Semiconductor processing tool and methods of operation
US-2025321496-A1 · Oct 16, 2025 · US
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Chen Minfeng patents
Chen Minfeng is listed as an inventor on 30 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Chen Minfeng |
| Total patents | 30 |
| First publication | Jan 3, 2019 |
| Latest publication | Oct 16, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Semiconductor processing tool and methods of operation
US-12399431-B2 · Aug 26, 2025 · US
Method of manufacturing a semiconductor device
US-2025199408-A1 · Jun 19, 2025 · US
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
US-2025147431-A1 · May 8, 2025 · US
Method of manufacturing a semiconductor device
US-12265332-B2 · Apr 1, 2025 · US
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
US-12235589-B2 · Feb 25, 2025 · US
Method of manufacturing a semiconductor device
US-2024393690-A1 · Nov 28, 2024 · US
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
US-2023333486-A1 · Oct 19, 2023 · US
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
US-11709435-B2 · Jul 25, 2023 · US
Semiconductor processing tool and methods of operation
US-2023152709-A1 · May 18, 2023 · US
Recent patents
Latest publications not already listed above.
Method of manufacturing a semiconductor device
US-2023004087-A1 · Jan 5, 2023 · US
Extreme ultraviolet mask and method of manufacturing the same
US-2022350236-A1 · Nov 3, 2022 · US
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
US-2022260931-A1 · Aug 18, 2022 · US
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
US-11320747-B2 · May 3, 2022 · US
Method for forming photomask and photolithography method
US-11307492-B2 · Apr 19, 2022 · US
Photomask design for generating plasmonic effect
US-11211374-B2 · Dec 28, 2021 · US
Pellicle structure for lithography mask
US-11175597-B2 · Nov 16, 2021 · US
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
US-2021096475-A1 · Apr 1, 2021 · US
Extreme ultraviolet (EUV) polarization splitter
US-10962885-B2 · Mar 30, 2021 · US
Method for forming photomask and photolithography method
US-2021080822-A1 · Mar 18, 2021 · US
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
US-10866525-B2 · Dec 15, 2020 · US
Method for forming photomask and photolithography method
US-10845699-B2 · Nov 24, 2020 · US
Photomask design for generating plasmonic effect
US-2020312835-A1 · Oct 1, 2020 · US
Photomask design for generating plasmonic effect
US-10685950-B2 · Jun 16, 2020 · US
Pellicle structure for lithography mask
US-2020174382-A1 · Jun 4, 2020 · US
Extreme ultraviolet (euv) polarization splitter
US-2020124978-A1 · Apr 23, 2020 · US
Extreme ultraviolet mask and method of manufacturing the same
US-2020041892-A1 · Feb 6, 2020 · US
Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device
US-2020041915-A1 · Feb 6, 2020 · US
Method for forming photomask and photolithography method
US-2019163051-A1 · May 30, 2019 · US
Photomask Design for Generating Plasmonic Effect
US-2019006343-A1 · Jan 3, 2019 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Taiwan Semiconductor Mfg Co Ltd | 30 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/2004 | 19 |
| G03F7/2022 | 13 |
| H10P76/2041 | 11 |
| H01L21/0274 | 11 |
| G03F7/70566 | 9 |