Thermal chamber with improved thermal uniformity

Patent metadata

Field	Value
Publication number	US-11978646-B2
Application number	US-201815982785-A
Country	US
Kind code	B2
Filing date	May 17, 2018
Priority date	May 18, 2017
Publication date	May 7, 2024
Grant date	May 7, 2024

Abstract

Embodiments of the disclosure generally relate to a semiconductor processing chamber. In one embodiment, semiconductor processing chamber is disclosed and includes a chamber body having a bottom and a sidewall defining an interior volume, the sidewall having a substrate transfer port formed therein, and one or more absorber bodies positioned in the interior volume in a position opposite of the substrate transfer port.

First claim

The invention claimed is:

1. A semiconductor processing chamber, comprising:
a chamber body having a bottom and a sidewall defining an interior volume, the sidewall having a substrate transfer port formed therein;
a substrate support and a showerhead positioned in the interior volume; and
a plurality of absorber bodies disposed in the interior volume, the plurality of absorber bodies occupying only a portion of the interior volume opposing the substrate transfer port, each absorber body being supported by one or more stand-off pins spacing each absorber body away from the bottom, wherein each absorber body is shaped as a portion of an arc.

2. The chamber of claim 1 , wherein the plurality of absorber bodies consists of two members having a major surface in plan view disposed in a plane that is parallel to a supporting surface of the substrate support.

3. The chamber of claim 1 , wherein each absorber body comprises a material that absorbs infrared radiation in the 2 micron to 7 micron range.

4. The chamber of claim 1 , wherein the substrate support has a profiled upper surface.

5. The chamber of claim 4 , wherein the profiled upper surface comprises a plurality of projections formed on a substrate receiving surface of the substrate support.

6. The chamber of claim 5 , wherein the substrate receiving surface includes a central region and the projections have a length that increases from the central region to a peripheral region thereof.

7. The chamber of claim 4 , wherein the profiled upper surface comprises a dished area formed between a raised central region and a raised peripheral region of a substrate receiving surface of the substrate support.

8. The chamber of claim 1 , further comprising: a reflective faceplate coupled to the showerhead facing an upper surface of the substrate support.

9. The chamber of claim 1 , wherein the substrate support includes a first region facing the substrate transfer port, and a second region and a third region adjacent to the first region, and the substrate support further comprises lift pins which are positioned disproportionally in or on the second and third region.

10. The chamber of claim 1 , wherein the substrate support is coupled to a shaft and a base assembly, the base assembly including an adapter body including a plurality of raised surfaces and gaps adapted to reduce thermal transfer between the shaft and the adapter body.

11. A semiconductor processing chamber, comprising:
a chamber body having a bottom and a sidewall defining an interior volume, the sidewall having a substrate transfer port formed therein;
a substrate support disposed in the interior volume; and
a plurality of absorber bodies positioned in the interior volume about the substrate support in a position occupying only a portion of the interior volume opposing the substrate transfer port, each of the absorber bodies being supported by one or more stand-off pins spacing the respective absorber body away from the bottom, wherein each of the absorber bodies comprises a black material having a horseshoe shape in plan view and includes a first portion and a second portion, the first portion being thicker than the second portion.

12. The chamber of claim 11 , wherein the substrate support includes a profiled upper surface.

13. The chamber of claim 12 , wherein the profiled upper surface comprises a plurality of projections formed on a substrate receiving surface of the substrate support.

14. The chamber of claim 13 , wherein the substrate receiving surface includes a central region and the projections have a length that increases from the central region to a peripheral region thereof.

15. The chamber of claim 12 , wherein the profiled upper surface comprises a dished area formed between a raised central region and a raised peripheral region of a substrate receiving surface of the substrate support.

16. The chamber of claim 11 , further comprising:
a showerhead positioned over the substrate support;
a reflective faceplate coupled to the showerhead facing an upper surface of the substrate support.

17. The chamber of claim 11 , wherein the substrate support includes a first region facing the substrate transfer port, and a second region and a third region adjacent to the first region, and the substrate support further comprises lift pins which are positioned disproportionally in or on the second and third region.

18. A semiconductor processing chamber, comprising:
a chamber body having a bottom and a sidewall defining an interior volume, the sidewall having a substrate transfer port formed therein; and
a substrate support and a showerhead disposed in the interior volume, the substrate support including a first segment facing the substrate transfer port, and a second segment and a third segment adjacent to the first segment, wherein an absorber body is positioned in the interior volume adjacent to both of the second segment and the third segment, and wherein the absorber body occupies only a portion of the interior volume opposite the substrate transfer port, and wherein the absorber body comprises an anodized material that absorbs infrared radiation in the 2 micron to 7 micron range and includes a first portion and a second portion, the first portion being thicker than the second portion, and the absorber body is shaped as a partial arc in plan view.

Assignees

• Applied Materials Inc

Inventors

• Iu Dongming
• Shah Kartik
• Tam Norman L
• Spuller Matthew
• Chen Jau-Jiun
• Chan Kong Lung Samuel
• Neville Elizabeth
• Rao Preetham
• Mayur Abhilash J
• Pham Gia

Classifications

• H10P72/0431 Primary

  Apparatus for thermal treatment · CPC title

• H10P72/7626

  characterised by the construction of the shaft · CPC title

• H10P72/7614

  characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/7611

  characterised by edge profile or support profile · CPC title