Cvd-coated article and cvd process of making the same

US2016298233A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2016298233-A1
Application numberUS-201514684717-A
CountryUS
Kind codeA1
Filing dateApr 13, 2015
Priority dateApr 13, 2015
Publication dateOct 13, 2016
Grant date

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  5. First independent claim

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Abstract

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A CVD-coated article has a substrate with a substrate surface and a CVD coating scheme on the substrate surface. The coating scheme includes a coating layer of Ti 1-x Me x nitride wherein Me is selected from the group of zirconium or hafnium or a mixture of zirconium and hafnium, and x equals between about 0.1 and about 0.9. The coating layer of Ti 1-x Me x nitride has a microhardness equal to between about 2300 HV0.05 and about 2600 HV0.05, a face centered cubic crystal structure, and a lattice constant equal to between about 0.427 nanometers and about 0.453 nanometers.

First claim

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What is claimed is: 1 . A CVD-coated article comprising: a substrate having a substrate surface; a CVD coating scheme on the substrate surface, and the coating scheme comprising a coating layer of Ti 1-x Me x nitride wherein Me is selected from the group consisting essentially of zirconium or hafnium or a mixture of zirconium and hafnium, and x equals between about 0.1 and about 0.9; the coating layer of Ti 1-x Me x nitride has a microhardness equal to between about 2300 HV0.05 and about 2600 HV0.05; the coating layer of Ti 1-x Me x nitride has a face centered cubic crystal structure; and the coating layer of Ti 1-x Me x nitride has a lattice constant equal to between about 0.427 nanometers and about 0.453 nanometers. 2 . The CVD-coated article according to claim 1 wherein the CVD coating scheme further has a coating layer of Me carbonitride, and the coating layer of Ti 1-x Me x nitride is on the coating layer of Me carbonitride, and the coating layer of Me carbonitride is on the substrate surface. 3 . The CVD-coated article according to claim 1 wherein the CVD coating scheme further has a base coating layer of titanium nitride, an inner mediate coating layer of MT-TiCN, an outer mediate coating layer of alumina, and the coating layer of Ti 1-x Me x nitride is on the coating layer of alumina. 4 . The CVD-coated article according to claim 1 wherein the CVD coating scheme further has a base coating layer of titanium nitride, and an outer coating layer of alumina, and the coating layer of Ti 1-x Me x nitride is on the base coating layer of titanium nitride, and the outer coating layer of alumina is on the coating layer of Ti 1-x Me x nitride. 5 . The CVD-coated article according to claim 1 wherein Me consists essentially of zirconium wherein the coating layer of Ti 1-x Me x nitride is a coating layer of Ti 1-x Zr x nitride, and x equals between about 0.1 and about 0.9. 6 . The CVD-coated article according to claim 5 wherein the CVD coating scheme further has a base coating layer of titanium nitride, an inner mediate coating layer of MT-TiCN, an outer mediate coating layer of alumina, and the coating layer of Ti 1-x Zr x nitride is on the coating layer of alumina. 7 . The CVD-coated article according to claim 5 wherein the CVD coating scheme further has a base coating layer of titanium nitride, and an outer coating layer of alumina, and the coating layer of Ti 1-x Zr x nitride is on the base coating layer of titanium nitride, and the outer coating layer of alumina is on the coating layer of Ti 1-x Zr x nitride. 8 . The CVD-coated article according to claim 5 wherein x equals between about 0.4 and about 0.8. 9 . The CVD-coated article according to claim 1 wherein Me consists essentially of hafnium wherein the coating layer of Ti 1-x Me x nitride is a coating layer of Ti 1-x Hf x nitride, and x equals between about 0.1 and about 0.9, and the lattice constant equal between about 0.427 and about 0.445. 10 . The CVD-coated article according to claim 9 wherein the CVD coating scheme further has a base coating layer of titanium nitride, an inner mediate coating layer of MT-TiCN, an outer mediate coating layer of alumina, and the coating layer of Ti 1-x Hf x nitride is on the coating layer of alumina. 11 . The CVD-coated article according to claim 9 wherein the CVD coating scheme further has a base coating layer of titanium nitride, and an outer coating layer of alumina, and the coating layer of Ti 1-x , Hf x nitride is on the base coating layer of titanium nitride, and the outer coating layer of alumina is on the coating layer of Ti 1-x Hf x nitride. 12 . The CVD-coated article according to claim 9 wherein x equals between about 0.3 and about 0.7. 13 . The CVD-coated article according to claim 1 wherein Me consists essentially of titanium and hafnium wherein the coating layer of Ti 1-x Me x nitride is a coating layer of Ti 1-(a+b) Zr a Hf b nitride, and a equals between about 0.1 and about 0.9 and b equals between about 0.1 and about 0.9, and a+b equals 1.0. 14 . The CVD-coated article according to claim 13 wherein the CVD coating scheme further has a base coating layer of titanium nitride, an inner mediate coating layer of MT-TiCN, an outer mediate coating layer of alumina, and the coating layer of Ti 1-(a+b) Zr a Hf b nitride is on the coating layer of alumina. 15 . The CVD-coated article according to claim 13 wherein the CVD coating scheme further has a base coating layer of titanium nitride, and an outer coating layer of alumina, and the coating layer of Ti 1-(a+b) Zr a Hf b nitride is on the base coating layer of titanium nitride, and the outer coating layer of alumina is on the coating layer of Ti 1-(a+b) Zr a Hf b nitride. 16 . The CVD-coated article according to claim 13 wherein a equals between about 0.3 and about 0.7, b equal between about 0.3 and about 0.7 and a+b equals 1.0. 17 . The CVD-coated article according to claim 1 wherein the article is a cutting insert. 18 . A CVD-coated article comprising: a substrate having a substrate surface; a CVD coating scheme on the substrate surface, and the coating scheme comprising a coating layer of Ti 1-x Zr x nitride wherein x equals between about 0.1 and about 0.9; the coating layer of Ti 1-x Zr x nitride has a microhardness equal to between about 2300 HV0.05 and about 2600 HV0.05; the coating layer of Ti 1-x Zr x nitride has a face centered cubic crystal structure; and the coating layer of Ti 1-x Zr x nitride has a lattice constant equal to between about 0.427 nanometers and about 0.453 nanometers. 19 . A CVD-coated article comprising: a substrate having a substrate surface; a CVD coating scheme on the substrate surface, and the coating scheme comprising a coating layer of Ti 1-x Hf x nitride wherein x equals between about 0.1 and about 0.9; the coating layer of Ti 1-x Hf x nitride has a microhardness equal to between about 2300 HV0.05 and about 2600 HV0.05; the coating layer of Ti 1-x Hf x nitride has a face centered cubic crystal structure; and the coating layer of Ti 1-x Hf x nitride has a lattice constant equal to between about 0.427 nanometers and about 0.449 nanometers. 20 . A process for making a CVD-coated article comprising the steps of: providing a substrate wherein the substrate has a substrate surface; and depositing a coating layer of Ti 1-x Me x nitride wherein Me is zirconium or hafnium or a mixture of zirconium and hafnium wherein a gaseous mixture to deposit zirconium comprises hydrogen and TiCl 4 and ZrCl 4 and NH 3 and nitrogen and argon, a gaseous mixture to deposit hafnium comprises hydrogen and TiCl 4 and HfCl 4 and NH 3 and nitrogen and argon, and a gaseous mixture to apply a mixture of zirconium and hafnium comprises hydrogen and TiCl4 and ZrCl 4 and HfCl 4 and NH 3 and nitrogen and argon. 21 . The CVD process according to claim 20 wherein in the depositing step, the temperature equals between about 870° C. and about 900° C., the pressure equals between about 70 mbar and about 90 mbar, and the duration equals between about 90 minutes and about 180 minutes. 22 . The CVD process according to claim 20 wherein the NH 3 in the gaseous mixture being replaced by hydrazine. 23 . The CVD process according to claim 20 wherein the gaseous mixture to deposit a coating layer of (Ti 1-x Zr x ) nitride comprises TiCl 4 in an amount between about 0.1 volume percent and about 0.6 volume perc

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Inventors

Classifications

  • including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides · CPC title

  • Carbonitrides · CPC title

  • Nitrides {(C23C16/303 takes precedence)} · CPC title

  • C09D1/00Primary

    Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances · CPC title

  • C23C16/30Primary

    Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides · CPC title

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What does patent US2016298233A1 cover?
A CVD-coated article has a substrate with a substrate surface and a CVD coating scheme on the substrate surface. The coating scheme includes a coating layer of Ti 1-x Me x nitride wherein Me is selected from the group of zirconium or hafnium or a mixture of zirconium and hafnium, and x equals between about 0.1 and about 0.9. The coating layer of Ti 1-x Me x nitride has a microhardness equal t…
Who is the assignee on this patent?
Kennametal Inc
What technology area does this patent fall under?
Primary CPC classification C09D1/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Oct 13 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).