Inspection Apparatus, Inspection Method, Lithographic Apparatus, Patterning Device and Manufacturing Method
US-2016363871-A1 · Dec 15, 2016 · US
Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/70525 |
| Official title | {Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure} |
| Display label | Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure |
| Total patents | 893 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 34 |
| 2016 | 34 |
| 2017 | 37 |
| 2018 | 77 |
| 2019 | 73 |
| 2020 | 81 |
| 2021 | 99 |
| 2022 | 103 |
| 2023 | 113 |
| 2024 | 90 |
| 2025 | 122 |
| 2026 | 30 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US-9507265-B2 · Nov 29, 2016 · US
Computational wafer inspection
US-9507907-B2 · Nov 29, 2016 · US
Lithography apparatus, lithography method, lithography system, storage medium, and article manufacturing method
US-2016334714-A1 · Nov 17, 2016 · US
Exposure apparatus, method for producing device, and method for controlling exposure apparatus
US-9494871-B2 · Nov 15, 2016 · US
Exposure apparatus, resist pattern forming method, and storage medium
US-2016327869-A1 · Nov 10, 2016 · US
Rule and lithographic process co-optimization
US-9489479-B2 · Nov 8, 2016 · US
Lithographic apparatus, control system and device manufacturing method
US-9482967-B2 · Nov 1, 2016 · US
Yield estimation and control
US-2016313651-A1 · Oct 27, 2016 · US
Exposure apparatus, exposure method, and article manufacturing method
US-2016306284-A1 · Oct 20, 2016 · US
Feed Forward of Metrology Data in a Metrology System
US-2016290796-A1 · Oct 6, 2016 · US
System and method to ensure source and image stability
US-9459537-B2 · Oct 4, 2016 · US
Projection exposure apparatus with optimized adjustment possibility
US-2016252824-A1 · Sep 1, 2016 · US
Lithography apparatus, lithography method, lithography system, storage medium, and article manufacturing method
US-9423700-B2 · Aug 23, 2016 · US
Lithography apparatus, lithography method, program, lithography system, and article manufacturing method
US-2016238946-A1 · Aug 18, 2016 · US
Exposure apparatus, exposure method, and device manufacturing method
US-9400434-B2 · Jul 26, 2016 · US
Projection exposure method and projection exposure apparatus for microlithography
US-2016209754-A1 · Jul 21, 2016 · US
Lithography system and a machine learning controller for such a lithography system
US-2016170311-A1 · Jun 16, 2016 · US
Projection exposure apparatus with optimized adjustment possibility
US-9354524-B2 · May 31, 2016 · US
Lithographic apparatuses and methods for compensating for eigenmode coupling
US-9329502-B2 · May 3, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/70525?
- CPC G03F7/70525 is the Cooperative Patent Classification code for “Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure.”
- How many patents are filed under CPC G03F7/70525 (Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure)?
- Our database includes 893 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/70525 growing?
- Publication counts under this code: 90 in 2024 vs 122 in 2025 (latest complete years).