Lithography apparatus, lithography method, program, lithography system, and article manufacturing method

Patent metadata

Field	Value
Publication number	US-2016238946-A1
Application number	US-201615044223-A
Country	US
Kind code	A1
Filing date	Feb 16, 2016
Priority date	Feb 16, 2015
Publication date	Aug 18, 2016
Grant date	—

Abstract

A lithography apparatus has a plurality of processing units configured to respectively perform patternings on a plurality of substrates that belong to a lot, and a controller configured to perform, based on specific information that specifies one of the plurality of substrates, determination of one of the plurality of processing units that processes the one of the plurality of substrates, and control the plurality of processing units such that the patternings are performed on the plurality of substrates respectively with the plurality of processing units in parallel based on recipe information corresponding to the lot.

First claim

What is claimed is:

1 . A lithography apparatus comprising a plurality of processing units configured to respectively perform patternings on a plurality of substrates that belong to a lot, the apparatus comprising:
a controller configured to perform, based on specific information that specifies one of the plurality of substrates, determination of one of the plurality of processing units that processes the one of the plurality of substrates, and control the plurality of processing units such that the patternings are performed on the plurality of substrates respectively with the plurality of processing units in parallel based on recipe information corresponding to the lot.

2 . The apparatus according to claim 1 , wherein the controller has information of a plurality of groups into which the plurality of processing units are classified, and is configured to perform the determination further based on previously set correspondence relation between one of the plurality of groups and the specific information.

3 . The apparatus according to claim 1 , wherein the controller is configured to obtain the specific information based on an order of the one of the plurality of substrates conveyed from a preprocessing apparatus which has performed preprocessing on the plurality of substrates.

4 . The apparatus according to claim 1 , wherein the controller is configured to obtain the specific information based on a position of one of the plurality of substrates in a pod for the plurality of substrates.

5 . The apparatus according to claim 1 , further comprising a device configured to obtain the specific information from each of the plurality of substrates or a pod for the plurality of substrates.

6 . The apparatus according to claim 1 , wherein the controller is configured to perform the determination further based on the recipe information.

7 . The apparatus according to claim 1 , further comprising a receiving device configured to receive information related to the determination, and
wherein the controller is configured to perform the determination further based on the received information.

8 . The apparatus according to claim 1 , wherein the controller is configured to transmit information related to processing units, to be used for the patternings, of the plurality of processing units to a preprocessing apparatus which performs preprocessing on the plurality of substrates or a control apparatus which controls the preprocessing apparatus, and perform the determination based on the specific information and the transmitted information.

9 . The lithography apparatus according to claim 8 , wherein the controller is configured to transmit the related information based on a state of each of the plurality of processing units.

10 . The lithography apparatus according to claim 1 , wherein the controller is configured to determine a processing condition for the patterning with respect to each of the plurality of processing units based on the specific information and the recipe information.

11 . The lithography apparatus according to claim 1 , wherein each of the plurality of processing units includes a processing unit configured to perform the patterning by imprint.

12 . The lithography apparatus according to claim 1 , wherein each of the plurality of processing units includes a processing unit configured to perform the patterning with a charged particle beam.

13 . A lithography method of performing patternings on a plurality of substrates that belong to a lot respectively with a plurality of processing units in parallel, the method comprising steps of:
performing, based on specific information that specifies one of the plurality of substrates, determination of one of the plurality of processing units which processes the one of the plurality of substrates; and performing patterning on the plurality of substrates respectively with the plurality of processing units in parallel based on recipe information corresponding to the lot.

14 . A computer-readable storage medium which stores a program for causing a computer to execute a method of performing patternings on a plurality of substrates that belong to a lot respectively with a plurality of processing units in parallel, the method including steps of:
performing, based on specific information that specifies one of the plurality of substrates, determination of one of the plurality of processing units which processes the one of the plurality of substrates; and performing patterning on the plurality of substrates respectively with the plurality of processing units in parallel based on recipe information corresponding to the lot.

15 . A lithography system comprising:
the lithography apparatus defined in claim 1 ; and a preprocessing apparatus configured to supply a substrate to the lithography apparatus.

16 . A method of manufacturing an article, the method comprising steps of:
performing patterning on a substrate using a lithography apparatus; processing the substrate, on which the patterning has been performed, to manufacture the article, wherein the lithography apparatus includes a plurality of processing units configured to respectively perform patternings on a plurality of substrates that belong to a lot, the apparatus including: a controller configured to perform, based on specific information that specifies one of the plurality of substrates, determination of one of the plurality of processing units that processes the one of the plurality of substrates, and control the plurality of processing units such that the patternings are performed on the plurality of substrates respectively with the plurality of processing units in parallel based on recipe information corresponding to the lot.

17 . A method of manufacturing an article, the method comprising steps of:
performing patterning on a substrate using a lithography method; and processing the substrate, on which the patterning has been performed, to manufacture the article, wherein the lithography method performs patternings on a plurality of substrates that belong to a lot respectively with a plurality of processing units in parallel, the method including steps of: performing, based on specific information that specifies one of the plurality of substrates, determination of one of the plurality of processing units which processes the one of the plurality of substrates; and performing patterning on the plurality of substrates respectively with the plurality of processing units in parallel based on recipe information corresponding to the lot.

18 . A method of manufacturing an article, the method comprising steps of:
performing patterning on a substrate using a lithography system; and processing the substrate, on which the patterning has been performed, to manufacture the article, wherein the lithography system includes: a lithography apparatus; and a preprocessing apparatus configured to supply a substrate to the lithography apparatus, wherein the lithography apparatus includes a plurality of processing units configured to respectively perform patternings on a plurality of substrates that belong to a lot, the lithography apparatus including: a controller configured to perform, based on specific information that specifies one of the plurality of substrates, determination of one of the plurality of processing units that processes the one of the plurality of substrates, and control the plurality of processing units such that the patternings are performed on the plurality of substrates respectively with the plurality of processing uni

Assignees

• Canon Kk

Inventors

• Miyajima Yoshikazu
• Nakano Hitoshi

Classifications

• G03F7/70991 Primary

  Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum · CPC title

• G03F7/70525

  Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure · CPC title

• G03F7/70483

  Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring · CPC title

• G03F7/70 Primary

  Microphotolithographic exposure; Apparatus therefor (photo-masks G03F1/00) · CPC title