Process for preparing ceramics, ceramics thus obtained and uses thereof, especially as a sputtering target
US-10144674-B2 · Dec 4, 2018 · US
based on tin oxides or stannates
based on tin oxides or stannates · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C04B35/457 |
| Official title | based on tin oxides or stannates |
| Display label | based on tin oxides or stannates |
| Total patents | 135 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 24 |
| 2016 | 16 |
| 2017 | 10 |
| 2018 | 16 |
| 2019 | 10 |
| 2020 | 15 |
| 2021 | 8 |
| 2022 | 11 |
| 2023 | 14 |
| 2024 | 5 |
| 2025 | 5 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Oxide semiconductor
US-2018305219-A1 · Oct 25, 2018 · US
Formation of films for organic photovoltaics
US-10099963-B2 · Oct 16, 2018 · US
Oxide sintered body and semiconductor device
US-10087517-B2 · Oct 2, 2018 · US
Susceptor materials for 3d printing using microwave processing
US-2018265417-A1 · Sep 20, 2018 · US
Method of producing an internal cavity in a ceramic matrix composite
US-10011043-B2 · Jul 3, 2018 · US
Light-emitting ceramic, light-emitting element, and light-emitting device
US-10000696-B2 · Jun 19, 2018 · US
Sintered body, sputtering target and molding die, and process for producing sintered body employing the same
US-9920420-B2 · Mar 20, 2018 · US
Cylindrical compact, manufacturing method of cylindrical sputtering target, and manufacturing method of cylindrical sintered compact
US-2018073134-A1 · Mar 15, 2018 · US
Ceramic substrate and method for producing a ceramic substrate
US-2018040528-A1 · Feb 8, 2018 · US
Method for manufacturing sputtering target
US-2017350002-A1 · Dec 7, 2017 · US
Cylindrical sputtering target, cylindrical compact, manufacturing method of cylindrical sputtering target, and manufacturing method of cylindrical sintered compact
US-9834839-B2 · Dec 5, 2017 · US
Method for making tin oxide thin film
US-9828667-B2 · Nov 28, 2017 · US
Three-dimensional shaped article production method, three-dimensional shaped article production apparatus, and three-dimensional shaped article
US-2017252977-A1 · Sep 7, 2017 · US
Method and apparatus for producing three-dimensionally shaped object and three-dimensionally shaped object
US-9738037-B2 · Aug 22, 2017 · US
Metal Oxide Film and Semiconductor Device
US-2017186843-A1 · Jun 29, 2017 · US
Target material for sputtering and method for manufacturing same
US-2017130328-A1 · May 11, 2017 · US
Formation of films for organic photovoltaics
US-2017096374-A1 · Apr 6, 2017 · US
Tin oxide refractory and method for its production
US-9586847-B2 · Mar 7, 2017 · US
Oxide sintered body and semiconductor device
US-2017029933-A1 · Feb 2, 2017 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C04B35/457?
- CPC C04B35/457 is the Cooperative Patent Classification code for “based on tin oxides or stannates.”
- How many patents are filed under CPC C04B35/457 (based on tin oxides or stannates)?
- Our database includes 135 publications tagged with this CPC code.
- Is patent activity under CPC C04B35/457 growing?
- Publication counts under this code: 5 in 2024 vs 5 in 2025 (latest complete years).