Plasma abatement technology utilizing water vapor and oxygen reagent
US-2018366307-A1 · Dec 20, 2018 · US
Treating effluent gases
Treating effluent gases · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H01J37/32844 |
| Official title | {Treating effluent gases} |
| Display label | Treating effluent gases |
| Total patents | 195 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 15 |
| 2016 | 12 |
| 2017 | 20 |
| 2018 | 15 |
| 2019 | 16 |
| 2020 | 16 |
| 2021 | 21 |
| 2022 | 18 |
| 2023 | 19 |
| 2024 | 14 |
| 2025 | 26 |
| 2026 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Apparatus for collection and subsequent reaction of liquid and solid effluent into gaseous effluent
US-2018337027-A1 · Nov 22, 2018 · US
Reagent delivery system freeze prevention heat exchanger
US-10115571-B2 · Oct 30, 2018 · US
Substrate processing apparatus
US-2018305816-A1 · Oct 25, 2018 · US
Substrate processing apparatus having exhaust gas decomposer, and exhaust gas processing method therefor
US-2018305815-A1 · Oct 25, 2018 · US
Plasma abatement technology utilizing water vapor and oxygen reagent
US-2018226234-A1 · Aug 9, 2018 · US
Apparatus for vacuum sputter deposition and method therefor
US-2018211823-A1 · Jul 26, 2018 · US
Corrosion resistant abatement system
US-10005025-B2 · Jun 26, 2018 · US
Toroidal plasma abatement apparatus and method
US-9991098-B2 · Jun 5, 2018 · US
Microwave Chemical Processing
US-2018138017-A1 · May 17, 2018 · US
Plasma induced flow electrode structure, plasma induced flow generation device, and method of manufacturing plasma induced flow electrode structure
US-9934944-B2 · Apr 3, 2018 · US
Trap assembly in film forming apparatus
US-9896761-B2 · Feb 20, 2018 · US
Apparatus for treating an exhaust gas in a foreline
US-9867238-B2 · Jan 9, 2018 · US
Substrate processing apparatus and substrate detaching method
US-9831112-B2 · Nov 28, 2017 · US
Ethylene disposal apparatus and ethylene disposal method using same
US-2017325471-A1 · Nov 16, 2017 · US
Microwave chemical processing
US-9812295-B1 · Nov 7, 2017 · US
Plasma abatement solids avoidance by use of oxygen plasma cleaning cycle
US-2017297066-A1 · Oct 19, 2017 · US
Apparatus for exhaust cooling
US-2017301524-A1 · Oct 19, 2017 · US
Apparatus for treating a gas in a conduit
US-9767990-B2 · Sep 19, 2017 · US
Toroidal plasma abatement apparatus and method
US-2017213704-A1 · Jul 27, 2017 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC H01J37/32844?
- CPC H01J37/32844 is the Cooperative Patent Classification code for “Treating effluent gases.”
- How many patents are filed under CPC H01J37/32844 (Treating effluent gases)?
- Our database includes 195 publications tagged with this CPC code.
- Is patent activity under CPC H01J37/32844 growing?
- Publication counts under this code: 14 in 2024 vs 26 in 2025 (latest complete years).