Methods, systems, and apparatus for conducting a radical treatment operation prior to conducting an annealing operation
US-12593666-B2 · Mar 31, 2026 · US
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Iu Dongming patents
Iu Dongming is listed as an inventor on 45 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Iu Dongming |
| Total patents | 45 |
| First publication | Dec 3, 2015 |
| Latest publication | Mar 31, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Reflector plate for substrate processing
US-12588456-B2 · Mar 24, 2026 · US
Emissive liner arrangements for annealing operations, and related process chambers, systems, components, and methods
US-2026028689-A1 · Jan 29, 2026 · US
Growth suppression deposition for cvd tungsten gap fill with thermal treatment
US-2025246482-A1 · Jul 31, 2025 · US
Heat reflection assembly for substrate temperature uniformity
US-2025210381-A1 · Jun 26, 2025 · US
Rotatable thermal processing chamber
US-12176242-B2 · Dec 24, 2024 · US
Enable cvd chamber process wafers at different temperatures
US-2024352588-A1 · Oct 24, 2024 · US
Higher pressure purge for impurity reduction in radical treatment chamber
US-2024290585-A1 · Aug 29, 2024 · US
Methods, systems, and apparatus for conducting a radical treatment operation prior to conducting an annealing operation
US-2024178004-A1 · May 30, 2024 · US
Thermal chamber with improved thermal uniformity
US-11978646-B2 · May 7, 2024 · US
Recent patents
Latest publications not already listed above.
Reflector plate for substrate processing
US-2024079252-A1 · Mar 7, 2024 · US
Methods, systems, and apparatus for conducting a radical treatment operation prior to conducting an annealing operation
US-11901195-B2 · Feb 13, 2024 · US
System and method for managing substrate outgassing
US-11817297-B2 · Nov 14, 2023 · US
Uniform radiation heating control architecture
US-2023297740-A1 · Sep 21, 2023 · US
Rotatable thermal processing chamber
US-2023238269-A1 · Jul 27, 2023 · US
Vacuum chuck pressure control system
US-11694919-B2 · Jul 4, 2023 · US
Methods and apparatus for measuring edge ring temperature
US-11664250-B2 · May 30, 2023 · US
Methods, systems, and apparatus for conducting a radical treatment operation prior to conducting an annealing operation
US-2023128128-A1 · Apr 27, 2023 · US
Methods, systems, and apparatus for optically monitoring individual lamps
US-11562915-B2 · Jan 24, 2023 · US
Methods, systems, and apparatus for optically monitoring individual lamps
US-2022301904-A1 · Sep 22, 2022 · US
Methods and apparatus for measuring edge ring temperature
US-2022246453-A1 · Aug 4, 2022 · US
Plasma-enhanced anneal chamber for wafer outgassing
US-11348769-B2 · May 31, 2022 · US
Methods and apparatus for measuring edge ring temperature
US-11342209-B2 · May 24, 2022 · US
System and method for managing substrate outgassing
US-2021280391-A1 · Sep 9, 2021 · US
Methods and apparatus for measuring edge ring temperature
US-2021175101-A1 · Jun 10, 2021 · US
Thermal processing chamber with low temperature control
US-10948353-B2 · Mar 16, 2021 · US
Plasma-enhanced anneal chamber for wafer outgassing
US-2020402780-A1 · Dec 24, 2020 · US
Plasma-enhanced anneal chamber for wafer outgassing
US-10770272-B2 · Sep 8, 2020 · US
Semiconductor processing chamber
US-10741428-B2 · Aug 11, 2020 · US
Thermal processing chamber with low temperature control
US-2020149968-A1 · May 14, 2020 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 45 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P72/0436 | 19 |
| H10P95/90 | 15 |
| H10P72/0602 | 15 |
| H10P72/0431 | 14 |
| H10P72/7611 | 12 |