Methods and compositions for increased thermoelectric oxide ceramic performance
US-2024132412-A1 · Apr 25, 2024 · US
at an oxygen percentage above that of air
at an oxygen percentage above that of air · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C04B2235/6585 |
| Official title | at an oxygen percentage above that of air |
| Display label | at an oxygen percentage above that of air |
| Total patents | 179 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 27 |
| 2016 | 23 |
| 2017 | 29 |
| 2018 | 19 |
| 2019 | 7 |
| 2020 | 15 |
| 2021 | 12 |
| 2022 | 14 |
| 2023 | 17 |
| 2024 | 7 |
| 2025 | 7 |
| 2026 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
COG dielectric composition for use with nickel electrodes
US-9852848-B2 · Dec 26, 2017 · US
Cylindrical sputtering target, cylindrical compact, manufacturing method of cylindrical sputtering target, and manufacturing method of cylindrical sintered compact
US-9834839-B2 · Dec 5, 2017 · US
Oxide sintered body, production method therefor, target, and transparent conductive film
US-9721770-B2 · Aug 1, 2017 · US
Honeycomb filter
US-9702283-B2 · Jul 11, 2017 · US
Oxide sintered compact, its production method, and raw material powder for producing oxide sintered compact
US-9663405-B2 · May 30, 2017 · US
LiCoO2 Sputtering Target, Production Method Therefor, And Positive Electrode Material Thin Film
US-2017148614-A1 · May 25, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2017076943-A1 · Mar 16, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2017047206-A1 · Feb 16, 2017 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2017029336-A1 · Feb 2, 2017 · US
High strength transparent ceramic using corundum powder and methods of manufacture
US-9527774-B2 · Dec 27, 2016 · US
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
US-2016348229-A1 · Dec 1, 2016 · US
Compositions and materials for electronic applications
US-9505632-B2 · Nov 29, 2016 · US
Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof
US-9502636-B2 · Nov 22, 2016 · US
Transparent conductive film
US-9493869-B2 · Nov 15, 2016 · US
Cylindrical sputtering target, cylindrical compact, manufacturing method of cylindrical sputtering target, and manufacturing method of cylindrical sintered compact
US-2016281214-A1 · Sep 29, 2016 · US
Ceramic material
US-9434650-B2 · Sep 6, 2016 · US
Sintered ferrite material, wire wound component, and producing method of sintered ferrite material
US-9434622-B2 · Sep 6, 2016 · US
Complex oxide sintered body, sputtering target, transparent conductive oxide film, and method for producing same
US-9418771-B2 · Aug 16, 2016 · US
Ceramic particles with controlled pore and/or microsphere placement and/or size and method of making same
US-9410078-B2 · Aug 9, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C04B2235/6585?
- CPC C04B2235/6585 is the Cooperative Patent Classification code for “at an oxygen percentage above that of air.”
- How many patents are filed under CPC C04B2235/6585 (at an oxygen percentage above that of air)?
- Our database includes 179 publications tagged with this CPC code.
- Is patent activity under CPC C04B2235/6585 growing?
- Publication counts under this code: 7 in 2024 vs 7 in 2025 (latest complete years).