RF voltage and current (V-I) sensors and measurement methods
US-11600474-B2 · Mar 7, 2023 · US
US12224164B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12224164-B2 |
| Application number | US-202117514815-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 29, 2021 |
| Priority date | Oct 29, 2021 |
| Publication date | Feb 11, 2025 |
| Grant date | Feb 11, 2025 |
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Official abstract text for this publication.
A radio frequency (RF) system including: a first conductive covering surface, a portion of the first conductive covering surface including a portion of the first outer wall of a first RF device; a second conductive covering surface aligned to the first conductive covering surface, the second conductive covering surface being disposed around the insulating hole; an insulating hole for an RF center conductor extending through the first conductive covering surface and the second conductive covering surface, the first conductive covering surface and the second conductive covering surface being disposed around the insulating hole; a cavity bounded by the first conductive covering surface and the second conductive covering surface, the cavity being an insulating region; and an RF signal pickup disposed within the cavity.
Opening claim text (preview).
What is claimed is: 1. A radio frequency (RF) system comprising: a first RF device having a first outer wall; a first conductive covering surface, a portion of the first conductive covering surface comprising a portion of the first outer wall; a second RF device having a second outer wall, the first RF device being electrically coupled to the second RF device; a second conductive covering surface, a portion of the second conductive covering surface comprising a portion of the second outer wall; an insulating hole for an RF center conductor extending through the first conductive covering surface and the second conductive covering surface; a cavity disposed between the first conductive covering surface and the second conductive covering surface, the cavity being an insulating region; and an RF signal pickup disposed in the cavity. 2. The system of claim 1 , wherein the RF signal pickup comprises: a current pickup, the current pickup having two ends; or a voltage pickup; or an electromagnetic (EM) pickup, the EM pickup being a combination of a current pickup and a voltage pickup, the voltage pickup being interposed between the current pickup and the insulating hole. 3. The system of claim 1 , further comprising a conductive region disposed outside the cavity and the insulating hole, and coupling the first conductive covering surface to the second conductive covering surface, wherein the conductive region, the first conductive covering surface, and the second conductive covering surface are coupled to a reference potential. 4. The system of claim 1 , further comprising a cavity wall disposed in a peripheral region of the cavity, the cavity being contiguous with the insulating hole and bounded in a radial direction by the cavity wall and an outer surface of the insulating hole. 5. The system of claim 1 , wherein a portion of the cavity is a recess in the first outer wall of the first RF device. 6. The system of claim 2 , wherein the cavity further comprises electrically insulating components, the electrically insulating components mechanically supporting the RF signal pickup. 7. The system of claim 1 , further comprising terminals disposed in a recessed region in the first outer wall, the terminals being coupled to the RF signal pickup, wherein the recessed region further comprises electronic circuitry electrically coupled to the terminals. 8. The system of claim 1 , wherein the RF signal pickup is a non-resonant signal pickup for broadband frequencies and harmonics. 9. The system of claim 1 , wherein the first RF device is a plasma chamber. 10. A radio frequency (RF) system comprising: a first conductive covering surface, a portion of the first conductive covering surface comprising a portion of a first outer wall of a first RF device; a second conductive covering surface aligned to the first conductive covering surface, the second conductive covering surface being disposed around an insulating hole; the insulating hole for an RF center conductor extending through the first conductive covering surface and the second conductive covering surface, the first conductive covering surface and the second conductive covering surface being disposed around the insulating hole; a cavity bounded by the first conductive covering surface and the second conductive covering surface, the cavity being an insulating region; and an RF signal pickup disposed within the cavity. 11. The system of claim 10 , wherein the second conductive covering surface is a region of the first outer wall of the first RF device. 12. The system of claim 10 , wherein the second conductive covering surface is attached to an outer wall of the first RF device, wherein the second conductive covering surface is opposite the first conductive covering surface. 13. The system of claim 10 , wherein the second conductive covering surface is a region of an outer wall of a second RF device. 14. The system of claim 10 , wherein the first conductive covering surface is attached to a first recess in an outer wall of a first RF device. 15. The system of claim 14 , wherein the second conductive covering surface is attached to a second recess in an outer wall of a second RF device. 16. The system of claim 10 , wherein the RF signal pickup comprises: a current pickup; or a voltage pickup; or an electromagnetic (EM) pickup, the EM pickup being a combination of a current pickup and a voltage pickup, the voltage pickup being interposed between the current pickup and the insulating hole. 17. The system of claim 10 , wherein the first conductive covering surface comprises a first conductive protrusion disposed around the insulating hole, and the second conductive covering surface comprises a second conductive protrusion disposed around the insulating hole, the first conductive protrusion overlaying with the second conductive protrusion. 18. The system of claim 10 , wherein the first conductive covering surface comprises a first conductive protrusion disposed around the insulating hole, and the second conductive covering surface comprises a second conductive protrusion disposed around the insulating hole, the first conductive protrusion located at a fixed offset distance from the second conductive protrusion. 19. A radio frequency (RF) system comprising: a first conductive covering surface, a portion of the first conductive covering surface comprising a portion of a first outer wall of an impedance matcher circuit; a second conductive covering surface aligned to the first conductive covering surface, the second conductive covering surface being disposed around an insulating hole, the second conductive covering surface being a region of an outer wall of a plasma chamber; the insulating hole for an RF center conductor extending through the first conductive covering surface and the second conductive covering surface, the first conductive covering surface and the second conductive covering surface being disposed around the insulating hole; a cavity bounded by the first conductive covering surface and the second conductive covering surface, the cavity being an insulating region; and an RF signal pickup disposed within the cavity. 20. The system of claim 19 , wherein the RF signal pickup comprises: a current pickup. 21. The system of claim 19 , wherein the RF signal pickup comprises a voltage pickup. 22. The system of claim 19 , wherein the RF signal pickup comprises an electromagnetic (EM) pickup, the EM pickup being a combination of a current pickup and a voltage pickup, the voltage pickup being interposed between the current pickup and the insulating hole.
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