Projection exposure apparatus with optimized adjustment possibility

Patent metadata

Field	Value
Publication number	US-9354524-B2
Application number	US-201213427030-A
Country	US
Kind code	B2
Filing date	Mar 22, 2012
Priority date	Sep 25, 2008
Publication date	May 31, 2016
Grant date	May 31, 2016

Abstract

A microlithography projection objective includes an optical element, a manipulator configured to manipulate the optical element, and a control unit configured to control the manipulator. The control unit includes a first device configured to control movement of the manipulator, a memory comprising an upper bound for a range of movement of the manipulator, and a second device configured to generate a merit function based on a square of a root mean square (RMS) of at least one error and configured to minimize the merit function subordinate to the upper bound for the range of movement of the manipulator.

First claim

What is claimed is:

1. A system, comprising:
an objective, comprising:
an optical element; and
a manipulator configured to manipulate the optical element, wherein the manipulator has a maximum physical range in the objective; and

a control unit configured to control the manipulator, the control unit comprising:
a first device configured to control the manipulation of the optical element by the manipulator;
a memory comprising a bound for a range of the manipulation of the optical element by the manipulator, the bound being more restrictive than a limit of the maximum physical range; and
a second device configured to calculate a value of a merit function based on at least one error and configured to minimize the merit function subordinate to the bound for the range of the manipulation of the optical element by the manipulator,

wherein the objective is a microlithography projection objective.

2. The system of claim 1 , wherein the objective comprises a plurality of optical elements.

3. The system of claim 2 , wherein the objective comprises a plurality of manipulators.

4. The system of claim 3 , wherein each optical element has a corresponding manipulator.

5. The system of claim 4 , wherein the first device is configured to control movement of each manipulator.

6. The system of claim 1 , wherein the at least one error is selected from the group consisting of scale error, telecentricity error, overlay error, depth of focus error, best focus errors and errors due to image aberrations produced by integration of a plurality of field points.

7. The system of claim 1 , wherein the at least one error comprises at least one image aberration.

8. The system of claim 1 , wherein the merit function comprises a parameter describing a sensitivity matrix.

9. The system of claim 8 , wherein the merit function comprises a regularization parameter.

10. The system of claim 1 , wherein the objective comprises first, second and third optical elements, the first optical element is near a pupil plane of the objective, the second optical element is near a field plane of the objective, and the third optical element is not near a pupil plane of the objective or a field plane of the objective.

11. The system of claim 1 , wherein the bound is the upper bound.

12. The system of claim, 1 wherein the control unit is configured to control the manipulator in real time within 15000 ms.

13. The system of claim 1 , wherein the control unit is configured to control the manipulator in real time within 5000 ms.

14. The system of claim 1 , wherein the control unit is configured to control the manipulator in real time within 1000 ms.

15. The system of claim 1 , wherein the control unit is configured to control the manipulator in real time within 200 ms.

16. The system of claim 1 , wherein the control unit is configured to control the manipulator in real time within 20 ms.

17. The system of claim 1 , wherein the control unit is configured to control the manipulator in real time within 5 ms.

18. The system of claim 1 , wherein the control unit is configured to control the manipulator in real time within 1 ms.

19. The system of claim 1 , wherein the merit function comprises a linear function of a degree of freedom of the manipulation of the optical element by the manipulator.

20. The system of claim 1 , wherein the merit function comprises a quadratic function of a degree of freedom of the manipulation of the optical element by the manipulator.

21. The system of claim 1 , wherein the second device is configured to minimize the merit function using a linear programming.

22. The system of claim 1 , wherein the second device is configured to minimize the merit function using a quadratic programming.

23. The system of claim 1 , wherein calculating the value of the merit function comprises generating the merit function.

24. The system of claim 23 , wherein generating the merit function comprises determining a parameter of the merit function based on a statistical distribution.

25. The system of claim 23 , wherein generating the merit function comprises determining a parameter of the merit function based on a look-up table.

26. The system of claim 1 , wherein calculating the value of the merit function comprises adjusting weighting coefficients of the merit function.

27. The system of claim 26 , wherein the weighting coefficients represent the weighting of different degrees of freedom of the manipulation.

28. The system of claim 26 , wherein the weighting coefficients represent the weighting of different errors.

29. The system of claim 1 , wherein the manipulation of the optical element by the manipulator comprises at least one element selected from the group consisting of shifting the optical element, rotating the optical element and deforming the optical element.

30. The system of claim 1 , wherein the manipulation of the optical element by the manipulator comprises exchanging the optical element.

31. The system of claim 1 , wherein the manipulation of the optical element by the manipulator comprises at least one element selected from the group consisting of heating the optical element and cooling the optical element.

32. The system of claim 1 , wherein the optical element comprises a reflective optical element.

33. The system of claim 1 , wherein the optical element comprises a reflective optical element in the vicinity of a pupil plane.

34. The system of claim 1 , wherein:
the objective has a folded design comprising first, second and third objective parts;
the optical element comprises a reflective optical element in the second objective part;
the first objective part comprises refractive optical elements; and
the third objective part comprises refractive optical elements.

35. The system of claim 1 , wherein:
the objective has a folded design comprising first, second and third objective parts;
the optical element comprises a reflective optical element in the vicinity of a pupil plane in the second objective part;
the first objective part comprises refractive optical elements; and
the third objective part comprises refractive optical elements.

36. The system of claim 1 , wherein the optical element comprises a diffractive optical element.

37. The system of claim 1 , wherein the optical element comprises a refractive optical element.

38. The system of claim 1 , wherein the second device is configured to calculate the merit function based on a root mean square (RMS) of the at least one error.

39. The system of claim 1 , wherein the second device is configured to calculate the merit function based on a square of a root mean square (RMS) of the at least one error.

40. The system of claim 1 , wherein the maximum physical range in the objective is a maximum possible movement distance governed by a design of the manipulator or by the structural space within the objective.

41. The system of claim 1 , wherein the maximum physical range in the objective is a maximum possible temperature range of the manipulator.

42. An apparatus, comprising:
an illumination system; and
a projection objective, comprising:
an

Assignees

• Bittner Boris
• Walter Holger
• Roesch Matthias
• Zeiss Carl Smt Gmbh

Inventors

• Bittner Boris
• Walter Holger
• Roesch Matthias

Classifications

• G03F7/70308 Primary

  Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift · CPC title

• G03F7/705

  Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions · CPC title

• G03F7/70891

  Temperature · CPC title

• G03F7/70266 Primary

  Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction · CPC title

• G03F7/70533

  Controlling abnormal operating mode, e.g. taking account of waiting time, decision to rework or rework flow · CPC title