Polymer, resist composition, and pattern forming process

US10457761B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10457761-B2
Application numberUS-201715495080-A
CountryUS
Kind codeB2
Filing dateApr 24, 2017
Priority dateDec 10, 2014
Publication dateOct 29, 2019
Grant dateOct 29, 2019

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers under such illumination that the quantity of light of wavelength up to 400 nm is up to 0.05 mW/cm 2 . The polymer avoids photo-decomposition of the acid generator during polymerization and concomitant deprotection reaction of the acid labile group when used in positive resist compositions. A pattern with high dissolution contrast and rectangularity is formed after development.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing a polymer comprising recurring units having an acid generator bound to the backbone, and recurring units selected from recurring units having a carboxyl group optionally substituted with an acid labile group and recurring units having a hydroxyl group optionally substituted with an acid labile group, and a combination thereof, said method comprising polymerizing monomers corresponding to the recurring units under such illumination that the quantity of light of wavelength up to 400 nm is 0.05 mW/cm 2 or less, wherein the recurring units having an acid generator bound to the backbone are recurring units selected from recurring units having the formulae (1) to (3), and combinations thereof: wherein R 1 , R 5 and R 9 are each independently hydrogen or methyl, R 2 is a single bond, phenylene, —O—R— or —C(═O)—Y 0 —R—, Y 0 is oxygen or NH, R is a straight, branched or cyclic C 1 -C 6 alkylene, straight, branched or cyclic C 2 -C 6 alkenylene, or phenylene group, wherein the R group may contain a carbonyl (—CO—), ester (—COO—), ether (—O—), sulfonic acid ester (—OS(O 2 )—), sulfonamide represented by the formula —NH—S(O 2 )—, or hydroxyl moiety, R 3 , R 4 , R 6 , R 7 , R 8 , R 11 , R 12 and R 13 are each independently a straight, branched or cyclic C 1 -C 12 alkyl group, or a C 6 -C 12 aryl, C 7 -C 20 aralkyl, or thiophenyl group, wherein the straight, branched or cyclic C 1 -C 12 alkyl group of R 3 , R 4 , R 6 , R 7 , R 8 , R 11 , R 12 and R 13 may contain a carbonyl, ester or ether moiety, X 1 and X 2 are each independently a single bond, methylene, ethylene, phenylene, fluorinated phenylene, —O—R 14 —, or —C(═O)—Z 1 —R 14 —, Z 1 is oxygen or NH, R 14 is a straight, branched or cyclic C 1 -C 6 alkylene, alkenylene, or phenylene group, wherein the R 14 group may contain a carbonyl, ester, ether, sulfonic acid ester, sulfonamide or hydroxyl moiety, and the R 14 group may be fluorinated, R 10 is a C 1 -C 4 fluoroalkyl or C 6 -C 10 fluoroaryl group, and M − is a non-nucleophilic counter ion, and wherein the recurring units having a carboxyl group optionally substituted with an acid labile group and the recurring units having a hydroxyl group optionally substituted with an acid labile group have the following formulae (4) and (5), respectively, wherein R 15 and R 17 are each independently hydrogen or methyl, R 16 and R 19 are each independently hydrogen or an acid labile group, Y 1 is a single bond, phenylene, naphthylene or —C(═O)—O—R 20 —, R 20 is a straight, branched or cyclic C 1 -C 10 alkylene group, or phenylene or naphthylene group, wherein the C 1 -C 10 alkylene group of Y 1 may contain an ether, ester, lactone ring or hydroxyl moiety, Y 2 is a single bond, a phenylene or naphthylene group, or —C(═O)—O—R 21 —, —C(═O)—NH—R 21 —, —O—R 21 —, or —S—R 21 —, wherein the phenylene and naphthylene group of Y 2 may have a nitro, cyano or halogen moiety, R 21 is a straight, branched or cyclic C 1 -C 10 alkylene group, or a phenylene or naphthylene group, wherein the straight, branched or cyclic C 1 -C 10 alkylene group of R 21 may contain an ether, ester, lactone ring or hydroxyl moiety, wherein the phenylene and naphthylene group of R 21 may contain a straight, branched or cyclic C 1 -C 6 alkyl, C 2 -C 6 alkenyl, C 6 -C 10 aryl, alkoxy, acyl, acyloxy, alkoxycarbonyl, nitro, cyano or halogen moiety, R 18 is a single bond, or a straight, branched or cyclic, C 1 -C 16 , di- to pentavalent, aliphatic hydrocarbon group or phenylene group, which may contain an ether or ester moiety, and m is an integer of 1 to 4. 2. The method of claim 1 wherein the quantity of light of wavelength up to 400 nm is 0.02 mW/cm 2 or less. 3. The method of claim 2 wherein the quantity of light of wavelength up to 400 nm is 0.01 mW/cm 2 or less. 4. The method of claim 1 wherein the illumination is provided by an LED lamp or organic EL lamp. 5. The method of claim 1 wherein at least one of R 3 and R 4 , at least one of R 6 , R 7 and R 8 , or at least one of R 11 , R 12 and R 13 is an optionally substituted phenyl group. 6. The method of claim 1 wherein the polymer consists of recurring units having an acid generator bound to the backbone selected from recurring units having the formulae (1) to (3), recurring units having a carboxyl group optionally substituted with an acid labile group represented by formula (4) and/or recurring units having a hydroxyl group optionally substituted with an acid labile group represented by the following formula (5), and recurring units derived from monomers having an adhesive group selected from hydroxy, lactone ring, ether, ester, carbonyl and cyano group, wherein R 1 , R 5 and R 9 are each independently hydrogen or methyl, R 2 is a single bond, phenylene, —O—R— or —C(═O)—Y 0 —R—, Y 0 is oxygen or NH, R is a straight, branched or cyclic C 1 -C 6 alkylene, straight, branched or cyclic C 2 -C 6 alkenylene, or phenylene group, wherein the R group may contain a carbonyl (—CO—), ester (—COO—), ether (—O—), sulfonic acid ester (—OS(O 2 )—), sulfonamide represented by the formula —NH—S(O 2 )—, or hydroxyl moiety, R 3 , R 4 , R 6 , R 7 , R 8 , R 11 , R 12 and R 13 are each independently a straight, branched or cyclic C 1 -C 12 alkyl group, or a C 6 -C 12 aryl, C 7 -C 20 aralkyl, or thiophenyl group, wherein the straight, branched or cyclic C 1 -C 12 alkyl group of R 3 , R 4 , R 6 , R 7 , R 8 , R 11 , R 12 and R 13 may contain a carbonyl, ester or ether moiety, X 1 and X 2 are each independently a single bond, methylene, ethylene, phenylene, fluorinated phenylene, —O—R 14 —, or —C(═O)—Z 1 —R 14 —, Z 1 is oxygen or NH, R 14 is a straight, branched or cyclic C 1 -C 6 alkylene, alkenylene, or phenylene group, wherein the R 14 group may contain a carbonyl, ester, ether, sulfonic acid ester, sulfonamide or hydroxyl moiety, and the R 14 group may be fluorinated, R 10 is a C 1 -C 4 fluoroalkyl or C 6 -C 10 fluoroaryl group, and M − is a non-nucleophilic counter ion, wherein R 15 and R 17 are each independently hydrogen or methyl, R 16 and R 19 are each independently hydrogen or an acid labile group, Y 1 is a single bond, phenylene, naphthylene or —C(═O)—O—R 20 —, R 20 is a straight, branched or cyclic C 1 -C 10 alkylene group, or phenylene or naphthylene group, wherein the C 1 -C 10 alkylene group of Y 1 may contain an ether, ester, lactone ring or hydroxyl moiety, Y 2 is a single bond, a phenylene or naphthylene group, or —C(═O)—O—R 21 —, —C(═O)—NH—R 21 —, —O—R 21 —, or —S—R 21 —, wherein the phenylene and naphthylene group of Y 2 may have a nitro, cyano or halogen moiety, R 21 is a straight, branched or cyclic C 1 -C 10 alkylene group, or a phenylene or naphthylene group, wherein the straight, branched or cyclic C 1 -C 10 alkylene group of R 21 may contain an ether, ester, lactone ring or hydroxyl moiety, wherein the phenylene and naphthylene group of R 21 may contain a straight, branched or cyclic C 1 -C 6 alkyl, C 2 -C 6 alkenyl, C 6 -C 10 aryl, alkoxy, acyl, acyloxy, alkoxycarbonyl, nitro, cyano or halogen moiety, R 18 is a single bond, or a straight, branched or cyclic, C 1 -C 16 , di- to pentavalent, aliphatic hydrocarbon group or phenylene group, which may contain an ether or ester moiety, and m is an integer

Assignees

Inventors

Classifications

  • C08F212/22Primary

    Oxygen · CPC title

  • Phenols or alcohols · CPC title

  • and containing oxygen, e.g. 2-sulfoethyl (meth)acrylate · CPC title

  • characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light · CPC title

  • Non-aqueous compositions · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10457761B2 cover?
A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers under such illumination that the quantity of light of wavelength up to 400 nm is up to…
Who is the assignee on this patent?
Shinetsu Chemical Co
What technology area does this patent fall under?
Primary CPC classification C08F212/22. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 29 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).