Underlayer composition and method of manufacturing a semiconductor device
US-2024369932-A1 · Nov 7, 2024 · US
Electricity
Electricity · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H01L21/0274 |
| Official title | — |
| Display label | Electricity (mapped technology topic) |
| Total patents | 3,284 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 113 |
| 2016 | 219 |
| 2017 | 295 |
| 2018 | 326 |
| 2019 | 436 |
| 2020 | 378 |
| 2021 | 350 |
| 2022 | 298 |
| 2023 | 268 |
| 2024 | 276 |
| 2025 | 285 |
| 2026 | 40 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Photoresist layer outgassing prevention
US-2024282577-A1 · Aug 22, 2024 · US
Manufacturing method of display substrate, display substrate and display device
US-12062711-B2 · Aug 13, 2024 · US
Film deposition apparatus for fine pattern forming
US-2024096595-A1 · Mar 21, 2024 · US
Exposure mask, pattern forming method, and method of manufacturing semiconductor device
US-2024069430-A1 · Feb 29, 2024 · US
Mechanisms for Forming Patterns Using Multiple Lithography Processes
US-2015380259-A1 · Dec 31, 2015 · US
Conductive Line System and Process
US-2015364369-A1 · Dec 17, 2015 · US
Resist underlayer film-forming composition
US-2015362838-A1 · Dec 17, 2015 · US
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device
US-9213237-B2 · Dec 15, 2015 · US
Reducing Defects in Patterning Processes
US-2015357196-A1 · Dec 10, 2015 · US
Methods for fabricating integrated circuits including generating photomasks for directed self-assembly
US-9208275-B2 · Dec 8, 2015 · US
Projection Patterning With Exposure Mask
US-2015348775-A1 · Dec 3, 2015 · US
Fabrication of localized soi on localized thick box using selective epitaxy on bulk semiconductor substrates for photonics device integration
US-2015348827-A1 · Dec 3, 2015 · US
Method and apparatus for increased recirculation and filtration in a photoresist dispense system using a liquid empty reservoir
US-2015328650-A1 · Nov 19, 2015 · US
Method and apparatus for multiple recirculation and filtration cycles per dispense in a photoresist dispense system
US-2015328649-A1 · Nov 19, 2015 · US
Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device
US-2015325431-A1 · Nov 12, 2015 · US
Method for fabricating a coil by way of a rounded trench
US-9183977-B2 · Nov 10, 2015 · US
Methods for Integrated Circuit Design and Fabrication
US-2015311063-A1 · Oct 29, 2015 · US
Phase-shift mask
US-2015301443-A1 · Oct 22, 2015 · US
Methods for extreme ultraviolet mask defect mitigation by multi-patterning
US-2015294858-A1 · Oct 15, 2015 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC H01L21/0274?
- CPC H01L21/0274 is the Cooperative Patent Classification code for “Electricity.”
- How many patents are filed under CPC H01L21/0274 (Electricity)?
- Our database includes 3,284 publications tagged with this CPC code.
- Is patent activity under CPC H01L21/0274 growing?
- Publication counts under this code: 276 in 2024 vs 285 in 2025 (latest complete years).