performance
US-2024258074-A1 · Aug 1, 2024 · US
System and Method for Plasma Processing
US-2024213005-A1 · Jun 27, 2024 · US
In-situ diagnosis of plasma system
US-2024203713-A1 · Jun 20, 2024 · US
Parallel Resonance Antenna for Radial Plasma Control
US-2024162619-A1 · May 16, 2024 · US
Plasma Processing with Magnetic Ring X Point
US-2024038506-A1 · Feb 1, 2024 · US
RF Voltage and Current (V-I) Sensors and Measurement Methods
US-2024038496-A1 · Feb 1, 2024 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Tokyo Electron Ltd | 63 |
| Lane Barton | 2 |
| Funk Merritt | 1 |
| Chen Lee | 1 |
| Zhao Jianping | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H01J37/32174 | 23 |
| H01J37/321 | 19 |
| H01J37/3211 | 19 |
| H01J37/32082 | 17 |
| H01J37/32091 | 15 |