Thermal processing chamber with low temperature control

US10948353B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10948353-B2
Application numberUS-202016741907-A
CountryUS
Kind codeB2
Filing dateJan 14, 2020
Priority dateMay 26, 2017
Publication dateMar 16, 2021
Grant dateMar 16, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. In one or more embodiments, a process chamber includes chamber body, a window disposed on a first portion of the chamber body, a chamber bottom, and a shield disposed on a second portion of the chamber body. The shield has a flat surface facing the window to reduce reflected radiant energy to a back side of a substrate disposed in the process chamber during operation. The process chamber further includes an edge support for supporting the substrate and a cooling member disposed on the chamber bottom. The cooling member is disposed in proximity of the edge support to cool the edge support during low temperature operation in order to improve the temperature uniformity of the substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus, comprising: a chamber body; a window disposed on the chamber body; a chamber bottom; a cooling member disposed on the chamber bottom, wherein the cooling member comprises: a first surface; a second surface opposite the first surface and having a recess formed in the second surface; an outer surface connecting the first surface and the second surface; an inner surface opposite the outer surface; and one or more surfaces connecting the first surface and the inner surface, a plurality of openings formed in the one or more surfaces and in fluid communication with the recess; and a reflector plate disposed on the chamber bottom. 2. The apparatus of claim 1 , wherein the reflector plate secures the cooling member to the chamber bottom. 3. The apparatus of claim 1 , further comprising: a first channel formed adjacent the chamber body; a rotatable substrate support disposed within the first channel; an edge support disposed on the rotatable substrate support, wherein the cooling member is disposed in proximity of the edge support; and a shield disposed on the chamber body, wherein the shield partially extends over the first channel. 4. The apparatus of claim 3 , wherein the shield has a surface substantially parallel to the window. 5. The apparatus of claim 4 , wherein the channel includes an outer wall having a lower portion and an upper portion, and the shield is in contact with the upper portion of the outer wall. 6. The apparatus of claim 5 , wherein the lower portion has a first radius, and the upper portion has a second radius substantially greater than the first radius. 7. The apparatus of claim 1 , wherein the recess and the chamber bottom form a second channel. 8. The apparatus of claim 1 , wherein the reflector plate comprises a third channel formed therein. 9. The apparatus of claim 8 , wherein the third channel comprises a first portion, a second portion, and a third portion, wherein the first portion and the second portion intersect at the third portion, and an acute angle is formed at the intersection. 10. The apparatus of claim 1 , wherein the one or more surfaces comprises: a third surface; a first connecting surface connecting the third surface and the first surface; a fourth surface; and a second connecting surface connecting the third surface and the fourth surface. 11. The apparatus of claim 10 , wherein the one or more surfaces further comprises: a fifth surface; a third connecting surface connecting the fourth surface and the fifth surface; and a sixth surface connecting the fifth surface and the inner surface. 12. An apparatus, comprising: a chamber body; a window disposed on the chamber body; a chamber bottom; a cooling member disposed on the chamber bottom, wherein the cooling member comprises: a first surface; a second surface opposite the first surface and having a recess formed in the second surface; an outer surface connecting the first surface and the second surface; an inner surface opposite the outer surface; and one or more surfaces connecting the first surface and the inner surface, a plurality of openings formed in the one or more surfaces and in fluid communication with the recess, and wherein the one or more surfaces comprises a third surface, a first connecting surface connecting the third surface and the first surface, a fourth surface, and a second connecting surface connecting the third surface and the fourth surface; and a reflector plate disposed on the chamber bottom, wherein the reflector plate secures the cooling member to the chamber bottom. 13. The apparatus of claim 12 , further comprising: a first channel formed adjacent the chamber body; a rotatable substrate support disposed within the first channel; an edge support disposed on the rotatable substrate support, wherein the cooling member is disposed in proximity of the edge support; and a shield disposed on the chamber body, wherein the shield partially extends over the first channel. 14. The apparatus of claim 13 , wherein the shield has a surface substantially parallel to the window. 15. The apparatus of claim 14 , wherein the channel includes an outer wall having a lower portion and an upper portion, and the shield is in contact with the upper portion of the outer wall. 16. The apparatus of claim 15 , wherein the lower portion has a first radius, and the upper portion has a second radius substantially greater than the first radius. 17. The apparatus of claim 12 , wherein the recess and the chamber bottom form a second channel. 18. The apparatus of claim 12 , wherein the reflector plate comprises a third channel formed therein. 19. The apparatus of claim 18 , wherein the third channel comprises a first portion, a second portion, and a third portion, wherein the first portion and the second portion intersect at the third portion, and an acute angle is formed at the intersection. 20. The apparatus of claim 12 , wherein the one or more surfaces further comprises: a fifth surface; a third connecting surface connecting the fourth surface and the fifth surface; and a sixth surface connecting the fifth surface and the inner surface.

Assignees

Inventors

Classifications

  • Thermal treatments, e.g. annealing or sintering · CPC title

  • Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects · CPC title

  • characterised by multiple measurements, corrections, marking or sorting processes · CPC title

  • characterised by the properties tested or measured, e.g. structural or electrical properties · CPC title

  • characterised by edge profile or support profile · CPC title

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What does patent US10948353B2 cover?
Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. In one or more embodiments, a process chamber includes chamber body, a window disposed on a first portion of the chamber body, a chamber bottom, and a shield disposed on a second portion of the chamber body. The shield has a flat surface facing the window to reduce reflected ra…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification G01J5/0007. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 16 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 10 related publications on this page (citations in our corpus or others sharing the same primary CPC).