Metrology target design for tilted device designs
US-2025035489-A1 · Jan 30, 2025 · US
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Adel Michael E patents
Adel Michael E is listed as an inventor on 22 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Adel Michael E |
| Total patents | 22 |
| First publication | Oct 22, 2015 |
| Latest publication | Jan 30, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Metrology target design for tilted device designs
US-12117347-B2 · Oct 15, 2024 · US
Verification metrology targets and their design
US-11874605-B2 · Jan 16, 2024 · US
Determining the impacts of stochastic behavior on overlay metrology data
US-10901325-B2 · Jan 26, 2021 · US
Verification Metrology Targets and Their Design
US-2020348604-A1 · Nov 5, 2020 · US
Target and process sensitivity analysis to requirements
US-10726169-B2 · Jul 28, 2020 · US
Verification metrology target and their design
US-10705434-B2 · Jul 7, 2020 · US
Process compatibility improvement by fill factor modulation
US-10579768-B2 · Mar 3, 2020 · US
Overlay control with non-zero offset prediction
US-10409171-B2 · Sep 10, 2019 · US
Determining the impacts of stochastic behavior on overlay metrology data
US-2019049858-A1 · Feb 14, 2019 · US
Recent patents
Latest publications not already listed above.
Analyzing root causes of process variation in scatterometry metrology
US-10203200-B2 · Feb 12, 2019 · US
Overlay Control with Non-Zero Offset Prediction
US-2018253017-A1 · Sep 6, 2018 · US
On-product derivation and adjustment of exposure parameters in a directed self-assembly process
US-10025285-B2 · Jul 17, 2018 · US
Process Compatibility Improvement by Fill Factor Modulation
US-2018157784-A1 · Jun 7, 2018 · US
Feed forward of metrology data in a metrology system
US-9903711-B2 · Feb 27, 2018 · US
Analyzing Root Causes of Process Variation in Scatterometry Metrology
US-2018023950-A1 · Jan 25, 2018 · US
On-device metrology
US-9875946-B2 · Jan 23, 2018 · US
Verification metrology targets and their design
US-2017060001-A1 · Mar 2, 2017 · US
Metrology target design for tilted device designs
US-2017023358-A1 · Jan 26, 2017 · US
Feed Forward of Metrology Data in a Metrology System
US-2016290796-A1 · Oct 6, 2016 · US
Target and process sensitivity analysis to requirements
US-2016042105-A1 · Feb 11, 2016 · US
On-product derivation and adjustment of exposure parameters in a directed self-assembly process
US-2015301514-A1 · Oct 22, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Kla Tencor Corp | 18 |
| Kla Corp | 4 |
| Kla—Tencor Corp | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70616 | 10 |
| G03F7/705 | 9 |
| H10P74/203 | 9 |
| G03F7/70633 | 8 |
| H10P74/27 | 8 |