Resist composition and patterning process

Patent metadata

Field	Value
Publication number	US-12050402-B2
Application number	US-202117082233-A
Country	US
Kind code	B2
Filing date	Jan 21, 2021
Priority date	Jan 21, 2021
Publication date	Jul 30, 2024
Grant date	Jul 30, 2024

Abstract

A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group and further containing at least one repeating unit having an aromatic substituent; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W 1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms with a heteroatom; W 2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms without a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M + represents an onium cation. This provides a resist composition and a patterning process of using it that show a particularly favorable mask dimension dependency and CDU in photolithography where a light source is a high-energy beam such as a KrF excimer laser beam, an electron beam, or an extreme ultraviolet ray.

First claim

The invention claimed is:

1. A resist composition comprising:
(A) a resin containing (i) a repeating unit having an acid-labile group, and (ii) at least one repeating unit having an aromatic substituent;
(B) a photo-acid generator component that (i) consists of at least one photo-acid generator shown by the general formula (B-1) below, or (ii) includes a combination of the photo-acid generator shown by the general formula (B-1) and at least one other photo-acid generator selected from the photo-acid generators shown by general formulae (B-2), (B-3), and (B-4) below;
(C) a solvent; and
(D) a fluorine-containing resin having at least one repeating unit selected from repeating units shown by the general formulae (D-1), (D-2), and (D-3) below, wherein the fluorine-containing resin is different from the resin (A),

wherein W 1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W 2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the above general formula; A 1 and A 2 each independently represent a hydrogen atom or a trifluoromethyl group; B 1 and B 2 each independently represent a hydrogen atom or a fluorine atom; * represents an attachment point for a carbonyloxy group; “m” represents an integer of 0 to 4; “n” represents an integer of 1; and M+ represents an onium cation that is at least one cation selected from the cations shown by formula group (b1) below and formula group (b2) below,

wherein A 1 represents a hydrogen atom or a trifluoromethyl group; R 21 represents a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 35 carbon atoms optionally containing an oxygen atom, a nitrogen-containing heterocyclic group, or a group represented by the formula (i) below; and M B + represents the same onium cation as M+,

wherein R 31 and R 32 each independently represent a hydrogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms optionally containing a heteroatom; R 31 and R 32 optionally bond with each other to form a ring with a nitrogen atom bonded to R 31 and R 32 ; R 33 represents a linear, branched, or cyclic divalent hydrocarbon group having 1 to 20 carbon atoms optionally containing a heteroatom;
wherein A 2 represents a hydrogen atom or a trifluoromethyl group; R 22 , R 23 , and R 24 each independently represent a hydrogen atom or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms optionally containing a heteroatom; “p” and “q” each independently represent an integer of 0 to 5; “r” represents an integer of 0 to 4; L represents a single bond, an ether group, or a linear, branched, or cyclic divalent hydrocarbon group having 1 to 20 carbon atoms optionally containing a heteroatom;
wherein A 3 and A 4 each independently represent a hydrogen atom or a trifluoromethyl group, and are not both a hydrogen atom at the same time; and R 25 represents a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 35 carbon atoms optionally containing an oxygen atom, a nitrogen-containing heterocyclic group, or a group shown by the formula (i),

wherein R A each independently represents a hydrogen atom or a methyl group; R 51 and R 52 each independently represent a hydrogen atom or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 10 carbon atoms; R 53 represents a single bond or a linear or branched divalent hydrocarbon group having 1 to 5 carbon atoms; R 54 , R 55 , and R 56 each independently represent a hydrogen atom, a linear, branched, or cyclic monovalent hydrocarbon group, fluorinated monovalent hydrocarbon group, or acyl group having 1 to 15 carbon atoms, or an acid-labile group; when R 54 , R 55 , and R 56 represent the monovalent hydrocarbon group or the fluorinated monovalent hydrocarbon group, some carbon atoms thereof are optionally substituted with an ether group or a carbonyl group; R 57 represents a linear, branched, or cyclic hydrocarbon group or fluorinated hydrocarbon group with a valency of (v+1) having 1 to 20 carbon atoms; and “v” represents an integer of 1 to 3.

2. The resist composition according to claim 1 , wherein W 1 in the general formula (B-1) represents a cyclic divalent hydrocarbon group containing a lactone ring structure having 6 to 12 carbon atoms.

3. The resist composition according to claim 1 , wherein W 2 in the general formula (B-1) represents a polycyclic monovalent hydrocarbon group having 7 to 14 carbon atoms and not containing a heteroatom.

4. The resist composition according to claim 2 , wherein W 2 in the general formula (B-1) represents a polycyclic monovalent hydrocarbon group having 7 to 14 carbon atoms and not containing a heteroatom.

5. The resist composition according to claim 1 , wherein the group Rf in the general formula (B-1) is selected from groups shown by the following formulae (Rf-1) to (Rf-6),

wherein * represents an attachment point for a carbonyloxy group.

6. The resist composition according to claim 2 , wherein the group Rf in the general formula (B-1) is selected from groups shown by the following formulae (Rf-1) to (Rf-6),

Assignees

• Shinetsu Chemical Co

Inventors

• Adachi Teppei
• Kobayashi Tomohiro
• Oikawa Kenichi
• Ohashi Masaki
• Fujiwara Takayuki

Classifications

• G03F7/2004

  characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light · CPC title

• G03F7/0397

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title

• G03F7/0045 Primary

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title