Resist composition and patterning process
US-12072627-B2 · Aug 27, 2024 · US
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Adachi Teppei patents
Adachi Teppei is listed as an inventor on 46 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Adachi Teppei |
| Total patents | 46 |
| First publication | Mar 26, 2015 |
| Latest publication | Aug 27, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Resist composition and patterning process
US-12050402-B2 · Jul 30, 2024 · US
Resist composition and patterning process
US-2023280651-A1 · Sep 7, 2023 · US
Resist composition and patterning process
US-11693314-B2 · Jul 4, 2023 · US
Substrate protective film-forming composition and pattern forming process
US-11662663-B2 · May 30, 2023 · US
Resist composition and patterning process
US-2022236643-A1 · Jul 28, 2022 · US
Resist composition and patterning process
US-11340527-B2 · May 24, 2022 · US
Sulfonium salt, polymer, resist composition, and patterning process
US-11262653-B2 · Mar 1, 2022 · US
Resist composition and patterning process
US-2021200083-A1 · Jul 1, 2021 · US
Monomer, polymer, resist composition, and patterning process
US-11009793-B2 · May 18, 2021 · US
Recent patents
Latest publications not already listed above.
Resist composition and patterning process
US-2021141306-A1 · May 13, 2021 · US
Resist composition and pattern forming process
US-10921710-B2 · Feb 16, 2021 · US
Preparation of polymer and polymer
US-2020140592-A1 · May 7, 2020 · US
Substrate protective film-forming composition and pattern forming process
US-2020133123-A1 · Apr 30, 2020 · US
Polymer, resist composition, and pattern forming process
US-10457761-B2 · Oct 29, 2019 · US
Resist composition, pattern forming process, polymer, and monomer
US-10310376-B2 · Jun 4, 2019 · US
Monomer, polymer, resist composition, and patterning process
US-2019064664-A1 · Feb 28, 2019 · US
Resist composition and pattern forming process
US-2019033715-A1 · Jan 31, 2019 · US
Sulfonium salt, polymer, resist composition, and patterning process
US-2019033716-A1 · Jan 31, 2019 · US
Method for producing polymer
US-10191373-B2 · Jan 29, 2019 · US
Monomer, polymer, resist composition, and patterning process
US-10023674-B2 · Jul 17, 2018 · US
Positive resist composition and pattern forming process
US-10012902-B2 · Jul 3, 2018 · US
Photomask blank, resist pattern forming process, and method for making photomask
US-9904169-B2 · Feb 27, 2018 · US
Resist composition and patterning process
US-9846360-B2 · Dec 19, 2017 · US
Monomer, polymer, positive resist composition, and patterning process
US-9829792-B2 · Nov 28, 2017 · US
Patterning process
US-9760010-B2 · Sep 12, 2017 · US
Positive resist composition and pattern forming process
US-2017242339-A1 · Aug 24, 2017 · US
Polymer, resist composition, and pattern forming process
US-2017226250-A1 · Aug 10, 2017 · US
Monomer, polymer, resist composition, and patterning process
US-2017226252-A1 · Aug 10, 2017 · US
Resist composition, pattern forming process, polymer, and monomer
US-2017184967-A1 · Jun 29, 2017 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Shinetsu Chemical Co | 46 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/0397 | 42 |
| G03F7/0045 | 37 |
| G03F7/0046 | 37 |
| G03F7/004 | 27 |
| G03F7/11 | 25 |