Apparatus for plasma processing

Patent metadata

Field	Value
Publication number	US-12451327-B2
Application number	US-202217649823-A
Country	US
Kind code	B2
Filing date	Feb 3, 2022
Priority date	Feb 3, 2022
Publication date	Oct 21, 2025
Grant date	Oct 21, 2025

Abstract

An antenna includes an inner structure, an outer structure, and a plurality of interconnecting structures coupling the inner structure to the outer structure. The plurality of interconnecting structures is axisymmetric with respect to a center of the antenna. Each interconnecting structure has an azimuthal component of at least 30 degrees.

First claim

What is claimed is:

1. An antenna for plasma processing, the antenna comprising:
an inner ring located in a first plane;
an outer ring located in the first plane; and
a plurality of spiral arms located in a second plane, the second plane being above the first plane, each spiral arm of the plurality of spiral arms being connected to the inner ring by a respective conductive offset, and each spiral arm of the plurality of spiral arms being connected to the outer ring by another respective conductive offset.

2. The antenna of claim 1 , wherein the antenna is inductively or capacitively couplable to a plasma chamber.

3. The antenna of claim 1 , wherein the antenna is a unibody structure.

4. The antenna of claim 1 , wherein a resonant frequency of the antenna is between 5 and 100 megahertz (MHz).

5. The antenna of claim 1 , wherein the antenna comprises multiple radial zones.

6. The antenna of claim 1 , wherein the plurality of interconnecting spiral arms has two spiral arms.

7. The antenna of claim 1 , wherein each respective conductive offset comprises a straight sidewall in a perspective view.

8. The antenna of claim 1 , wherein each respective conductive offset has a longitudinal dimension perpendicular to the first plane.

9. A system comprising the antenna of claim 1 , wherein the system comprises:
a radio frequency (RF) generator;
a feeding structure coupling the RF generator to the antenna; and
a plasma chamber coupled to the antenna.

Assignees

• Tokyo Electron Ltd

Inventors

• Yamazawa Yohei
• Moyama Kazuki
• Lane Barton
• Funk Merritt

Classifications

• H01J37/321

  the radio frequency energy being inductively coupled to the plasma · CPC title

• H01J37/32091

  the radio frequency energy being capacitively coupled to the plasma · CPC title

• H01J37/32577

  Electrical connecting means · CPC title

• H01J37/32642

  Focus rings · CPC title

• H01J37/3211 Primary

  Antennas, e.g. particular shapes of coils · CPC title