Halogen-Containing Silane-Based Metal Silicide As Nucleation Layer For Tungsten ALD
US-2017350013-A1 · Dec 7, 2017 · US
from metal halides
from metal halides · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/08 |
| Official title | from metal halides |
| Display label | from metal halides |
| Total patents | 430 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 22 |
| 2016 | 25 |
| 2017 | 26 |
| 2018 | 26 |
| 2019 | 25 |
| 2020 | 31 |
| 2021 | 39 |
| 2022 | 45 |
| 2023 | 56 |
| 2024 | 62 |
| 2025 | 59 |
| 2026 | 14 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Enhanced Spatial ALD Of Metals Through Controlled Precursor Mixing
US-2017306490-A1 · Oct 26, 2017 · US
Mask structure forming method and film forming apparatus
US-2017263455-A1 · Sep 14, 2017 · US
Substrate processing apparatus
US-2017256381-A1 · Sep 7, 2017 · US
One-dimensional titanium nanostructure and method for fabricating the same
US-2017130361-A1 · May 11, 2017 · US
Method of forming tungsten film
US-9640404-B2 · May 2, 2017 · US
Copper chloride, cvd raw material, copper wiring film, and method for producing copper chloride
US-2017101718-A1 · Apr 13, 2017 · US
Substrate processing apparatus and semiconductor device manufacturing method
US-9593422-B2 · Mar 14, 2017 · US
Atomic layer deposition of germanium or germanium oxide
US-2017069490-A1 · Mar 9, 2017 · US
Enhanced deposition of noble metals
US-9587307-B2 · Mar 7, 2017 · US
Methods of Depositing Metal Films Using Metal Oxyhalide Precursors
US-2017062224-A1 · Mar 2, 2017 · US
Method and apparatus for the selective deposition of epitaxial germanium stressor alloys
US-2017037536-A1 · Feb 9, 2017 · US
Tungsten film forming method, semiconductor device manufacturing method, and storage medium
US-9536782-B2 · Jan 3, 2017 · US
Method for cleaning titanium alloy deposition
US-9530627-B2 · Dec 27, 2016 · US
VAPOR DEPOSITION OF LiF THIN FILMS
US-2016369397-A1 · Dec 22, 2016 · US
Semiconductor manufacturing system and semiconductor manufacturing method
US-2016358762-A1 · Dec 8, 2016 · US
Method and apparatus for the selective deposition of epitaxial germanium stressor alloys
US-9476144-B2 · Oct 25, 2016 · US
Vessel and method for delivery of precursor materials
US-2016305019-A1 · Oct 20, 2016 · US
High purity tungsten hexachloride and method for making same
US-2016305020-A1 · Oct 20, 2016 · US
Cvd-coated article and cvd process of making the same
US-2016298233-A1 · Oct 13, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/08?
- CPC C23C16/08 is the Cooperative Patent Classification code for “from metal halides.”
- How many patents are filed under CPC C23C16/08 (from metal halides)?
- Our database includes 430 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/08 growing?
- Publication counts under this code: 62 in 2024 vs 59 in 2025 (latest complete years).